JP2987406B2 - Film forming method and film forming apparatus - Google Patents

Film forming method and film forming apparatus

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Publication number
JP2987406B2
JP2987406B2 JP5347648A JP34764893A JP2987406B2 JP 2987406 B2 JP2987406 B2 JP 2987406B2 JP 5347648 A JP5347648 A JP 5347648A JP 34764893 A JP34764893 A JP 34764893A JP 2987406 B2 JP2987406 B2 JP 2987406B2
Authority
JP
Japan
Prior art keywords
film
film forming
diamond
roll
forming apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP5347648A
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Japanese (ja)
Other versions
JPH06251366A (en
Inventor
健二 伊藤
茂則 林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semiconductor Energy Laboratory Co Ltd
Original Assignee
Semiconductor Energy Laboratory Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semiconductor Energy Laboratory Co Ltd filed Critical Semiconductor Energy Laboratory Co Ltd
Priority to JP5347648A priority Critical patent/JP2987406B2/en
Priority to KR93031750A priority patent/KR960014698B1/en
Publication of JPH06251366A publication Critical patent/JPH06251366A/en
Priority to US08/604,713 priority patent/US6001431A/en
Application granted granted Critical
Publication of JP2987406B2 publication Critical patent/JP2987406B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、高耐久性の高記録密度
を有する量産性に優れた磁気記録媒体を高分子基板材料
上に形成する製造装置に関するもので、その産業上の利
用分野は映像機器、及び情報機器分野等多岐にわたる。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a manufacturing apparatus for forming a magnetic recording medium having high durability, high recording density, and excellent mass productivity on a polymer substrate material. It covers a wide variety of fields such as video equipment and information equipment.

【0002】[0002]

【従来の技術】近年、磁気記録媒体は高密度化の傾向に
あり、従来の磁気記録媒体の例としては、オーディオ,
ビデオ用テープ材料に用いられるγ−Fe2 3 粉末,
CrO粉末,純鉄粉末等を研磨材,バインダーと共に高
分子基板材料上に塗布した塗布型のものが使用されてき
たが、高密度化はもとより保持力,電磁変換特性等を改
良する目的で、真空蒸着法,メッキ法,イオンプレーテ
ィング法,スパッタ法等広義な意味でPVDと称される
方法により、Fe、Ni、Co、Cr等の磁性金属が高
い生産性を有し、安定な金属薄膜型の磁性層として形成
されている。
2. Description of the Related Art In recent years, magnetic recording media have tended to have higher densities.
Γ-Fe 2 O 3 powder used for video tape material,
A coating type in which CrO powder, pure iron powder, and the like are coated on a polymer substrate material together with an abrasive and a binder has been used. However, in order to improve not only the density, but also the coercive force, electromagnetic conversion characteristics, and the like, By a method called PVD in a broad sense, such as a vacuum deposition method, a plating method, an ion plating method, and a sputtering method, a magnetic metal such as Fe, Ni, Co, or Cr has high productivity and is a stable metal thin film. It is formed as a mold magnetic layer.

【0003】また、ダイヤモンド状炭素膜においても前
述の種々のPVD法あるいは、プラズマCVD法に代表
されるCVD法により形成されている。
[0003] Also, a diamond-like carbon film is formed by the above-mentioned various PVD methods or CVD methods typified by the plasma CVD method.

【0004】[0004]

【発明が解決しようとする課題】しかしながら、上記の
方法及び装置で高い被膜形成速度を維持しつつ、良好な
界面特性及び表面特性を有する積層薄膜を得ることは、
大気開放工程等の問題、及び磁性層とダイヤモンド状炭
素膜の被膜形成速度が大きく異なる為、同期させること
が技術的に困難である等の理由により、新しい技術の開
発が急がれていた。
However, it is difficult to obtain a laminated thin film having good interface characteristics and surface characteristics while maintaining a high film formation rate by the above method and apparatus.
Development of a new technology has been urgently required because of problems such as an open-to-atmosphere process and the fact that it is technically difficult to synchronize the magnetic layer and the diamond-like carbon film because the film formation speeds thereof are greatly different.

