JPS63194786A - Washing method and device - Google Patents

Washing method and device

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Publication number
JPS63194786A
JPS63194786A JP2412587A JP2412587A JPS63194786A JP S63194786 A JPS63194786 A JP S63194786A JP 2412587 A JP2412587 A JP 2412587A JP 2412587 A JP2412587 A JP 2412587A JP S63194786 A JPS63194786 A JP S63194786A
Authority
JP
Japan
Prior art keywords
cleaning
atmospheric pressure
cleaned
pressure
magazine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2412587A
Other languages
Japanese (ja)
Inventor
敦資 坂井田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Denso Corp
Original Assignee
NipponDenso Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NipponDenso Co Ltd filed Critical NipponDenso Co Ltd
Priority to JP2412587A priority Critical patent/JPS63194786A/en
Publication of JPS63194786A publication Critical patent/JPS63194786A/en
Pending legal-status Critical Current

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  • Cleaning By Liquid Or Steam (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は洗浄方法及び洗浄装置に関するものであり、例
えば油脂、7ラツクス等に汚染されたIC1電子蝦器、
液晶パネル等の精密機器類を洗浄するに適した洗浄方法
及び洗浄装置の改良に関するものである。
DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to a cleaning method and a cleaning device, for example, an IC1 electronic cartridge contaminated with oil, fat, 7 lux, etc.
This invention relates to improvements in a cleaning method and cleaning device suitable for cleaning precision equipment such as liquid crystal panels.

(従来の技術) 洗浄装置は、例えば油、7ラツクス等に汚染された精密
機器類をフロン、トリクレン等の洗′浄溶剤中に浸漬す
るなどして油等を除去するものであり、従来装置は第3
図に示すように、ヒータ1aを有する温浴槽1、超音波
振動子2aを有する冷浴W!2、ヒータ3aを有するベ
ーパ槽3、被洗浄物を収納したマガジン6を搬送するた
めの治兵付きコンベア4及び冷却蛇管5とを備えている
。マガジン6は第4図に示すように、複数の嵌合溝7を
刻設した一対プレート8,8がらなり、この嵌合溝7に
油上等で汚染されたIC回路等の被洗浄物9が嵌着され
る。このマガジン6をコンベア4に取り付けて洗浄装置
内部に搬入し、まず被洗浄物9を温浴槽1内の洗浄溶液
に浸漬し、被洗浄物9に付着している油脂等を膨張させ
て一部を洗浄溶液中に溶解させる。次に冷浴槽2内の洗
浄溶液に浸漬し超音波の作用によI)油脂等の異物を被
洗浄物9より剥離させ、同時に被洗浄物9を冷却する。
(Prior art) Cleaning equipment removes oil, etc. by immersing precision instruments contaminated with oil, 7lux, etc. in cleaning solvents such as chlorofluorocarbons and trichlene. is the third
As shown in the figure, a hot bath 1 has a heater 1a, and a cold bath W has an ultrasonic vibrator 2a! 2, a vapor tank 3 having a heater 3a, a conveyor 4 with a guard for conveying a magazine 6 containing objects to be cleaned, and a cooling corrugated pipe 5. As shown in FIG. 4, the magazine 6 consists of a pair of plates 8, 8 having a plurality of fitting grooves 7 carved therein. is fitted. This magazine 6 is attached to the conveyor 4 and carried into the cleaning device, and the object to be cleaned 9 is first immersed in the cleaning solution in the hot bath 1, and the oil and fat attached to the object to be cleaned 9 is expanded and partially removed. Dissolve in the wash solution. Next, the object 9 is immersed in a cleaning solution in the cold bath 2, and foreign substances such as oil and fat are removed from the object 9 by the action of ultrasonic waves, and at the same time the object 9 is cooled.

ついで、ベーパ槽3内に搬入してベーパ雰囲気にさらし
、被洗浄物9の表面で洗浄溶液を凝縮させて、すすぎ洗
いする。この後、被洗浄物9を冷却蛇管5の上部に移動
さぜ、乾燥して取り出していた。
Next, the object 9 is carried into the vapor tank 3 and exposed to a vapor atmosphere, and the cleaning solution is condensed on the surface of the object 9 to be rinsed. Thereafter, the object 9 to be cleaned was moved to the upper part of the cooling tube 5, dried, and taken out.

