JPS6330786B2 - - Google Patents

Info

Publication number
JPS6330786B2
JPS6330786B2 JP1233487A JP1233487A JPS6330786B2 JP S6330786 B2 JPS6330786 B2 JP S6330786B2 JP 1233487 A JP1233487 A JP 1233487A JP 1233487 A JP1233487 A JP 1233487A JP S6330786 B2 JPS6330786 B2 JP S6330786B2
Authority
JP
Japan
Prior art keywords
resin
semiconductor substrate
film
pii
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1233487A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62174929A (ja
Inventor
Tatsumi Shirasu
Yasunobu Osa
Tokio Kato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP1233487A priority Critical patent/JPS62174929A/ja
Publication of JPS62174929A publication Critical patent/JPS62174929A/ja
Publication of JPS6330786B2 publication Critical patent/JPS6330786B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
JP1233487A 1987-01-23 1987-01-23 半導体記憶装置の製造方法 Granted JPS62174929A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1233487A JPS62174929A (ja) 1987-01-23 1987-01-23 半導体記憶装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1233487A JPS62174929A (ja) 1987-01-23 1987-01-23 半導体記憶装置の製造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP3548079A Division JPS55128851A (en) 1979-03-28 1979-03-28 Semiconductor memory device

Publications (2)

Publication Number Publication Date
JPS62174929A JPS62174929A (ja) 1987-07-31
JPS6330786B2 true JPS6330786B2 (cs) 1988-06-21

Family

ID=11802405

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1233487A Granted JPS62174929A (ja) 1987-01-23 1987-01-23 半導体記憶装置の製造方法

Country Status (1)

Country Link
JP (1) JPS62174929A (cs)

Also Published As

Publication number Publication date
JPS62174929A (ja) 1987-07-31

Similar Documents

Publication Publication Date Title
JPH0546101B2 (cs)
KR940008373B1 (ko) 반도체 장치의 제조방법
Mukai et al. Planar multilevel interconnection technology employing a polyimide
JPS6022497B2 (ja) 半導体装置
JPS6330785B2 (cs)
JPS6330786B2 (cs)
JPH0544189B2 (cs)
JPS59127843A (ja) 半導体装置の製造方法
JPS6136709B2 (cs)
US4702796A (en) Method for fabricting a semiconductor device
JPS627700B2 (cs)
Milek Silicon Nitride for Microelectronic Applications: Part 2 Applications and Devices
JPS6255696B2 (cs)
US4763182A (en) Semiconductor memory device with deep bit-line channel stopper
KR100260551B1 (ko) 소프트 에러율을 감소시킨 반도체 장치 및 그 제조방법
JPS6314477A (ja) 半導体装置
JPH0298898A (ja) ダイオード読出専用メモリ装置
JPS58116755A (ja) 半導体装置
JPS6257244A (ja) 半導体装置
KR100439831B1 (ko) 반도체소자
JPH0584673B2 (cs)
JP3334760B2 (ja) 半導体装置の製造方法
JPS6212151A (ja) 半導体装置
JPS6150348A (ja) 半導体装置の製造方法
JPH04291954A (ja) 半導体記憶装置