【0005】[0005]

【課題を解決するための手段】本発明は、複数の異なる
被膜形成工程による非連続的な方法を各工程間の動作圧
力の差圧を所望値に制御することにより、有機的かつ合
理的に連系,同期した被膜形成領域として区分しつつ一
体連結し、面内記録において等方な磁気特性を有し、高
い信頼性を持つ磁気記録媒体を量産可能にした。
SUMMARY OF THE INVENTION The present invention provides an organic and rational method of controlling a discontinuous method using a plurality of different film forming steps by controlling a differential pressure of an operating pressure between the steps to a desired value. It is possible to mass-produce a highly reliable magnetic recording medium that has isotropic magnetic properties in in-plane recording and is integrally connected while being divided into interconnected and synchronized film formation areas.

【0006】[0006]

【作用】本発明によれば、複数の工程よりなる被膜形成
領域すなわち、真空容器の動作圧力を段階または傾斜さ
せることで、真空装置として正常かつ機能的に動作する
ことはもとより、被膜形成の立場からも非常に効率的な
方法で高い効果すなわち、界面特性,密着性,表面特性
等を持つ積層薄膜群の形成を実現できる。
According to the present invention, the film forming region consisting of a plurality of steps, that is, the operating pressure of the vacuum vessel is stepped or inclined, so that the vacuum device can be normally and functionally operated, and the film forming position can be improved. Therefore, a highly efficient method can realize a high effect, that is, formation of a group of laminated thin films having interface characteristics, adhesion, surface characteristics, and the like.

【0007】[0007]

【実施例】本発明の実施例を図1乃至図4に基づいて説
明する。図1において、真空容器(1)1内の供給ロー
ル2から送られる高分子基板材料3はフリーローラガイ
ド4を経由して、円筒状キャン7に沿って矢印の向きに
走行する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described with reference to FIGS. In FIG. 1, a polymer substrate material 3 sent from a supply roll 2 in a vacuum vessel (1) 1 travels in a direction of an arrow along a cylindrical can 7 via a free roller guide 4.

【0008】本実施例では、高分子基板材料3として幅
50cm,厚さ6μmのポリイミドフィルムを使用し
た。
In this embodiment, a polyimide film having a width of 50 cm and a thickness of 6 μm was used as the polymer substrate material 3.

【0009】蒸発源6から蒸発した金属原子は高分子基
板材料3上に堆積し、磁性層21(図2参照)として
0.15〜0.18μmの膜厚に形成される。
The metal atoms evaporated from the evaporation source 6 are deposited on the polymer substrate material 3 to form a magnetic layer 21 (see FIG. 2) with a thickness of 0.15 to 0.18 μm.

【0010】本実施例では、蒸発物質として、Co−C
r−Ni合金を用い、広範囲な走査が可能なピアス型電
子銃を用い、加速電圧を35KV加え、5×10-4Torr
の動作圧力で電子ビーム蒸着法により形成した。高分子
基板材料3の通過速度は135m/min とした。なお、
遮へい板5は堆積領域を制限する為に設けられたもので
ある。
In this embodiment, Co-C is used as an evaporating substance.
Using an r-Ni alloy, a pierce-type electron gun capable of scanning over a wide range, and applying an accelerating voltage of 35 KV, 5 × 10 −4 Torr
Formed by an electron beam evaporation method at an operating pressure of. The passing speed of the polymer substrate material 3 was 135 m / min. In addition,
The shielding plate 5 is provided to limit the deposition area.

【0011】円筒状キャン7と形成された磁性層21と
の間には、フリーローラガイド4を介して、直流電源1
5によって電位差を設けることで、高分子基板材料3と
円筒状キャン7とは静電的に密着するよう80Vの電圧
を印加した。磁性層21が形成された高分子基板材料3
は、中間ロール8を経由して真空容器(2)9へ導か
れ、プラズマ活性化処理がなされる。
A DC power supply 1 is provided between the cylindrical can 7 and the formed magnetic layer 21 via a free roller guide 4.
5, a voltage of 80 V was applied so that the polymer substrate material 3 and the cylindrical can 7 were electrostatically adhered to each other. Polymer substrate material 3 on which magnetic layer 21 is formed
Is guided to the vacuum vessel (2) 9 via the intermediate roll 8, and is subjected to plasma activation processing.