上記した従来装置によれば、例えば1個の被洗浄物に付
着している油分量が’10wg/個のものを洗浄して、
油分量1.B/個以下の洗浄品質を達成するには温浴槽
1、冷浴槽2、ベーパ槽3の各桁にそれぞれ180秒以
上浸漬しなければならず、洗浄に要する時間が長く、そ
のため多大のエネルギを消費していた。しかも少なくと
も3つの槽が必要であり、設備の大型化が避けられなか
った。
According to the above-mentioned conventional apparatus, for example, when the amount of oil attached to one object to be cleaned is 10 wg/piece,
Oil amount 1. In order to achieve a cleaning quality of B/piece or less, each of the hot tub 1, cold tub 2, and vapor tank 3 must be immersed for 180 seconds or more, which takes a long time to clean and requires a large amount of energy. was consuming. Moreover, at least three tanks were required, making it inevitable to increase the size of the equipment.

これに対し、本出願人は先に特開昭60−12187号
により、洗浄溶剤を圧縮する圧縮工程と、圧縮工程によ
り圧縮された洗浄溶剤を大気圧沸魚以上に加熱する加熱
工程と、圧縮工程及び加熱工程で圧縮加熱された洗浄溶
剤を被洗浄物に噴射する噴射工程からなる洗浄方法、並
びに特開昭60−137481号により、洗浄溶剤を圧
縮する圧縮工程と、圧縮工程により圧縮された洗浄溶剤
を大気圧沸、ヴ以上に加熱する加熱工程と、圧縮工程及
び加熱工程で圧縮加熱された洗浄溶剤を、洗浄溶剤液中
で洗浄溶剤液中に位置する被洗浄物に噴射して洗浄する
工程からなる洗浄方法を提案した。
In contrast, the present applicant previously disclosed in Japanese Patent Application Laid-Open No. 60-12187 a compression step of compressing a cleaning solvent, a heating step of heating the cleaning solvent compressed in the compression step to a temperature above atmospheric pressure, and a compression step of compressing the cleaning solvent. A cleaning method consisting of an injection step of injecting a cleaning solvent compressed and heated in a heating step onto an object to be cleaned, and JP-A-60-137481 discloses a cleaning method comprising a compression step of compressing a cleaning solvent and A heating process in which the cleaning solvent is heated to above atmospheric pressure, a compression process, and a heating process in which the compressed and heated cleaning solvent is sprayed onto the object located in the cleaning solvent solution. We proposed a cleaning method consisting of the following steps.

(発明が解決しようとする問題点) 本出願人による上記洗浄方法によれば、洗浄溶液の沸騰
により、被洗浄物に付着した油脂等の異物を短時間で除
去することが可能となるが、沸騰する洗浄溶液を被洗浄
物の表裏全面にくまなく噴射するには多数の噴射手段を
設けなければならす機構が複雑になるという問題点があ
った。
(Problems to be Solved by the Invention) According to the above-mentioned cleaning method proposed by the present applicant, foreign substances such as oil and fat attached to the object to be cleaned can be removed in a short time by boiling the cleaning solution. In order to spray the boiling cleaning solution all over the front and back surfaces of the object to be cleaned, there is a problem in that a large number of spraying means must be provided, making the mechanism complicated.

(8題7αを解決するための手段) 本発明は上記問題点を解決することを目的とするもので
あり、かがる目的に沿う本発明の洗浄方法は大気圧以上
の圧力に加圧すると共に該圧力における沸、αよりも低
くかつ大気圧における沸5貞より高い温度に加熱した洗
浄溶液に被洗浄物を浸漬し、ついでこの洗浄溶液を瞬時
に大気圧に開放することを要旨とする。
(Means for Solving Problem 8 7α) The present invention aims to solve the above-mentioned problems, and the cleaning method of the present invention that meets the purpose of darning involves pressurizing to a pressure higher than atmospheric pressure and The gist of this method is to immerse the object to be cleaned in a cleaning solution heated to a temperature lower than the boiling point α at the pressure and higher than the boiling point α at atmospheric pressure, and then instantly release the cleaning solution to atmospheric pressure.

そして、上記洗浄方法を実施するために好適な洗浄装置
は、被洗浄物を投入するための開口を有すると共に内部
を大気圧に開放するための開閉手段を設けた密閉可能な
処理槽と、洗浄溶液を加圧して処理槽へ供給するための
ポンプと、該ポンプにより処理槽へ供給される洗浄溶液
を加熱する加熱手段とを備えたことを要旨とする。
A cleaning device suitable for carrying out the above-mentioned cleaning method includes a sealable processing tank having an opening for introducing the object to be cleaned and an opening/closing means for opening the inside to atmospheric pressure, and a cleaning device. The gist of the present invention is to include a pump for pressurizing and supplying a solution to a processing tank, and a heating means for heating a cleaning solution supplied to the processing tank by the pump.

