JPS63251936A - Production of magnetic recording medium - Google Patents

Production of magnetic recording medium

Info

Publication number
JPS63251936A
JPS63251936A JP8602887A JP8602887A JPS63251936A JP S63251936 A JPS63251936 A JP S63251936A JP 8602887 A JP8602887 A JP 8602887A JP 8602887 A JP8602887 A JP 8602887A JP S63251936 A JPS63251936 A JP S63251936A
Authority
JP
Japan
Prior art keywords
target
film
sputtering
magnetic recording
moving
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8602887A
Other languages
Japanese (ja)
Inventor
Koichi Shinohara
紘一 篠原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP8602887A priority Critical patent/JPS63251936A/en
Publication of JPS63251936A publication Critical patent/JPS63251936A/en
Pending legal-status Critical Current

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  • Manufacturing Of Magnetic Record Carriers (AREA)

Abstract

PURPOSE:To uniformly obtain good C/N in high-density magnetic recording and reproducing at a high speed and to permit formation of a material for which there are heretofore no available mass production means to a thinner film by using a moving vapor deposited film to form a target at the time of forming a thin ferromagnetic metallic film by sputtering vapor deposition. CONSTITUTION:The endless target 14 is constituted of titanium foil or nonmagnetic stainless steel foil, etc., and deposited with the thin ferromagnetic metallic film by evaporation on the surface opposite to a high-polymer film 10. More specifically, the target 14 is constituted of the moving vapor deposited film at the time of forming the thin ferromagnetic metallic film by the sputtering vapor deposition on the moving substrate 10. Since the ferromagnetic part of the target is thin, an electromagnetic field for trapping electrons does not change and is strong and, therefore, uniform conditions are maintained and the higher speed is obtd. Since the constituting elements are merely required to be discretely controlled and taken into the vapor deposited film, even the material which cannot be worked to a sheet is usable as a sputtering target.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は強磁性金属薄膜を磁気記録層とする磁気記録媒
体の製造方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a method of manufacturing a magnetic recording medium using a ferromagnetic metal thin film as a magnetic recording layer.

従来の技術 近年、磁気記録の高密度化の進歩は著しいものがあり、
磁気ヘッド・磁気記録媒体の組み合わせに新しい技術開
発を必要とするに至っている。即ち、記録単位が小さく
なるにつれて、磁束量が減少することから、磁束微分形
の記録再生の実用水準の07Nを保持するのに、高い磁
束密度をもった材料の活用が不可欠となってきている〔
特公昭5B−91号公報、特開昭61−139919号
公報〕。かかる磁気記録媒体は、回転支持体で冷却しな
がらポリエステルフィルム、ポリイミドフィルム等の高
分子フィルム上に電子ビーム蒸着法。
Conventional technology In recent years, there has been remarkable progress in increasing the density of magnetic recording.
It has become necessary to develop new technology for the combination of magnetic heads and magnetic recording media. That is, as the recording unit becomes smaller, the amount of magnetic flux decreases, so it has become essential to use materials with high magnetic flux density in order to maintain the practical level of 07N for magnetic flux differential type recording and reproduction. [
Japanese Patent Publication No. 5B-91, Japanese Unexamined Patent Publication No. 139919/1982]. Such magnetic recording media are produced by electron beam evaporation onto polymer films such as polyester films and polyimide films while cooling with a rotating support.

イオンブレーティング法、スパッタリング法等で強磁性
金属薄膜を形成することによって得られるものである〔
特公昭61−47221号公報、特開昭57−2104
52号公報、特開昭60−59534号公報、特開昭6
1−240437号公報〕。
It is obtained by forming a ferromagnetic metal thin film using ion blating method, sputtering method, etc.
Japanese Patent Publication No. 61-47221, Japanese Patent Publication No. 57-2104
No. 52, JP-A-60-59534, JP-A-Sho 6
1-240437].

磁気記録媒体のうち、磁気テープの製造は電子ビーム蒸
着法、磁気ディスクの製造はスパッタ法が中心に検討さ
れている。又スパッタリング法としては、RFマグネト
ロン放電、DCマグネトロン放電、対向ターゲット型等
の応用が検討されている〔例えば特開昭61−2636
36〜263638号公報〕。
Among magnetic recording media, the electron beam evaporation method is mainly being considered for manufacturing magnetic tapes, and the sputtering method is mainly being considered for manufacturing magnetic disks. Furthermore, as sputtering methods, applications such as RF magnetron discharge, DC magnetron discharge, and facing target type are being considered [for example, Japanese Patent Laid-Open No. 61-2636
36-263638].

