JPS63199808A - 熱間静水圧プレス成形方法 - Google Patents
熱間静水圧プレス成形方法Info
- Publication number
- JPS63199808A JPS63199808A JP62028182A JP2818287A JPS63199808A JP S63199808 A JPS63199808 A JP S63199808A JP 62028182 A JP62028182 A JP 62028182A JP 2818287 A JP2818287 A JP 2818287A JP S63199808 A JPS63199808 A JP S63199808A
- Authority
- JP
- Japan
- Prior art keywords
- container
- hot isostatic
- sintered body
- metal powder
- subjected
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims description 18
- 238000000465 moulding Methods 0.000 title claims 2
- 229910052751 metal Inorganic materials 0.000 claims abstract description 17
- 239000002184 metal Substances 0.000 claims abstract description 17
- 239000000843 powder Substances 0.000 claims abstract description 14
- 125000006850 spacer group Chemical group 0.000 claims abstract description 8
- 229910052761 rare earth metal Inorganic materials 0.000 claims abstract description 5
- 150000002910 rare earth metals Chemical class 0.000 claims abstract description 5
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 239000000758 substrate Substances 0.000 abstract description 15
- 238000001513 hot isostatic pressing Methods 0.000 abstract description 5
- 229910001209 Low-carbon steel Inorganic materials 0.000 abstract description 4
- 238000010438 heat treatment Methods 0.000 abstract description 2
- 238000007789 sealing Methods 0.000 abstract 2
- 239000003795 chemical substances by application Substances 0.000 abstract 1
- 238000003754 machining Methods 0.000 abstract 1
- 238000012856 packing Methods 0.000 abstract 1
- 238000005477 sputtering target Methods 0.000 abstract 1
- 239000000463 material Substances 0.000 description 10
- 229910045601 alloy Inorganic materials 0.000 description 5
- 239000000956 alloy Substances 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- 238000005498 polishing Methods 0.000 description 4
- 238000005266 casting Methods 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 239000006082 mold release agent Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 1
- 229910000640 Fe alloy Inorganic materials 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 235000012976 tarts Nutrition 0.000 description 1
- 238000009849 vacuum degassing Methods 0.000 description 1
Landscapes
- Powder Metallurgy (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62028182A JPS63199808A (ja) | 1987-02-12 | 1987-02-12 | 熱間静水圧プレス成形方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62028182A JPS63199808A (ja) | 1987-02-12 | 1987-02-12 | 熱間静水圧プレス成形方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63199808A true JPS63199808A (ja) | 1988-08-18 |
| JPH052721B2 JPH052721B2 (enrdf_load_stackoverflow) | 1993-01-13 |
Family
ID=12241569
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62028182A Granted JPS63199808A (ja) | 1987-02-12 | 1987-02-12 | 熱間静水圧プレス成形方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63199808A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20190351491A1 (en) * | 2017-02-16 | 2019-11-21 | Sumitomo Chemical Company, Limited | Method for machining sputtering target, apparatus for machining sputtering target, sputtering target, and method for producing sputtering target product |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6230802A (ja) * | 1985-08-02 | 1987-02-09 | Showa Denko Kk | 静水圧ホツトプレス法 |
-
1987
- 1987-02-12 JP JP62028182A patent/JPS63199808A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6230802A (ja) * | 1985-08-02 | 1987-02-09 | Showa Denko Kk | 静水圧ホツトプレス法 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20190351491A1 (en) * | 2017-02-16 | 2019-11-21 | Sumitomo Chemical Company, Limited | Method for machining sputtering target, apparatus for machining sputtering target, sputtering target, and method for producing sputtering target product |
| US11766726B2 (en) * | 2017-02-16 | 2023-09-26 | Sumitomo Chemical Company, Limited | Method for machining sputtering target, apparatus for machining sputtering target, sputtering target, and method for producing sputtering target product |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH052721B2 (enrdf_load_stackoverflow) | 1993-01-13 |
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