JPS6330561B2 - - Google Patents
Info
- Publication number
- JPS6330561B2 JPS6330561B2 JP1918480A JP1918480A JPS6330561B2 JP S6330561 B2 JPS6330561 B2 JP S6330561B2 JP 1918480 A JP1918480 A JP 1918480A JP 1918480 A JP1918480 A JP 1918480A JP S6330561 B2 JPS6330561 B2 JP S6330561B2
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- fourier transform
- unit
- inspected
- inverse fourier
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000007547 defect Effects 0.000 claims description 54
- 238000001228 spectrum Methods 0.000 claims description 13
- 238000000034 method Methods 0.000 claims description 11
- 238000007689 inspection Methods 0.000 claims description 9
- 230000003287 optical effect Effects 0.000 claims description 6
- 239000013307 optical fiber Substances 0.000 claims description 6
- 230000001131 transforming effect Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 7
- 238000001514 detection method Methods 0.000 description 5
- 230000002950 deficient Effects 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000004753 textile Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N21/95623—Inspecting patterns on the surface of objects using a spatial filtering method
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1918480A JPS56117106A (en) | 1980-02-20 | 1980-02-20 | Inspecting device for pattern defect |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1918480A JPS56117106A (en) | 1980-02-20 | 1980-02-20 | Inspecting device for pattern defect |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56117106A JPS56117106A (en) | 1981-09-14 |
JPS6330561B2 true JPS6330561B2 (de) | 1988-06-20 |
Family
ID=11992244
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1918480A Granted JPS56117106A (en) | 1980-02-20 | 1980-02-20 | Inspecting device for pattern defect |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56117106A (de) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2613830B1 (fr) * | 1987-04-08 | 1990-11-02 | Commissariat Energie Atomique | Dispositif pour determiner le contraste d'un ecran d'affichage en fonction de la direction d'observation |
JP2644609B2 (ja) * | 1990-05-28 | 1997-08-25 | 科学技術振興事業団 | ヘテロダイン検波受光系を用いた振幅像及び位相像の同時検出装置 |
KR101084167B1 (ko) * | 2009-03-04 | 2011-11-17 | 삼성모바일디스플레이주식회사 | 마스크 검사 장치 및 마스크 검사 방법 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54105967A (en) * | 1978-02-08 | 1979-08-20 | Toshiba Corp | Defect test system for pattern featuring directivity |
-
1980
- 1980-02-20 JP JP1918480A patent/JPS56117106A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54105967A (en) * | 1978-02-08 | 1979-08-20 | Toshiba Corp | Defect test system for pattern featuring directivity |
Also Published As
Publication number | Publication date |
---|---|
JPS56117106A (en) | 1981-09-14 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2795595B2 (ja) | 透明板状体の欠点検出方法 | |
US5428442A (en) | Inspection system with in-lens, off-axis illuminator | |
US5471066A (en) | Defect inspection apparatus of rotary type | |
EP0500293B1 (de) | Verfahren und Vorrichtung zum Nachweis von Teilchen | |
US5076692A (en) | Particle detection on a patterned or bare wafer surface | |
US4898471A (en) | Particle detection on patterned wafers and the like | |
KR890001175A (ko) | 반도체 결점 검출용 영상 시스템 및 그 방법 | |
US3814943A (en) | Method of and apparatus for analysing patterns and inspecting objects | |
US6208750B1 (en) | Method for detecting particles using illumination with several wavelengths | |
CA1139862A (en) | Apparatus for inspecting translucent articles for faults | |
JPS6234097B2 (de) | ||
JPS6330561B2 (de) | ||
JPH0546937B2 (de) | ||
KR920008883A (ko) | 반도체 양산 라인에 있어서의 실시간에 의한 이물 검사 방법 및 장치 | |
JPH02107951A (ja) | ピンホール検査装置 | |
JPH0783840A (ja) | 回転型欠陥検査装置 | |
JPH0694633A (ja) | 欠陥検査装置 | |
JPS62200251A (ja) | 表面欠陥検出装置 | |
JPS5853861B2 (ja) | 表面欠陥検出装置 | |
JPS6333094B2 (de) | ||
JPH05188004A (ja) | 異物検出装置 | |
JPS632041B2 (de) | ||
JPS62215804A (ja) | 部品位置検知装置 | |
JPH102864A (ja) | 異物検査装置 | |
SU798567A1 (ru) | Устройство дл контрол дефектовпОВЕРХНОСТи ТЕл ВРАщЕНи |