第2図はスパッタリング法を応用した場合の磁気記録媒
体製造装置の要部構成図である。第2図で1は高分子フ
ィルム、2は回転支持体、3は巻出し軸、4は巻取り軸
、5は強磁性合金の板状ターゲットで、6は磁界発生器
、7は真空槽、8は真空排気系、9はフリーローラーで
ある。ターゲットに切り込みを入れて、磁界の洩れを増
大させてスパッタ速度を早める等の工夫もみられるが、
一定の時間で二ロージッンと呼ばれる、スパッタリング
の集中する領域が生じるので、スパッタ速度の変化に対
して条件の調整が微妙に行われているのが実状である。
FIG. 2 is a block diagram of the main parts of a magnetic recording medium manufacturing apparatus to which the sputtering method is applied. In Fig. 2, 1 is a polymer film, 2 is a rotating support, 3 is an unwinding shaft, 4 is a winding shaft, 5 is a plate-shaped target of a ferromagnetic alloy, 6 is a magnetic field generator, 7 is a vacuum chamber, 8 is a vacuum exhaust system, and 9 is a free roller. There are some ideas such as making cuts in the target to increase the leakage of the magnetic field and speed up the sputtering speed.
Since a region where sputtering is concentrated, called a double loss zone, occurs over a certain period of time, the actual situation is that conditions are delicately adjusted in response to changes in sputtering speed.

発明が解決しようとする問題点 しかしながら上記した構成では、記録密度が増大してき
た時に、変調ノイズが場所により不均一になることがあ
り、改善が望まれていたのと、高速化にも限度がある点
、板状に加工できない材料が強磁性金属薄膜として用い
られない等の問題点もあり改善が望まれていた。
Problems to be Solved by the Invention However, with the above configuration, when the recording density increases, the modulation noise may become uneven depending on the location, and there is a desire for improvement, and there is a limit to how high the speed can be increased. There are certain problems, such as the fact that materials that cannot be processed into plate shapes cannot be used as ferromagnetic metal thin films, and improvements have been desired.

本発明は上記した事情に鑑みなされたもので、高密度記
録再生特性(C/N)の良好でかつ均一な磁気記録媒体
を高速で製造することの出来る磁気記録媒体の製造方法
を提供するものである。
The present invention has been made in view of the above-mentioned circumstances, and provides a method for manufacturing a magnetic recording medium that can manufacture a magnetic recording medium with good and uniform high-density recording and reproduction characteristics (C/N) at high speed. It is.

問題点を解決するための手段 上記した問題点を解決するため、本発明の磁気記録媒体
の製造方法は、移動する基板に強磁性金属薄膜をスパッ
タ蒸着する際、ターゲットが移動する蒸着膜で構成した
ものである。
Means for Solving the Problems In order to solve the above-mentioned problems, the method for manufacturing a magnetic recording medium of the present invention comprises a deposition film in which a target moves when a ferromagnetic metal thin film is sputter-deposited on a moving substrate. This is what I did.

作用 本発明の磁気記録媒体の製造方法は、上記した構成によ
り、ターゲットの強磁性部が薄いために、電子トラップ
のための磁界が、変化せずかつ、強いため、均一に条件
を保てるのと、右速化が図れる。又、蒸着膜に構成元素
を個別に制御してとり込めばよいため、板に加工できな
い材料でも、スパッタターゲットとすることができるこ
とになる。
Operation The method for manufacturing a magnetic recording medium of the present invention has the above-described structure, and since the ferromagnetic part of the target is thin, the magnetic field for trapping electrons does not change and is strong, so it is possible to maintain uniform conditions. , speed can be increased to the right. Furthermore, since the constituent elements can be individually controlled and incorporated into the deposited film, even materials that cannot be processed into plates can be used as sputter targets.

実施例 以下、図面を参照しながら、本発明の一実施例に係る磁
気記録媒体の製造方法について説明する。
EXAMPLE Hereinafter, a method for manufacturing a magnetic recording medium according to an example of the present invention will be described with reference to the drawings.

