JPS6323654B2 - - Google Patents

Info

Publication number
JPS6323654B2
JPS6323654B2 JP58200556A JP20055683A JPS6323654B2 JP S6323654 B2 JPS6323654 B2 JP S6323654B2 JP 58200556 A JP58200556 A JP 58200556A JP 20055683 A JP20055683 A JP 20055683A JP S6323654 B2 JPS6323654 B2 JP S6323654B2
Authority
JP
Japan
Prior art keywords
wafer
support
rotation
support points
drive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58200556A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6091640A (ja
Inventor
Teruo Watanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MITSUTOYO KK
Original Assignee
MITSUTOYO KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by MITSUTOYO KK filed Critical MITSUTOYO KK
Priority to JP58200556A priority Critical patent/JPS6091640A/ja
Publication of JPS6091640A publication Critical patent/JPS6091640A/ja
Publication of JPS6323654B2 publication Critical patent/JPS6323654B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
JP58200556A 1983-10-25 1983-10-25 ウエハの位置決め装置 Granted JPS6091640A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58200556A JPS6091640A (ja) 1983-10-25 1983-10-25 ウエハの位置決め装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58200556A JPS6091640A (ja) 1983-10-25 1983-10-25 ウエハの位置決め装置

Publications (2)

Publication Number Publication Date
JPS6091640A JPS6091640A (ja) 1985-05-23
JPS6323654B2 true JPS6323654B2 (en, 2012) 1988-05-17

Family

ID=16426269

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58200556A Granted JPS6091640A (ja) 1983-10-25 1983-10-25 ウエハの位置決め装置

Country Status (1)

Country Link
JP (1) JPS6091640A (en, 2012)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5237835Y2 (en, 2012) * 1972-06-26 1977-08-27
US4376482A (en) * 1981-05-19 1983-03-15 Tencor Instruments Wafer orientation system
JPS6175128U (en, 2012) * 1984-10-23 1986-05-21

Also Published As

Publication number Publication date
JPS6091640A (ja) 1985-05-23

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