【0012】ここで、プラズマ活性化処理工程について
説明する。接地電極10と高周波給電電極11が平行に
3cmの間隔で配設された電極間に原料ガス供給系18
より水素ガスを導入し、排気系19で排気しながら動作
圧力を10-1〜10-2Torrに制御し、13.56MHz
の高周波を0.5W/cm2の電力密度で高周波電源系1
2から印加し、水素プラズマを形成し、このプラズマ領
域16を高分子基板材料3が磁性層形成工程に同期した
速度で通過するようにした。
Here, the plasma activation process will be described. A source gas supply system 18 is provided between electrodes in which a ground electrode 10 and a high-frequency power supply electrode 11 are arranged in parallel at an interval of 3 cm.
The operating pressure was controlled to 10 -1 to 10 -2 Torr while introducing hydrogen gas from the exhaust system 19 and evacuating the exhaust system 19 to 13.56 MHz.
High frequency power system 1 at a power density of 0.5 W / cm 2
2 to form a hydrogen plasma, and the polymer substrate material 3 passes through the plasma region 16 at a speed synchronized with the magnetic layer forming step.

【0013】この工程を施すことで、磁性層21表面が
活性な水素ラジカルあるいは、水素イオンにさらされる
ことで、適度に清浄化されることはもとより、磁性層2
1表面の活性化が促進される。同様な効果がアルゴンガ
ス及びアルゴンと水素の混合ガスについても確認でき
た。尚、真空容器(2)9とバッファー室20を隔てる
壁に開けられた高分子基板材料3が通過するべき隙間の
大きさは前記真空容器(2)9で生成するプラズマ16
のデバイ距離もしくは該プラズマ領域16の圧力におけ
る平均自由行程より小さくするとよい。そうするとプラ
ズマがバッファー室20に漏れだすことがなくなる。
By performing this step, the surface of the magnetic layer 21 is not only appropriately cleaned by being exposed to active hydrogen radicals or hydrogen ions, but also is
Activation of one surface is promoted. Similar effects were confirmed for argon gas and a mixed gas of argon and hydrogen. The size of the gap through which the polymer substrate material 3 formed on the wall separating the vacuum chamber (2) 9 and the buffer chamber 20 should pass depends on the plasma 16 generated in the vacuum chamber (2) 9.
Or the mean free path at the pressure of the plasma region 16. Then, the plasma does not leak into the buffer chamber 20.

【0014】更に本発明におけるダイヤモンド状炭素膜
22の形成領域である真空容器(3)13について説明
する。フリーローラガイド4を介して導かれた磁性層2
1が堆積された高分子基板材料3は、シートビーム型プ
ラズマ領域17を通過する過程で良質のダイヤモンド状
炭素膜22が形成される。
Further, the vacuum vessel (3) 13, which is a region where the diamond-like carbon film 22 is formed in the present invention, will be described. Magnetic layer 2 guided via free roller guide 4
The high quality diamond-like carbon film 22 is formed on the polymer substrate material 3 on which 1 is deposited while passing through the sheet beam type plasma region 17.

【0015】ここで、シートビーム型プラズマ領域17
を発生させる手段について具体的な条件の一例を示す。
Here, the sheet beam type plasma region 17
An example of a specific condition for the means for generating is shown.

【0016】接地電極10と高周波給電電極11が平行
に1cmの間隔で精度よく配設された電極間に炭素ソー
スとしてエチレンガスを用い、動作圧力を1Torrに制御
した。さらに接地電極10を中空構造とし、原料ガスの
吹き出し部の寸法を幅0.5〜1.0cm,長さ60c
mのスリット状に高精度に加工したものとし、高周波電
源系12より3W/cm2 の電力密度の高周波を印加す
ることにより、局部的に線状の高輝度発光プラズマ領域
が発生し、前述の2つの工程と連動した通過速度で20
0Åの膜厚のダイヤモンドで形成され、巻取りロール1
4を介して回収した。ここで、高分子基板材料3は、高
周波給電電極11上を走行することが重要となる。
The operating pressure was controlled at 1 Torr by using ethylene gas as a carbon source between electrodes in which the ground electrode 10 and the high-frequency power supply electrode 11 were precisely arranged in parallel at an interval of 1 cm. Further, the ground electrode 10 has a hollow structure, and the size of the blowing portion of the raw material gas is 0.5 to 1.0 cm in width and 60 c in length.
m is processed into a slit shape with high precision, and a high-frequency power having a power density of 3 W / cm 2 is applied from the high-frequency power supply system 12 to locally generate a linear high-luminance emission plasma region. 20 with a passing speed linked to the two processes
Winding roll 1 made of diamond having a thickness of 0 °
Collected via 4. Here, it is important that the polymer substrate material 3 runs on the high-frequency power supply electrode 11.