第1図は、本発明を実施するのに用いたスパッタ蒸着装
置の要部構成図である。第1図に於て、10はポリエチ
レンテレフタレート、ポリフェニレンサルファイド等の
高分子フィルムで11は回転支持体で12はフィルムの
送り出し軸、13は巻取り軸、14はエンドレスターゲ
ットで、チタン箔や非磁性のステンレス箔などから構成
し高分子フィルムと対向する面に、強磁性金属薄膜を蒸
着したものである。16は回転ローラ式のガス導入ノズ
ルで、16.17は蒸着材科人、Bで、18は蒸発源容
器、19は真空槽で上室2oと下室21に分は上、下別
々に真空槽内部を排気するようにしたもので、図では2
2の真空排気系のみ示している。23はかくへきてベル
トの一部とで、上。
FIG. 1 is a block diagram of main parts of a sputter deposition apparatus used to carry out the present invention. In Figure 1, 10 is a polymer film such as polyethylene terephthalate or polyphenylene sulfide, 11 is a rotating support, 12 is a film feed shaft, 13 is a winding shaft, and 14 is an endless target, which is made of titanium foil or non-magnetic material. A ferromagnetic metal thin film is deposited on the surface facing the polymer film. 16 is a rotating roller type gas introduction nozzle, 16 and 17 are evaporation materials, 18 is an evaporation source container, 19 is a vacuum chamber, and the upper chamber 2o and the lower chamber 21 are separately vacuumed. It is designed to exhaust the inside of the tank, and the figure shows 2.
Only the vacuum evacuation system of No. 2 is shown. 23 is part of the belt, above.

下室間の差圧保持を行えるようにしたものである。It is designed to maintain the differential pressure between the lower chambers.

24.25は回転ローラーで26.27は磁界発生器で
マグネトロン放電をスパッタリングに応用するためのも
のである。第1図で、回転支持体の直径を60濡とし、
ベルトを厚み26μmのチタン箔で構成し、ム0ム1.
ムOA2の長さを夫々22備とし、回転支持体との至近
距離を5備として、磁界強度は、エンドレスベルト表面
で、16Q(Os)とした。回転ローラ式のノズルは、
直径2眞の円筒を8等分して、o、3φの孔を高分子フ
ィルムの幅方向に16ケずつ配列したものを用いた。ス
パッタリングのやり方は一蒸着謙をチタン箔上にO,2
5μから1μmの範囲に保つように、蒸着条件と、スパ
ッタリング条件を調整して行い、エンドレスベルトの周
速は1 m/m1n一定とした。
24 and 25 are rotating rollers, and 26 and 27 are magnetic field generators for applying magnetron discharge to sputtering. In Figure 1, the diameter of the rotating support is 60mm,
The belt is made of titanium foil with a thickness of 26 μm.
The length of each arm OA2 was 22 mm, the close distance to the rotating support was 5 mm, and the magnetic field strength was 16 Q (Os) on the surface of the endless belt. The rotating roller nozzle is
A cylinder with a diameter of 2 mm was divided into 8 equal parts, and 16 holes each having a diameter of 3 mm were arranged in the width direction of the polymer film. The method of sputtering is to place one vapor-deposited layer onto titanium foil with O,2
The deposition conditions and sputtering conditions were adjusted to keep the thickness within the range of 5 μm to 1 μm, and the circumferential speed of the endless belt was kept constant at 1 m/m1n.

厚み10μmのポリエチレンテレフタレートフィルムを
用い、その上に直径100人のAl2O3微粒子を、平
均1oシ(l1m)2配し、その表面に、CoNi(N
i20wt%)を0.15μmxバッタ蒸着した。比較
例は、厚さ10鵡の板状ターゲットを用い、ムrガス圧
2X10”(TOrr)で、13.56(MH2)の高
周波電力を1.65(KW)投入したグロー放電に磁界
強度として3o(0θ)を組み合わせたマグネトロン放
電によりスパッタ蒸着を行った。その時フィルムの送り
速度は4.2(m/m1nlであった。一方実施例は、
人r10□=1o/1の混合気体を回転ローラ式ノズル
から導入し、4.5X10  (Torr)で13.5
6 (MHz )。
A polyethylene terephthalate film with a thickness of 10 μm was used, on which 100 Al2O3 fine particles with a diameter of 10 μm were placed on average, and CoNi (N
i20wt%) was deposited in a 0.15 μm x grasshopper evaporation manner. In the comparative example, a plate-shaped target with a thickness of 10 mm was used, and the magnetic field strength was applied to a glow discharge in which 1.65 (KW) of high-frequency power of 13.56 (MH2) was input at a gas pressure of 2 x 10'' (TOrr). Sputter deposition was carried out by magnetron discharge in combination with 3o (0θ).The film feeding speed was 4.2 (m/m1nl).On the other hand, in the example,
A mixed gas of r10□=1o/1 was introduced from a rotating roller type nozzle, and the temperature was 13.5 at 4.5X10 (Torr).
6 (MHz).

1.65 KWのマグネトロン放電により、スパッタ蒸
着を行った。フィルムの送り速度は7倍強の3゜rn 
7m i nであった。
Sputter deposition was performed using a 1.65 KW magnetron discharge. The film feed speed is 3°rn, which is more than 7 times faster.
It was 7 min.

