JPS6330561B2 - - Google Patents

Info

Publication number
JPS6330561B2
JPS6330561B2 JP1918480A JP1918480A JPS6330561B2 JP S6330561 B2 JPS6330561 B2 JP S6330561B2 JP 1918480 A JP1918480 A JP 1918480A JP 1918480 A JP1918480 A JP 1918480A JP S6330561 B2 JPS6330561 B2 JP S6330561B2
Authority
JP
Japan
Prior art keywords
pattern
fourier transform
unit
inspected
inverse fourier
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1918480A
Other languages
English (en)
Japanese (ja)
Other versions
JPS56117106A (en
Inventor
Shunsuke Mukasa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP1918480A priority Critical patent/JPS56117106A/ja
Publication of JPS56117106A publication Critical patent/JPS56117106A/ja
Publication of JPS6330561B2 publication Critical patent/JPS6330561B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956Inspecting patterns on the surface of objects
    • G01N21/95623Inspecting patterns on the surface of objects using a spatial filtering method

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP1918480A 1980-02-20 1980-02-20 Inspecting device for pattern defect Granted JPS56117106A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1918480A JPS56117106A (en) 1980-02-20 1980-02-20 Inspecting device for pattern defect

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1918480A JPS56117106A (en) 1980-02-20 1980-02-20 Inspecting device for pattern defect

Publications (2)

Publication Number Publication Date
JPS56117106A JPS56117106A (en) 1981-09-14
JPS6330561B2 true JPS6330561B2 (de) 1988-06-20

Family

ID=11992244

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1918480A Granted JPS56117106A (en) 1980-02-20 1980-02-20 Inspecting device for pattern defect

Country Status (1)

Country Link
JP (1) JPS56117106A (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2613830B1 (fr) * 1987-04-08 1990-11-02 Commissariat Energie Atomique Dispositif pour determiner le contraste d'un ecran d'affichage en fonction de la direction d'observation
JP2644609B2 (ja) * 1990-05-28 1997-08-25 科学技術振興事業団 ヘテロダイン検波受光系を用いた振幅像及び位相像の同時検出装置
KR101084167B1 (ko) * 2009-03-04 2011-11-17 삼성모바일디스플레이주식회사 마스크 검사 장치 및 마스크 검사 방법

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54105967A (en) * 1978-02-08 1979-08-20 Toshiba Corp Defect test system for pattern featuring directivity

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54105967A (en) * 1978-02-08 1979-08-20 Toshiba Corp Defect test system for pattern featuring directivity

Also Published As

Publication number Publication date
JPS56117106A (en) 1981-09-14

Similar Documents

Publication Publication Date Title
JP2795595B2 (ja) 透明板状体の欠点検出方法
US5428442A (en) Inspection system with in-lens, off-axis illuminator
US5471066A (en) Defect inspection apparatus of rotary type
EP0500293B1 (de) Verfahren und Vorrichtung zum Nachweis von Teilchen
US5076692A (en) Particle detection on a patterned or bare wafer surface
US4898471A (en) Particle detection on patterned wafers and the like
KR890001175A (ko) 반도체 결점 검출용 영상 시스템 및 그 방법
US3814943A (en) Method of and apparatus for analysing patterns and inspecting objects
US6208750B1 (en) Method for detecting particles using illumination with several wavelengths
CA1139862A (en) Apparatus for inspecting translucent articles for faults
JPS6234097B2 (de)
JPS6330561B2 (de)
JPH0546937B2 (de)
KR920008883A (ko) 반도체 양산 라인에 있어서의 실시간에 의한 이물 검사 방법 및 장치
JPH02107951A (ja) ピンホール検査装置
JPH0783840A (ja) 回転型欠陥検査装置
JPH0694633A (ja) 欠陥検査装置
JPS62200251A (ja) 表面欠陥検出装置
JPS5853861B2 (ja) 表面欠陥検出装置
JPS6333094B2 (de)
JPH05188004A (ja) 異物検出装置
JPS632041B2 (de)
JPS62215804A (ja) 部品位置検知装置
JPH102864A (ja) 異物検査装置
SU798567A1 (ru) Устройство дл контрол дефектовпОВЕРХНОСТи ТЕл ВРАщЕНи