【0017】これは、被膜形成基板上、すなわち高分子
基板材料3にダイヤモンド状炭素膜22を形成する場
合、被形成面を有する基板を設けた高周波給電電極11
の近傍において、プラズマ中の分子,原子,正負イオ
ン,電子,ラジカル等の内、移動度,質量等の差から電
子が高周波給電電極11はもとより、被形成面の表面に
蓄積されることによって生じる自己バイアスとプラズマ
電位(プラズマポテンシャル)との間に生成する電界に
より加速された正イオンが形成中のダイヤモンド状炭素
膜に衝突することで、物理的,化学的反応を促進させ、
C=Cのような二重結合を有する炭素の割合を減らし
て、C−C結合を有する炭素の割合を増やすことにより
被膜の高品質が得られる。
When the diamond-like carbon film 22 is formed on the film-formed substrate, that is, on the polymer substrate material 3, the high-frequency power supply electrode 11 provided with the substrate having the surface to be formed is provided.
In the vicinity of, due to differences in mobility, mass, and the like, among molecules, atoms, positive and negative ions, electrons, radicals, and the like in the plasma, electrons are generated not only on the high-frequency power supply electrode 11 but also on the surface of the formation surface. Positive ions accelerated by the electric field generated between the self-bias and the plasma potential (plasma potential) collide with the diamond-like carbon film being formed, thereby promoting a physical and chemical reaction,
By reducing the proportion of carbon having a double bond such as C = C and increasing the proportion of carbon having a CC bond, high quality of the coating can be obtained.

【0018】さらにまた、高分子基板材料3を所定の速
度で高周波給電電極11上を走行させることにより、被
膜形成基板が固定、すなわち静的な形成法でかつ高速で
形成する場合に見られるような被膜形成基板の熱的ダメ
ージの問題を解消し得る。
Further, by running the polymer substrate material 3 on the high-frequency power supply electrode 11 at a predetermined speed, the film-forming substrate is fixed, that is, when the film-forming substrate is formed at a high speed by a static forming method. Thus, the problem of thermal damage to the substrate on which the film is formed can be solved.

【0019】図2は、以上の被膜形成工程で作製された
磁気記録媒体の断面図を示し、磁性層21とダイヤモン
ド状炭素膜22の界面特性を著しく向上させることがで
きた。
FIG. 2 is a cross-sectional view of the magnetic recording medium manufactured in the above-described film forming step, and the interface characteristics between the magnetic layer 21 and the diamond-like carbon film 22 were significantly improved.

【0020】図3は、本発明の実施例で得たダイヤモン
ド状炭素膜22のラマンスペクトルを示し、高速で堆積
したにもかかわらず、良質な膜質であることを示してい
る。
FIG. 3 shows a Raman spectrum of the diamond-like carbon film 22 obtained in the embodiment of the present invention, and shows that the film quality is good despite the high-speed deposition.

【0021】本発明を実施するにあたり、磁性層21の
形成前の処理としては、必要に応じイオン及び電子等の
照射、あるいは加熱等公知の技術を用いて行うことがで
きる。また基板として、例えば、本実施例ではポリイミ
ドフィルムを用いたが、金属樹脂,プラスチック等をロ
ール状あるいは板状にしてもよい。
In practicing the present invention, the treatment before the formation of the magnetic layer 21 can be performed by using a known technique such as irradiation with ions and electrons or heating, if necessary. As the substrate, for example, a polyimide film is used in this embodiment, but a metal resin, a plastic, or the like may be formed in a roll shape or a plate shape.

【0022】図4は、再生出力のダイヤモンド状炭素膜
22の膜厚依存性を記録周波数をかえて評価した結果
で、ダイヤモンド状炭素膜22の膜厚が200Åを超え
る領域で再生出力が飽和し、表面の平滑性の重要性を示
唆している。
FIG. 4 shows the result of evaluating the dependence of the reproduction output on the film thickness of the diamond-like carbon film 22 by changing the recording frequency. The reproduction output is saturated in a region where the film thickness of the diamond-like carbon film 22 exceeds 200 °. , Suggesting the importance of surface smoothness.

