JPS63214346A - プラズマプロセス装置 - Google Patents
プラズマプロセス装置Info
- Publication number
- JPS63214346A JPS63214346A JP4636687A JP4636687A JPS63214346A JP S63214346 A JPS63214346 A JP S63214346A JP 4636687 A JP4636687 A JP 4636687A JP 4636687 A JP4636687 A JP 4636687A JP S63214346 A JPS63214346 A JP S63214346A
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- sample
- plasma generation
- generation chamber
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
- B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4636687A JPS63214346A (ja) | 1987-02-27 | 1987-02-27 | プラズマプロセス装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4636687A JPS63214346A (ja) | 1987-02-27 | 1987-02-27 | プラズマプロセス装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63214346A true JPS63214346A (ja) | 1988-09-07 |
| JPH0510427B2 JPH0510427B2 (enrdf_load_stackoverflow) | 1993-02-09 |
Family
ID=12745156
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4636687A Granted JPS63214346A (ja) | 1987-02-27 | 1987-02-27 | プラズマプロセス装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63214346A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2003037503A1 (fr) * | 2001-10-30 | 2003-05-08 | Setsu Anzai | Appareil a micro-ondes generateur de plasma |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61281872A (ja) * | 1985-06-07 | 1986-12-12 | Matsushita Electric Ind Co Ltd | 非晶質シリコンゲルマニウム膜の形成方法 |
-
1987
- 1987-02-27 JP JP4636687A patent/JPS63214346A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61281872A (ja) * | 1985-06-07 | 1986-12-12 | Matsushita Electric Ind Co Ltd | 非晶質シリコンゲルマニウム膜の形成方法 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2003037503A1 (fr) * | 2001-10-30 | 2003-05-08 | Setsu Anzai | Appareil a micro-ondes generateur de plasma |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0510427B2 (enrdf_load_stackoverflow) | 1993-02-09 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| EXPY | Cancellation because of completion of term |