JPS6323318A - 投影露光装置 - Google Patents

投影露光装置

Info

Publication number
JPS6323318A
JPS6323318A JP62088717A JP8871787A JPS6323318A JP S6323318 A JPS6323318 A JP S6323318A JP 62088717 A JP62088717 A JP 62088717A JP 8871787 A JP8871787 A JP 8871787A JP S6323318 A JPS6323318 A JP S6323318A
Authority
JP
Japan
Prior art keywords
light
reticle
light shielding
opening
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62088717A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0142130B2 (enrdf_load_stackoverflow
Inventor
Toshio Matsuki
松木　敏雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP62088717A priority Critical patent/JPS6323318A/ja
Publication of JPS6323318A publication Critical patent/JPS6323318A/ja
Publication of JPH0142130B2 publication Critical patent/JPH0142130B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Projection-Type Copiers In General (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP62088717A 1987-04-13 1987-04-13 投影露光装置 Granted JPS6323318A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62088717A JPS6323318A (ja) 1987-04-13 1987-04-13 投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62088717A JPS6323318A (ja) 1987-04-13 1987-04-13 投影露光装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP58152474A Division JPS6045252A (ja) 1983-08-23 1983-08-23 投影露光装置の照明系

Publications (2)

Publication Number Publication Date
JPS6323318A true JPS6323318A (ja) 1988-01-30
JPH0142130B2 JPH0142130B2 (enrdf_load_stackoverflow) 1989-09-11

Family

ID=13950655

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62088717A Granted JPS6323318A (ja) 1987-04-13 1987-04-13 投影露光装置

Country Status (1)

Country Link
JP (1) JPS6323318A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0439281U (enrdf_load_stackoverflow) * 1990-08-01 1992-04-02

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5393371A (en) * 1977-01-28 1978-08-16 Hitachi Ltd Device for drawing scan pattern
JPS5433425U (enrdf_load_stackoverflow) * 1977-08-06 1979-03-05
JPS55129333A (en) * 1979-03-28 1980-10-07 Hitachi Ltd Scale-down projection aligner and mask used for this
JPS55132039A (en) * 1979-04-02 1980-10-14 Mitsubishi Electric Corp Forming method for repeated figure
JPS56105635A (en) * 1980-01-18 1981-08-22 Optimetrix Corp Front surface illuminator for semiconductor wafer
JPS5843518A (ja) * 1981-09-09 1983-03-14 Nec Corp 投影露光装置
JPS5845533U (ja) * 1981-09-24 1983-03-26 株式会社日立製作所 照度分布測定装置
US4422755A (en) * 1980-01-18 1983-12-27 Optimetrix Corporation Frontal illumination system for semiconductive wafers

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5393371A (en) * 1977-01-28 1978-08-16 Hitachi Ltd Device for drawing scan pattern
JPS5433425U (enrdf_load_stackoverflow) * 1977-08-06 1979-03-05
JPS55129333A (en) * 1979-03-28 1980-10-07 Hitachi Ltd Scale-down projection aligner and mask used for this
JPS55132039A (en) * 1979-04-02 1980-10-14 Mitsubishi Electric Corp Forming method for repeated figure
JPS56105635A (en) * 1980-01-18 1981-08-22 Optimetrix Corp Front surface illuminator for semiconductor wafer
US4422755A (en) * 1980-01-18 1983-12-27 Optimetrix Corporation Frontal illumination system for semiconductive wafers
JPS5843518A (ja) * 1981-09-09 1983-03-14 Nec Corp 投影露光装置
JPS5845533U (ja) * 1981-09-24 1983-03-26 株式会社日立製作所 照度分布測定装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0439281U (enrdf_load_stackoverflow) * 1990-08-01 1992-04-02

Also Published As

Publication number Publication date
JPH0142130B2 (enrdf_load_stackoverflow) 1989-09-11

Similar Documents

Publication Publication Date Title
JPH0429212B2 (enrdf_load_stackoverflow)
US3748975A (en) Apparatus for and method of correcting a defective photomask
JP2866243B2 (ja) 投影露光装置及び半導体装置の製造方法
JPH03211813A (ja) 露光装置
JP2006019702A5 (enrdf_load_stackoverflow)
JPH07201723A (ja) 露光方法及び露光装置
JPH06118623A (ja) レチクル及びこれを用いた半導体露光装置
KR940000904B1 (ko) 사진평판 마스크 정렬장치 및 그 방법
JP2697014B2 (ja) 露光装置及び露光方法
JPH04133414A (ja) 縮小投影露光装置
KR940000496B1 (ko) 투영 노광장치
EP0036310B1 (en) Method and apparatus for amending a photomask
JPH0142129B2 (enrdf_load_stackoverflow)
JPS6323318A (ja) 投影露光装置
TW201433826A (zh) 照明光學系統、曝光裝置、以及裝置之製造方法
JPS6323319A (ja) 投影露光方法
US7237914B2 (en) Light condenser
JPS58215621A (ja) １「あ」１プロジエクシヨンアライナ
JPS6349367B2 (enrdf_load_stackoverflow)
JPH05326365A (ja) 投影露光装置
JPH0261131B2 (enrdf_load_stackoverflow)
JPH09232231A (ja) 不要レジスト露光装置
JPH10189408A (ja) 露光装置及び露光方法
JPS59218729A (ja) 投影露光装置
JP2003109895A (ja) 投影露光方法及びその装置