【0023】さらに、作製した磁気記録媒体を8mm幅
のテープ状にカットし、市販の8mmビデオデッキを用
い、再生出力及び耐久性の評価を行ったところダイヤモ
ンド状炭素膜の22の膜厚が200Å以上のものでは、
走行安定性,スチル耐久性の優れたドロップアップの少
ない安定な再生出力が得られた。
Further, the produced magnetic recording medium was cut into an 8 mm wide tape and evaluated for reproduction output and durability using a commercially available 8 mm video deck. In the above,
Stable playback output with low drop-up and excellent running stability and still durability was obtained.

【0024】また、正規の再生動作の他に特殊な再生動
作の連続,断続試験においても優れた耐久性を示すこと
が確認できた。
Further, it was confirmed that excellent durability was exhibited in continuous and intermittent tests of special reproducing operations in addition to the normal reproducing operation.

【0025】[0025]

【発明の効果】以上の説明から明らかな通り、本発明の
製造装置で作製された磁気記録媒体は、磁性層21とダ
イヤモンド状炭素膜22の界面特性,密着性が改善され
た。更に大気にさらすことを避けるだけでは、磁性層2
1表面に生成される低級酸化物は本質的に除去できない
が、本発明によるプラズマ活性化処理が効果的であるこ
とも確認した。
As is clear from the above description, the magnetic recording medium manufactured by the manufacturing apparatus of the present invention has improved interface characteristics and adhesion between the magnetic layer 21 and the diamond-like carbon film 22. By simply avoiding further exposure to the atmosphere, the magnetic layer 2
Although lower oxides generated on one surface cannot be essentially removed, it was also confirmed that the plasma activation treatment according to the present invention was effective.

【0026】また、ダイヤモンド状炭素膜22の表面特
性すなわち、耐摩耗性、高平滑性,硬度等が著しく向上
し、産業的にも十分価値のある磁気記録媒体の製造を可
能とし、従来問題とされていた連続形成上の律則点も回
避することができた。
Further, the surface characteristics of the diamond-like carbon film 22, that is, abrasion resistance, high smoothness, hardness and the like are remarkably improved, and it is possible to manufacture a magnetic recording medium of industrially sufficient value. The rule point on continuous formation, which had been performed, could also be avoided.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施例における磁気記録媒体製造装置
の内部構造の概略を示す断面図
FIG. 1 is a sectional view schematically showing the internal structure of a magnetic recording medium manufacturing apparatus according to an embodiment of the present invention.

【図2】本発明の実施例で得た磁気記録媒体の断面図FIG. 2 is a sectional view of a magnetic recording medium obtained in an embodiment of the present invention.

【図3】本発明の実施例で得た磁気記録媒体におけるダ
イヤモンド状炭素膜のラマンスペクトルを示す。
FIG. 3 shows a Raman spectrum of a diamond-like carbon film in a magnetic recording medium obtained in an example of the present invention.

【図4】本発明の実施例で得た磁気記録媒体の再生出力
のダイヤモンド状炭素膜の膜厚依存性を示すデータであ
る。
FIG. 4 is data showing the dependence of the reproduction output of a magnetic recording medium obtained in an example of the present invention on the thickness of a diamond-like carbon film.

【符号の説明】[Explanation of symbols]

1・・・真空容器(1) 2・・・供給ロール 3・・・高分子基板材料 4・・・フリーローラガイド 5・・・遮へい板 6・・・蒸発源 7・・・円筒状キャン 8・・・中間ロール 9・・・真空容器(2) 10・・接地電極 11・・高周波給電電極 12・・高周波電源系 13・・真空容器(3) 14・・巻取りロール 15・・直流電源 16・・プラズマ領域 17・・シートビーム型プラズマ領域 18・・原料ガス供給系 19・・排気系 20・・バッファー室 DESCRIPTION OF SYMBOLS 1 ... Vacuum container (1) 2 ... Supply roll 3 ... Polymer substrate material 4 ... Free roller guide 5 ... Shield plate 6 ... Evaporation source 7 ... Cylindrical can 8・ ・ ・ Intermediate roll 9 ・ ・ ・ Vacuum container (2) 10 ・ ・ Ground electrode 11 ・ ・ High frequency power supply electrode 12 ・ ・ High frequency power supply system 13 ・ ・ Vacuum container (3) 14 ・ ・ Winding roll 15 ・ ・ DC power supply 16 ・ ・ Plasma region 17 ・ ・ Sheet beam type plasma region 18 ・ ・ Raw material supply system 19 ・ ・ Exhaust system 20 ・ ・ Buffer room

