JPS63218139A - イオンビ−ム装置 - Google Patents
イオンビ−ム装置Info
- Publication number
- JPS63218139A JPS63218139A JP62051575A JP5157587A JPS63218139A JP S63218139 A JPS63218139 A JP S63218139A JP 62051575 A JP62051575 A JP 62051575A JP 5157587 A JP5157587 A JP 5157587A JP S63218139 A JPS63218139 A JP S63218139A
- Authority
- JP
- Japan
- Prior art keywords
- signal
- ion beam
- circuit
- output signal
- output
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Electron Sources, Ion Sources (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62051575A JPS63218139A (ja) | 1987-03-06 | 1987-03-06 | イオンビ−ム装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62051575A JPS63218139A (ja) | 1987-03-06 | 1987-03-06 | イオンビ−ム装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63218139A true JPS63218139A (ja) | 1988-09-12 |
| JPH0588503B2 JPH0588503B2 (https=) | 1993-12-22 |
Family
ID=12890746
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62051575A Granted JPS63218139A (ja) | 1987-03-06 | 1987-03-06 | イオンビ−ム装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63218139A (https=) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009010078A (ja) * | 2007-06-27 | 2009-01-15 | Nuflare Technology Inc | 電子ビーム描画装置及び電子ビームの電流密度調整方法 |
| CN108695128A (zh) * | 2017-04-11 | 2018-10-23 | 上海伟钊光学科技股份有限公司 | 具有束流自动反馈控制的考夫曼离子源 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58158852A (ja) * | 1982-03-17 | 1983-09-21 | Jeol Ltd | 荷電粒子フイルタ |
| JPS6039748A (ja) * | 1983-08-12 | 1985-03-01 | Jeol Ltd | イオンビ−ム集束装置 |
-
1987
- 1987-03-06 JP JP62051575A patent/JPS63218139A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58158852A (ja) * | 1982-03-17 | 1983-09-21 | Jeol Ltd | 荷電粒子フイルタ |
| JPS6039748A (ja) * | 1983-08-12 | 1985-03-01 | Jeol Ltd | イオンビ−ム集束装置 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009010078A (ja) * | 2007-06-27 | 2009-01-15 | Nuflare Technology Inc | 電子ビーム描画装置及び電子ビームの電流密度調整方法 |
| CN108695128A (zh) * | 2017-04-11 | 2018-10-23 | 上海伟钊光学科技股份有限公司 | 具有束流自动反馈控制的考夫曼离子源 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0588503B2 (https=) | 1993-12-22 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS58151964A (ja) | アーク溶接用電子的電源 | |
| JPS5457949A (en) | Automatic focusing unit for scanning electron microscope and so on | |
| JPS63218139A (ja) | イオンビ−ム装置 | |
| JP2002208368A (ja) | 電子放射型電子銃 | |
| JPS63218138A (ja) | イオンビ−ム装置 | |
| JPH0465054A (ja) | 電界放射形電子銃 | |
| JP3075058B2 (ja) | アーク溶接装置 | |
| JP3045635B2 (ja) | プラズマ発生用高周波電源 | |
| JPS5837064B2 (ja) | スタッド溶接用電源装置 | |
| JPS6178568A (ja) | 短絡移行アーク溶接装置 | |
| JP2556549B2 (ja) | 直流高電圧発生装置 | |
| JPS58123647A (ja) | 電子ビ−ム電流の制御方法 | |
| JPS55156673A (en) | Automatic welding equipment | |
| JP2000069315A5 (https=) | ||
| JPH0822797A (ja) | 電子ビーム溶接用電源装置 | |
| JPS63216342A (ja) | 荷電粒子線描画装置 | |
| JPH026085A (ja) | 電子ビーム加工装置 | |
| JPH01289061A (ja) | イオン処理装置 | |
| JPS61147524A (ja) | 電子ビ−ム露光装置のブランキング回路 | |
| JPH09304599A (ja) | 電子線照射装置における電子流制御装置 | |
| JPS58150255A (ja) | 電子ビ−ム装置 | |
| JPS57193185A (en) | Automatic focus controlling circuit for electron beam of image pickup tube | |
| JPH01243353A (ja) | 直流高電圧発生装置 | |
| JPH01227344A (ja) | 電力増幅器の過電流保護回路 | |
| JP3731270B2 (ja) | 電子線照射装置 |