JPS6321128B2 - - Google Patents

Info

Publication number
JPS6321128B2
JPS6321128B2 JP54038802A JP3880279A JPS6321128B2 JP S6321128 B2 JPS6321128 B2 JP S6321128B2 JP 54038802 A JP54038802 A JP 54038802A JP 3880279 A JP3880279 A JP 3880279A JP S6321128 B2 JPS6321128 B2 JP S6321128B2
Authority
JP
Japan
Prior art keywords
grating
concave
lattice
substrate
angle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54038802A
Other languages
English (en)
Japanese (ja)
Other versions
JPS55131730A (en
Inventor
Katsunobu Aoyanagi
Susumu Nanba
Kazuo Sano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimazu Seisakusho KK
RIKEN
Original Assignee
Shimazu Seisakusho KK
RIKEN
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimazu Seisakusho KK, RIKEN filed Critical Shimazu Seisakusho KK
Priority to JP3880279A priority Critical patent/JPS55131730A/ja
Publication of JPS55131730A publication Critical patent/JPS55131730A/ja
Publication of JPS6321128B2 publication Critical patent/JPS6321128B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/18Diffraction gratings
    • G02B5/1847Manufacturing methods
    • G02B5/1857Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectrometry And Color Measurement (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
JP3880279A 1979-03-31 1979-03-31 Concaved echelette grating and its process Granted JPS55131730A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3880279A JPS55131730A (en) 1979-03-31 1979-03-31 Concaved echelette grating and its process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3880279A JPS55131730A (en) 1979-03-31 1979-03-31 Concaved echelette grating and its process

Publications (2)

Publication Number Publication Date
JPS55131730A JPS55131730A (en) 1980-10-13
JPS6321128B2 true JPS6321128B2 (enrdf_load_stackoverflow) 1988-05-02

Family

ID=12535420

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3880279A Granted JPS55131730A (en) 1979-03-31 1979-03-31 Concaved echelette grating and its process

Country Status (1)

Country Link
JP (1) JPS55131730A (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5955221A (en) * 1997-11-21 1999-09-21 The Regents Of The University Of California Method and apparatus for fabrication of high gradient insulators with parallel surface conductors spaced less than one millimeter apart
JP2003075622A (ja) * 2001-09-05 2003-03-12 Toshiba Corp 回折格子、回折格子の加工方法及び光学要素
JP5082421B2 (ja) * 2006-12-13 2012-11-28 株式会社島津製作所 回折格子
JP5056997B2 (ja) * 2012-04-27 2012-10-24 株式会社島津製作所 回折格子の製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5038338A (enrdf_load_stackoverflow) * 1973-08-08 1975-04-09
JPS5540846A (en) * 1978-09-14 1980-03-22 Daishowa Eng Kk Dry crepe apparatus for making thin paper by assemblage of steel plate dryer and casted iron dryer

Also Published As

Publication number Publication date
JPS55131730A (en) 1980-10-13

Similar Documents

Publication Publication Date Title
US4440839A (en) Method of forming laser diffraction grating for beam sampling device
US4311389A (en) Method for the optical alignment of designs in two near planes and alignment apparatus for performing this method
EP0092395B1 (en) Method of forming diffraction gratings
US4824191A (en) Optical pickup
US4411013A (en) System for transferring a fine pattern onto a target
JPH02142111A (ja) 照明方法及びその装置並びに投影式露光方法及びその装置
JPH02262107A (ja) 光走査用回折格子
JP4646278B2 (ja) 照明光学系及び投射装置
JPS6321128B2 (enrdf_load_stackoverflow)
JPS61282819A (ja) 光偏向用ホログラムデイスク
US20070014013A1 (en) Refractive index controlled diffractive optical element and its manufacturing method
JPH0611609A (ja) 露光装置
US3600093A (en) Continuously blazed optical monochromator
US4720158A (en) Method of and apparatus for making a hologram
JP2841441B2 (ja) 回折格子およびその製作方法
JPS59116602A (ja) チヤ−プトグレ−テイングの製造方法
US4632499A (en) Light beam scanning apparatus
JP2000056135A (ja) 全反射(tir)ホログラフィ装置、その方法及び使用される光学アセンブリ
JP2003262832A (ja) パターン付き反射器を使用する回折補償
US5337169A (en) Method for patterning an optical device for optical IC, and an optical device for optical IC fabricated by this method
JP3711680B2 (ja) ビーム整形装置
JPH10323787A (ja) レーザ加工装置
US4621891A (en) Light beam scanning apparatus
JPH0521209B2 (enrdf_load_stackoverflow)
JP2744178B2 (ja) 長尺ホログラムレンズ作製方法