フロントページの続き (58)調査した分野(Int.Cl.6,DB名) G11B 5/84 C23C 14/06 G11B 5/85 H01F 41/20 Continued on the front page (58) Fields investigated (Int.Cl. 6 , DB name) G11B 5/84 C23C 14/06 G11B 5/85 H01F 41/20

Claims (5)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 基体に磁性層とダイヤモンド状炭素膜を
連続的に積層形成する被膜形成装置であって、 磁性層を形成する第1の真空容器とダイヤモンド状炭
素膜を形成する第2の真空容器とを少なくとも含み、
前記第1の真空容器と前記第2の真空容器の動作力の差
圧が10−2〜10−5Torrの範囲内に設定されて
いることを特徴とする被膜形成装置。
1. A magnetic layer and a diamond-like carbon film on a substrate.
A film forming apparatus for continuously laminated, comprising: a first vacuum chamber that form a magnetic layer, a second vacuum chamber that form a diamond-like carbon film, at least,
It said first differential pressure operation force of the vacuum container and the second vacuum vessel 10 -2 to 10 -5 Torr the film forming apparatus you characterized in that it is in the range of.
【請求項2】 請求項1において、前記第1の真空容器
前記第2の真空容器の間にプラズマ活性化処理を行
う第3の真空容器を設けたことを特徴とする被膜形成装
置。
2. A plasma activation process according to claim 1, wherein a plasma activation process is performed between said first vacuum vessel and said second vacuum vessel.
Cormorant film forming apparatus characterized in that a third vacuum vessel.
【請求項3】 請求項1において、前記第2の真空容器
内にシートビーム形のプラズマ領域発生手段を具備した
ことを特徴とする被膜形成装置。
3. A film forming apparatus according to claim 1, further comprising a sheet beam type plasma region generating means in said second vacuum vessel.
【請求項4】 ロール状に巻かれた有機樹脂のフィルム
を送り出しロールに設置し、該フィルムをガイドロール
を介して巻取りロールに送り出し、巻取りロールを回転
してフィルムを巻き取るロールツゥロール式フィルム処
理装置を用いて、前記フィルムにダイヤモンド状炭素膜
を形成する被膜形成方法において 前記ダイヤモンド状炭素膜はシートビーム形のプラズマ
領域発生手段を用いて形成されたことを特徴とする被膜
形成方法。
4. established a film of an organic resin rolled feeding the roll, feeding the winding roll the film through the gas Idororu, roll-to-roll by rotating the take-up roll to wind the film using equation film processor, the film forming method for forming a diamond-like carbon film on said film, said diamond-like carbon film coating, characterized in that it is formed by a plasma region generating means shaped sheet beamforming Method.
【請求項5】 請求項4において、前記送り出しロール
に設置するフィルムは磁性層を有することを特徴とする
被膜形成装置。
5. The delivery roll according to claim 4, wherein
Film to be installed in the film forming apparatus according to claim Rukoto which have a magnetic layer.
JP5347648A 1992-12-28 1993-12-24 Film forming method and film forming apparatus Expired - Fee Related JP2987406B2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP5347648A JP2987406B2 (en) 1992-12-28 1993-12-24 Film forming method and film forming apparatus
KR93031750A KR960014698B1 (en) 1992-12-28 1993-12-28 Method & system for forming film
US08/604,713 US6001431A (en) 1992-12-28 1996-02-21 Process for fabricating a magnetic recording medium

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP36019492 1992-12-28
JP4-360194 1992-12-28
JP5347648A JP2987406B2 (en) 1992-12-28 1993-12-24 Film forming method and film forming apparatus

Publications (2)

Publication Number Publication Date
JPH06251366A JPH06251366A (en) 1994-09-09
JP2987406B2 true JP2987406B2 (en) 1999-12-06

Family

ID=26578577

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5347648A Expired - Fee Related JP2987406B2 (en) 1992-12-28 1993-12-24 Film forming method and film forming apparatus

Country Status (1)

Country Link
JP (1) JP2987406B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4567867B2 (en) * 2000-10-24 2010-10-20 キヤノンアネルバ株式会社 Film forming apparatus for magnetic recording disk and method for manufacturing magnetic recording disk

Also Published As

Publication number Publication date
JPH06251366A (en) 1994-09-09

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