(作用) 本発明によれば、大気圧以上の圧力のもとで大気圧洲、
α以上に加熱した洗浄溶液を瞬時に大気圧に開放するこ
とにより沸騰が生じ、洗浄溶液が被洗浄物の表面に付着
している油等の汚染物を核として蒸発し、汚染物が被洗
浄物表面から分離する。
(Function) According to the present invention, under atmospheric pressure or higher, atmospheric pressure,
By instantly releasing the cleaning solution heated above α to atmospheric pressure, boiling occurs, and the cleaning solution evaporates with contaminants such as oil adhering to the surface of the object to be cleaned as nuclei, and the contaminants are removed from the object to be cleaned. Separate from the surface of an object.

(実施例) 以下に本発明を図面に基づいて説明する。(Example) The present invention will be explained below based on the drawings.

第1図は本発明方法を実施するための洗浄装置10の全
体を示す断面図である。洗浄装置10はその外形を保温
材からなる外枠11により形成され、内部は荒洗浄を行
うAステーションと仕上洗浄を行うBステーションに区
画されている。外枠11の左右側壁上部には、治具材き
コンベア12によりマガジン6に収納された被洗浄物9
を洗浄装置10内に搬入するための開口部11゛とマガ
ジン6を治具材きコンベア12゛へ搬出するための開口
部11″が形成されている。洗浄装置10の外枠土壁に
は油圧シリング等からなる昇降装置13が設けられ、こ
の昇降装置13には、マガジン収納部14A114Bを
垂設した昇降キャリア14が連結され、洗浄装置10内
に昇降自在に配設されている。また洗浄装置10の内部
中段には処理槽15Aと処理415Bが設けられている
FIG. 1 is a sectional view showing the entire cleaning apparatus 10 for carrying out the method of the present invention. The cleaning device 10 has an outer shape formed by an outer frame 11 made of a heat insulating material, and the inside is divided into an A station for rough cleaning and a B station for finishing cleaning. At the top of the left and right side walls of the outer frame 11, objects to be cleaned 9 stored in the magazine 6 by the jig material conveyor 12 are placed.
An opening 11'' for transporting the magazine 6 into the cleaning device 10 and an opening 11'' for transporting the magazine 6 to the jig material conveyor 12'' are formed. An elevating device 13 made of a hydraulic sill or the like is provided, and an elevating carrier 14 on which a magazine storage section 14A114B is vertically disposed is connected to this elevating device 13, and is disposed in the cleaning device 10 so as to be able to rise and fall freely. A processing tank 15A and a processing tank 415B are provided in the middle of the interior of the apparatus 10.

処理115A、1.5Bの上面にはマガンン収納部14
A、14B75r進入できる開口部15’AS 15’
Bが形成されると共に、この開口部15’A。
On the upper surface of the processing 115A and 1.5B, there is a storage area 14.
A, 14B75r opening 15'AS 15'
B is formed and this opening 15'A.

15′Bの周囲にはパツキン16Aと1.6 Bが配設
され、昇降キャリア14を下降させマガジン収納部14
A、14Bを処理槽15A、15B内の洗浄溶液に浸漬
させたとき、昇降キャリア14の下面がパツキン16A
、16Bに押し付けられ、処理槽15A、15Bが密閉
される。これら処理槽15A、15Bの下方には洗浄溶
液を貯蔵するための貯蔵槽17Aと貯蔵117Bが配設
されている。貯蔵槽17A、17Bはいずれも開口部1
1’、11”を通して大気圧に開放されている。また貯
蔵槽17Aの洗浄溶液を処理槽15Aに加圧供給するた
めのポンプ18Aが、貯蔵槽17Aと処理槽15Aを接
続する管路19A配設され、この管路19Aにはポンプ
18Aのほか、洗浄溶液を加熱するためのヒータ2OA
が設けられている。
Gaskets 16A and 1.6B are arranged around 15'B to lower the elevating carrier 14 and open the magazine storage section 14.
When A and 14B are immersed in the cleaning solution in the processing tanks 15A and 15B, the lower surface of the lifting carrier 14 is exposed to the gasket 16A.
, 16B, and the processing tanks 15A and 15B are sealed. A storage tank 17A and a storage 117B for storing cleaning solution are provided below these processing tanks 15A and 15B. Storage tanks 17A and 17B both have opening 1
1' and 11'' to atmospheric pressure. Also, a pump 18A for supplying the cleaning solution in the storage tank 17A to the processing tank 15A under pressure is connected to the pipe line 19A connecting the storage tank 17A and the processing tank 15A. In addition to the pump 18A, this conduit 19A is also equipped with a heater 2OA for heating the cleaning solution.
is provided.