夫々に、パーフロロオクタン酸を40人真空蒸着して、
8ミリ幅の磁気テープとして、市販の8ミリビデオ[”
VX−sol、机下電器製〕を改造して、記録波長を0
.66μmとした時の07Mft比較した。実施例は比
較例に比べて3.9(dB)良好な07Nを示しだ。こ
れは、雑音が改良されているためである。この両者比較
より、本発明は、高速性に優れ、C/Nにおいても良好
で、その有価値性が理解される。
40 people vacuum-deposited perfluorooctanoic acid on each.
Commercially available 8mm video [”
VX-sol, made by Kishita Denki] was modified to set the recording wavelength to 0.
.. A comparison was made of 07Mft when the diameter was 66μm. The example showed 07N which was 3.9 (dB) better than the comparative example. This is because the noise has been improved. From these comparisons, the present invention has excellent high-speed performance and good C/N ratio, and its value can be understood.

又、本発明によれば、これまで良好な磁気特性を均一に
得られなかった。Co−B(板状加工が出来ないのでス
パッタリング法ではCO版板上Bのつぶをおいて実験室
的に小規模に行えるに過ぎなかった)についても、均一
な特性を高速で得られるのと、Co−0r、Go−W、
co−Ti等についても、高速化が図られ、面内、垂直
を問わずに利点を生かすことができるものである。
Furthermore, according to the present invention, good magnetic properties could not be uniformly obtained until now. For Co-B (because it cannot be processed into a plate, the sputtering method can only be done on a small scale in the laboratory by crushing B on a CO plate), and it is possible to obtain uniform properties at high speed. , Co-0r, Go-W,
Co-Ti and the like are also capable of increasing speed, and their advantages can be utilized regardless of whether they are in-plane or perpendicular.

発明の効果 以上のように、本発明によれば、高密度磁気記録再生で
良好なC/Nを均一に、かつ高速で得られると共に従来
量産手段のなかった材料を薄膜化して、磁気記録に供す
ることができるといったすぐれた効果がある。
Effects of the Invention As described above, according to the present invention, a good C/N can be obtained uniformly and at high speed in high-density magnetic recording and reproduction, and materials for which there was no conventional means of mass production can be made into thin films for magnetic recording. It has the excellent effect of being able to provide

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例に係る磁気記録媒体の製造方
法を実施するのに用いたスパッタ蒸着装置の要部構成図
、第2図は従来のスパッタ蒸着装置の要部構成図である
。 10・・・・・・高分子フィルム、11・・・・・・回
転支持体、14・・・・・・エンドレスターゲラ)、1
5・・・・・・ガス導入ノズル(回転ローラ式)。 代理人の氏名 弁理士 中 尾 敏 男 ほか1名T4
−゛−エソrレスターゲット 1(T5−°−刀1人)iル 第2図
FIG. 1 is a block diagram of main parts of a sputter deposition apparatus used to carry out a method for manufacturing a magnetic recording medium according to an embodiment of the present invention, and FIG. 2 is a block diagram of main parts of a conventional sputter deposition apparatus. . 10... Polymer film, 11... Rotating support, 14... Endless galley), 1
5...Gas introduction nozzle (rotating roller type). Name of agent: Patent attorney Toshio Nakao and 1 other person T4
-゛-Esorless target 1 (T5-°-1 sword) Figure 2

Claims (1)

【特許請求の範囲】[Claims] 移動する基板に強磁性金属薄膜をスパッタ蒸着する際、
ターゲットが、移動する蒸着膜であることを特徴とする
磁気記録媒体の製造方法。
When sputter depositing a ferromagnetic metal thin film onto a moving substrate,
A method for manufacturing a magnetic recording medium, characterized in that the target is a moving deposited film.
JP8602887A 1987-04-08 1987-04-08 Production of magnetic recording medium Pending JPS63251936A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8602887A JPS63251936A (en) 1987-04-08 1987-04-08 Production of magnetic recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8602887A JPS63251936A (en) 1987-04-08 1987-04-08 Production of magnetic recording medium

Publications (1)

Publication Number Publication Date
JPS63251936A true JPS63251936A (en) 1988-10-19

Family

ID=13875200

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8602887A Pending JPS63251936A (en) 1987-04-08 1987-04-08 Production of magnetic recording medium

Country Status (1)

Country Link
JP (1) JPS63251936A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60217531A (en) * 1984-04-12 1985-10-31 Matsushita Electric Ind Co Ltd Production of magnetic recording medium

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60217531A (en) * 1984-04-12 1985-10-31 Matsushita Electric Ind Co Ltd Production of magnetic recording medium

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