JPS6331095B2 - - Google Patents

Info

Publication number
JPS6331095B2
JPS6331095B2 JP57111499A JP11149982A JPS6331095B2 JP S6331095 B2 JPS6331095 B2 JP S6331095B2 JP 57111499 A JP57111499 A JP 57111499A JP 11149982 A JP11149982 A JP 11149982A JP S6331095 B2 JPS6331095 B2 JP S6331095B2
Authority
JP
Japan
Prior art keywords
wafer
semiconductor wafer
temperature
outer periphery
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57111499A
Other languages
English (en)
Japanese (ja)
Other versions
JPS593934A (ja
Inventor
Yoshiki Mimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Original Assignee
Ushio Denki KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Denki KK filed Critical Ushio Denki KK
Priority to JP57111499A priority Critical patent/JPS593934A/ja
Priority to US06/445,493 priority patent/US4469529A/en
Publication of JPS593934A publication Critical patent/JPS593934A/ja
Publication of JPS6331095B2 publication Critical patent/JPS6331095B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P34/422—

Landscapes

  • Recrystallisation Techniques (AREA)
JP57111499A 1981-12-04 1982-06-30 半導体ウエハ−を光照射で加熱する方法 Granted JPS593934A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP57111499A JPS593934A (ja) 1982-06-30 1982-06-30 半導体ウエハ−を光照射で加熱する方法
US06/445,493 US4469529A (en) 1981-12-04 1982-11-30 Method for heating semiconductor wafer by means of application of radiated light with supplemental circumferential heating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57111499A JPS593934A (ja) 1982-06-30 1982-06-30 半導体ウエハ−を光照射で加熱する方法

Publications (2)

Publication Number Publication Date
JPS593934A JPS593934A (ja) 1984-01-10
JPS6331095B2 true JPS6331095B2 (en:Method) 1988-06-22

Family

ID=14562838

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57111499A Granted JPS593934A (ja) 1981-12-04 1982-06-30 半導体ウエハ−を光照射で加熱する方法

Country Status (1)

Country Link
JP (1) JPS593934A (en:Method)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6111614B2 (ja) * 2012-11-22 2017-04-12 信越半導体株式会社 シリコンウェーハの熱処理方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5764937A (en) * 1980-10-09 1982-04-20 Ushio Inc Annealing device
JPS58194332A (ja) * 1981-12-04 1983-11-12 Ushio Inc 半導体を光照射で加熱する方法

Also Published As

Publication number Publication date
JPS593934A (ja) 1984-01-10

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