JPS6328124U - - Google Patents
Info
- Publication number
- JPS6328124U JPS6328124U JP11937486U JP11937486U JPS6328124U JP S6328124 U JPS6328124 U JP S6328124U JP 11937486 U JP11937486 U JP 11937486U JP 11937486 U JP11937486 U JP 11937486U JP S6328124 U JPS6328124 U JP S6328124U
- Authority
- JP
- Japan
- Prior art keywords
- silicon wafers
- chemical vapor
- chemical
- vapor generator
- view
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 235000012431 wafers Nutrition 0.000 claims description 12
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 9
- 229910052710 silicon Inorganic materials 0.000 claims description 9
- 239000010703 silicon Substances 0.000 claims description 9
- 239000000126 substance Substances 0.000 claims description 9
- 238000012993 chemical processing Methods 0.000 claims description 3
- 238000012545 processing Methods 0.000 claims description 3
- 238000000034 method Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Physical Or Chemical Processes And Apparatus (AREA)
Description
第１図は本考案によるシリコンウエーハの薬品
処理装置の一実施例の概略線図、第２図は第１図
に示した薬品処理装置に用いられるウエーハ処理
槽の斜視図、第３図は第１図に示した薬品処理装
置に用いられる薬品蒸気発生器の斜視図、第４図
は従来のシリコンウエーハの薬品処理装置の概略
線図、第５図イは正常なシリコンウエーハの平面
図および部分拡大図、第５図ロは表面に水が溜つ
たシリコンウエーハの平面図および部分拡大図で
ある。
２ａ……薬液槽、３ａ……水洗槽、４……シリ
コンウエーハ、５……キヤリア、６……ロボツト
ハンドラ、１０……スクライブライン、１２……
薬品蒸気発生器、１３……ウエーハ処理槽、１４
……乾燥槽。
FIG. 1 is a schematic diagram of an embodiment of a silicon wafer chemical processing apparatus according to the present invention, FIG. 2 is a perspective view of a wafer processing tank used in the chemical processing apparatus shown in FIG. Figure 1 is a perspective view of a chemical vapor generator used in the chemical treatment equipment shown in Figure 4. Figure 4 is a schematic diagram of a conventional chemical treatment equipment for silicon wafers, and Figure 5 A is a plan view and portion of a normal silicon wafer. The enlarged view and FIG. 5B are a plan view and a partially enlarged view of a silicon wafer with water collected on its surface. 2a... Chemical tank, 3a... Washing tank, 4... Silicon wafer, 5... Carrier, 6... Robot handler, 10... Scribing line, 12...
Chemical steam generator, 13...Wafer processing tank, 14
...Drying tank.
Claims (1)
する薬品蒸気発生器と、該薬品蒸気発生器により
発生された薬品蒸気によりシリコンウエーハの表
面を処理するウエーハ処理槽と、表面処理したシ
リコンウエーハを乾燥する乾燥器とを有すること
を特徴とするシリコンウエーハの薬品処理装置。 A chemical vapor generator that generates chemical vapor to treat silicon wafers, a wafer processing tank that processes the surface of silicon wafers with the chemical vapor generated by the chemical vapor generator, and a dryer that dries the surface-treated silicon wafers. A chemical processing device for silicon wafers, characterized by having a container.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11937486U JPS6328124U (en) | 1986-08-05 | 1986-08-05 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11937486U JPS6328124U (en) | 1986-08-05 | 1986-08-05 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6328124U true JPS6328124U (en) | 1988-02-24 |
Family
ID=31006687
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11937486U Pending JPS6328124U (en) | 1986-08-05 | 1986-08-05 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6328124U (en) |
-
1986
- 1986-08-05 JP JP11937486U patent/JPS6328124U/ja active Pending
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