Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu LtdfiledCriticalFujitsu Ltd
Priority to JP10110581ApriorityCriticalpatent/JPS583634A/ja
Publication of JPS583634ApublicationCriticalpatent/JPS583634A/ja
Publication of JPS6323825B2publicationCriticalpatent/JPS6323825B2/ja
H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
H01J37/32—Gas-filled discharge tubes
H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
H01J37/32082—Radio frequency generated discharge
H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
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Physics & Mathematics
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Engineering & Computer Science
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Plasma & Fusion
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Chemical & Material Sciences
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Analytical Chemistry
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Physical Or Chemical Processes And Apparatus
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