JPH0354189B2 - - Google Patents

Info

Publication number
JPH0354189B2
JPH0354189B2 JP61074051A JP7405186A JPH0354189B2 JP H0354189 B2 JPH0354189 B2 JP H0354189B2 JP 61074051 A JP61074051 A JP 61074051A JP 7405186 A JP7405186 A JP 7405186A JP H0354189 B2 JPH0354189 B2 JP H0354189B2
Authority
JP
Japan
Prior art keywords
target material
powder
container
ferromagnetic
replenishment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61074051A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62230967A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP7405186A priority Critical patent/JPS62230967A/ja
Publication of JPS62230967A publication Critical patent/JPS62230967A/ja
Publication of JPH0354189B2 publication Critical patent/JPH0354189B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Powder Metallurgy (AREA)
  • Physical Vapour Deposition (AREA)
JP7405186A 1986-03-31 1986-03-31 光磁気記録薄膜の形成に用いられた強磁性材製使用済みターゲットの再生方法 Granted JPS62230967A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7405186A JPS62230967A (ja) 1986-03-31 1986-03-31 光磁気記録薄膜の形成に用いられた強磁性材製使用済みターゲットの再生方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7405186A JPS62230967A (ja) 1986-03-31 1986-03-31 光磁気記録薄膜の形成に用いられた強磁性材製使用済みターゲットの再生方法

Publications (2)

Publication Number Publication Date
JPS62230967A JPS62230967A (ja) 1987-10-09
JPH0354189B2 true JPH0354189B2 (enrdf_load_stackoverflow) 1991-08-19

Family

ID=13535999

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7405186A Granted JPS62230967A (ja) 1986-03-31 1986-03-31 光磁気記録薄膜の形成に用いられた強磁性材製使用済みターゲットの再生方法

Country Status (1)

Country Link
JP (1) JPS62230967A (enrdf_load_stackoverflow)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7175802B2 (en) 2001-09-17 2007-02-13 Heraeus, Inc. Refurbishing spent sputtering targets
US20080145688A1 (en) 2006-12-13 2008-06-19 H.C. Starck Inc. Method of joining tantalum clade steel structures
US8197894B2 (en) 2007-05-04 2012-06-12 H.C. Starck Gmbh Methods of forming sputtering targets
US7871563B2 (en) * 2007-07-17 2011-01-18 Williams Advanced Materials, Inc. Process for the refurbishing of a sputtering target
US8246903B2 (en) 2008-09-09 2012-08-21 H.C. Starck Inc. Dynamic dehydriding of refractory metal powders
JP4348396B1 (ja) 2008-12-26 2009-10-21 田中貴金属工業株式会社 再生ターゲットの製造方法
CN102747329A (zh) * 2011-04-20 2012-10-24 光洋应用材料科技股份有限公司 再生溅镀靶材及其制作方法
JP2013001971A (ja) * 2011-06-17 2013-01-07 Solar Applied Materials Technology Corp 再製スパッタリングターゲット及びその製造方法
US9412568B2 (en) 2011-09-29 2016-08-09 H.C. Starck, Inc. Large-area sputtering targets
JP6532219B2 (ja) * 2013-11-25 2019-06-19 株式会社フルヤ金属 スパッタリングターゲットの再生方法及び再生スパッタリングターゲット
CN114477992B (zh) * 2022-01-18 2023-04-28 宁波江丰热等静压技术有限公司 一种溅射后氧化铟锡靶材的再生方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6043404A (ja) * 1983-08-16 1985-03-08 Mitsubishi Metal Corp 超硬合金製リング状部材の再生方法

Also Published As

Publication number Publication date
JPS62230967A (ja) 1987-10-09

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