JPS6326333B2 - - Google Patents
Info
- Publication number
- JPS6326333B2 JPS6326333B2 JP56125961A JP12596181A JPS6326333B2 JP S6326333 B2 JPS6326333 B2 JP S6326333B2 JP 56125961 A JP56125961 A JP 56125961A JP 12596181 A JP12596181 A JP 12596181A JP S6326333 B2 JPS6326333 B2 JP S6326333B2
- Authority
- JP
- Japan
- Prior art keywords
- rays
- sample
- ray detector
- diffracted
- ray
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000013078 crystal Substances 0.000 claims description 13
- 238000001514 detection method Methods 0.000 claims description 2
- 238000010586 diagram Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 230000007723 transport mechanism Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
Landscapes
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56125961A JPS5828655A (ja) | 1981-08-13 | 1981-08-13 | 単結晶体の切断面検査装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56125961A JPS5828655A (ja) | 1981-08-13 | 1981-08-13 | 単結晶体の切断面検査装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5828655A JPS5828655A (ja) | 1983-02-19 |
| JPS6326333B2 true JPS6326333B2 (OSRAM) | 1988-05-30 |
Family
ID=14923256
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56125961A Granted JPS5828655A (ja) | 1981-08-13 | 1981-08-13 | 単結晶体の切断面検査装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5828655A (OSRAM) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL194811C (nl) * | 1986-01-16 | 2003-03-04 | Mitsubishi Electric Corp | Servoschakeling. |
| US5619548A (en) * | 1995-08-11 | 1997-04-08 | Oryx Instruments And Materials Corp. | X-ray thickness gauge |
-
1981
- 1981-08-13 JP JP56125961A patent/JPS5828655A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5828655A (ja) | 1983-02-19 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US7600916B2 (en) | Target alignment for X-ray scattering measurements | |
| JP3712531B2 (ja) | Ｘａｆｓ測定方法及びｘａｆｓ測定装置 | |
| KR920008464A (ko) | 근접 리소그래픽 시스템의 횡축 위치 측정장치 및 방법 | |
| TWI650551B (zh) | X光刀緣之封閉迴路控制 | |
| KR20120027262A (ko) | Ｘ선 산란 측정장치 및 ｘ선 산란 측정방법 | |
| JP2004239802A (ja) | Ｘ線分析装置及びｘ線分析方法 | |
| US20040109534A1 (en) | Fluorescent X-ray analysis apparatus | |
| JP2001021507A (ja) | Ｘａｆｓ測定装置 | |
| US6577705B1 (en) | Combinatorial material analysis using X-ray capillary optics | |
| JP3519203B2 (ja) | Ｘ線装置 | |
| JP2821585B2 (ja) | 面内分布測定方法及び装置 | |
| JP3968350B2 (ja) | Ｘ線回折装置及び方法 | |
| JPS6326333B2 (OSRAM) | ||
| JP2000314708A (ja) | Ｘ線トポグラフィ装置 | |
| US5353324A (en) | Total reflection X-ray diffraction micrographic method and apparatus | |
| JP4563701B2 (ja) | Ｘ線結晶方位測定装置及びｘ線結晶方位測定方法 | |
| JPH0610659B2 (ja) | Ｘ線分析装置 | |
| US3855469A (en) | Device for the display of local disorientations in single crystals | |
| JP3590681B2 (ja) | Ｘ線吸収微細構造分析方法およびその装置 | |
| JP2000275113A (ja) | Ｘ線応力測定方法および測定装置 | |
| JP2921597B2 (ja) | 全反射スペクトル測定装置 | |
| JPH0254496B2 (OSRAM) | ||
| JPH0625740B2 (ja) | 結晶基板の薄膜層内欠陥検出方法 | |
| Young Jr et al. | A Camera for Borrmann Stereo X-Ray Topographs | |
| GB2292658A (en) | Compact X-ray diffraction micrograph device |