JPS633156Y2 - - Google Patents
Info
- Publication number
- JPS633156Y2 JPS633156Y2 JP1982014153U JP1415382U JPS633156Y2 JP S633156 Y2 JPS633156 Y2 JP S633156Y2 JP 1982014153 U JP1982014153 U JP 1982014153U JP 1415382 U JP1415382 U JP 1415382U JP S633156 Y2 JPS633156 Y2 JP S633156Y2
- Authority
- JP
- Japan
- Prior art keywords
- mask
- photomask
- pattern
- inspection
- cartridge
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000007689 inspection Methods 0.000 claims description 30
- 230000007547 defect Effects 0.000 claims description 18
- 239000004065 semiconductor Substances 0.000 claims description 3
- 238000005286 illumination Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 238000003384 imaging method Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000001514 detection method Methods 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 230000002159 abnormal effect Effects 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000011179 visual inspection Methods 0.000 description 1
Landscapes
- Testing Of Individual Semiconductor Devices (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1415382U JPS58118731U (ja) | 1982-02-05 | 1982-02-05 | Ｌｓｉ検査装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1415382U JPS58118731U (ja) | 1982-02-05 | 1982-02-05 | Ｌｓｉ検査装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58118731U JPS58118731U (ja) | 1983-08-13 |
| JPS633156Y2 true JPS633156Y2 (ko) | 1988-01-26 |
Family
ID=30026627
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1415382U Granted JPS58118731U (ja) | 1982-02-05 | 1982-02-05 | Ｌｓｉ検査装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58118731U (ko) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5232271A (en) * | 1975-09-08 | 1977-03-11 | Hitachi Ltd | Inspection method and equipment for photomask pattern |
| JPS5447579A (en) * | 1977-09-22 | 1979-04-14 | Hitachi Ltd | Develping condiction inspecting method in photoetching |
-
1982
- 1982-02-05 JP JP1415382U patent/JPS58118731U/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5232271A (en) * | 1975-09-08 | 1977-03-11 | Hitachi Ltd | Inspection method and equipment for photomask pattern |
| JPS5447579A (en) * | 1977-09-22 | 1979-04-14 | Hitachi Ltd | Develping condiction inspecting method in photoetching |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58118731U (ja) | 1983-08-13 |
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