JPS60133631U - Infrared heat treatment equipment - Google Patents

Infrared heat treatment equipment

Info

Publication number
JPS60133631U
JPS60133631U JP2079084U JP2079084U JPS60133631U JP S60133631 U JPS60133631 U JP S60133631U JP 2079084 U JP2079084 U JP 2079084U JP 2079084 U JP2079084 U JP 2079084U JP S60133631 U JPS60133631 U JP S60133631U
Authority
JP
Japan
Prior art keywords
heat treatment
treatment equipment
infrared heat
rod
infrared
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2079084U
Other languages
Japanese (ja)
Inventor
矢羽野　俊
魚落　泰雄
下田　春夫
守 前田
幹夫 高木
Original Assignee
富士通株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 富士通株式会社 filed Critical 富士通株式会社
Priority to JP2079084U priority Critical patent/JPS60133631U/en
Publication of JPS60133631U publication Critical patent/JPS60133631U/en
Pending legal-status Critical Current

Links

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  • Physical Or Chemical Processes And Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Drying Of Solid Materials (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of drawings]

第１図および第２図は従来の赤外線熱処理装置の平面図
と側面図、第３図および第４図は本考案にかかる赤外線
熱処理装置の平面図と側面図である。 図中、１，１１は上側の赤外線ランプ、２，１２は下側
の赤外線ランプ、Ｗは半導体ウェハーを示している。1 and 2 are a plan view and a side view of a conventional infrared heat treatment apparatus, and FIGS. 3 and 4 are a plan view and a side view of an infrared heat treatment apparatus according to the present invention. In the figure, 1 and 11 are upper infrared lamps, 2 and 12 are lower infrared lamps, and W is a semiconductor wafer.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 上側に配置された複数の棒状赤外線ランプと下側に配置
された複数の棒状赤外線ランプとが直交して設けられ、
該上下のランプ間に被処理体が載置される構造からなる
ことを特徴と艷赤外線警処理装置。A plurality of rod-shaped infrared lamps arranged on the upper side and a plurality of rod-shaped infrared lamps arranged on the lower side are provided orthogonally,
An infrared processing device characterized by having a structure in which an object to be processed is placed between the upper and lower lamps.
JP2079084U 1984-02-15 1984-02-15 Infrared heat treatment equipment Pending JPS60133631U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2079084U JPS60133631U (en) 1984-02-15 1984-02-15 Infrared heat treatment equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2079084U JPS60133631U (en) 1984-02-15 1984-02-15 Infrared heat treatment equipment

Publications (1)

Publication Number Publication Date
JPS60133631U true JPS60133631U (en) 1985-09-06

Family

ID=30511603

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2079084U Pending JPS60133631U (en) 1984-02-15 1984-02-15 Infrared heat treatment equipment

Country Status (1)

Country Link
JP (1) JPS60133631U (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03116828A (en) * 1989-09-29 1991-05-17 Hitachi Ltd Heat treatment device for semiconductor wafer
KR20030025146A (en) * 2001-09-19 2003-03-28 권영해 Heating apparatus of rapid thermal annealer and rapid thermal chemical vapor deposition for semiconductor device manufacturing

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58118112A (en) * 1981-12-30 1983-07-14 ア−ノン・エマニエル・ガツト Heat treating device for semiconductor material

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58118112A (en) * 1981-12-30 1983-07-14 ア−ノン・エマニエル・ガツト Heat treating device for semiconductor material

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03116828A (en) * 1989-09-29 1991-05-17 Hitachi Ltd Heat treatment device for semiconductor wafer
KR20030025146A (en) * 2001-09-19 2003-03-28 권영해 Heating apparatus of rapid thermal annealer and rapid thermal chemical vapor deposition for semiconductor device manufacturing

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