さらに処理4fi 15 Aと貯蔵槽17Aは、管路2
2A及び管路24Aによって接続されている。管路22
Aには密閉状態にある処理槽15A内の圧力を一定圧力
に維持するための圧力制御弁21Aが配設され、管路2
4Aには開閉弁23Aが配設されている。この開閉弁2
3Aを開くと密閉状態にある処理m15Aが管路24A
により貯a槽17Aと連通され、貯蔵槽17Aが大気圧
に開放されているため処理槽15Aも大気圧に開放され
る。
Further, the processing 4fi 15 A and the storage tank 17A are connected to the pipe 2
2A and conduit 24A. Conduit 22
A pressure control valve 21A for maintaining the pressure in the sealed treatment tank 15A at a constant pressure is installed in the pipe line 2.
4A is provided with an on-off valve 23A. This on-off valve 2
When 3A is opened, the sealed process m15A is connected to pipe 24A.
Since the storage tank 17A is open to atmospheric pressure, the processing tank 15A is also opened to atmospheric pressure.

同様に、処理115Bと貯蔵槽17Bがそれぞれ管路1
9B、22B、24Bによって接続され、管路1.9 
Bにはポンプ18Bとヒータ20Bが、管路22Bには
圧力制御弁21B、また管路24Bには開閉弁23Bが
配設されている。
Similarly, processing 115B and storage tank 17B are connected to pipe line 1, respectively.
Connected by 9B, 22B, 24B, conduit 1.9
B is provided with a pump 18B and a heater 20B, a conduit 22B is provided with a pressure control valve 21B, and a conduit 24B is provided with an on-off valve 23B.

25は冷却蛇管であり、開口部11°、11″と処理槽
15A、15Bとの中間に配設され、蒸気となりか洗浄
溶液を冷却することにより洗浄溶液が開口部11゛、1
1゛を通って洗浄装置10の外部に飛散するのを防止す
る。
Reference numeral 25 denotes a cooling corrugated pipe, which is disposed between the openings 11°, 11" and the processing tanks 15A, 15B, and cools the cleaning solution into steam so that the cleaning solution flows into the openings 11", 1.
1 ゛ and scattering to the outside of the cleaning device 10.

本実施例装置は以上の構成よりなり、次にその作動を説
明する。
The apparatus of this embodiment has the above configuration, and its operation will be explained next.

図中、1点鎖線で示す位置に昇降キャリア14があると
き、アンローダ(図示せず)により、マ〃シン収11’
114Bにあるマガジン6がコンベア12゛へ搬出され
、ローブ(図示せず)によりマガジン収納部14Aにあ
るマガジン6がマガジン収納部14Bに移送されると共
にコンベア12から処理前のマガジン6が77yシン収
納部14Aに搬入される。一方、貯蔵槽17A、17B
内の洗浄溶液は各ポンプ18A、18Bにより加圧され
、ついでヒータ2OA、20Bにより加熱されて処理槽
15A、15B内に流入する。
In the figure, when the elevating carrier 14 is at the position shown by the dashed line, an unloader (not shown) lifts the machine to 11'.
The magazine 6 in the magazine 114B is carried out to the conveyor 12', and the magazine 6 in the magazine storage part 14A is transferred to the magazine storage part 14B by a lobe (not shown), and the unprocessed magazine 6 is stored in the 77y-thin from the conveyor 12. It is carried into the section 14A. On the other hand, storage tanks 17A and 17B
The cleaning solution inside is pressurized by each pump 18A, 18B, then heated by heaters 2OA, 20B, and flows into processing tanks 15A, 15B.

洗浄溶液としてフロンを使用する場合、フロンの沸騰曲
線は第2図に示すように、大気圧のもとでの沸点は47
.6℃であり、また2気圧のもとでの沸点は84°Cで
ある。従って、例えば約60℃に加熱したフロン洗浄液
を処理115A、15Bに供給した場合、昇降キャリア
14が上昇位置にあるときは、処理槽15A、15Bは
密閉されておらず開口部11゛、11″を通して大気圧
に開放されているため、処理槽15A、15B内で沸騰
状態となり、開口部15’A、15’Bから溢れ出て、
貯蔵槽17A、17B内に流れ落ちる。昇降キャリア1
4が下降し、マガジン6が沸騰しているフロン洗浄液内
に浸漬されると共に昇降キャリア14の下面がパ・7キ
ン16A、16Bに押し付けられて処理WJ15 A、
  15 Bが密閉されると、フロン洗浄液はもはや開
口部15’A、15’Bから溢れ出ることができなくな
り、処理槽15A、15Bの内圧は圧力制御弁21A、
21Bによって設定される圧力、例えば2kg/cI1
12にまで上昇する。
When using Freon as a cleaning solution, the boiling point of Freon at atmospheric pressure is 47, as shown in Figure 2.
.. 6°C, and the boiling point under 2 atmospheres is 84°C. Therefore, for example, when a Freon cleaning liquid heated to about 60° C. is supplied to the processing units 115A and 15B, when the elevating carrier 14 is in the raised position, the processing tanks 15A and 15B are not sealed and the openings 11'' and 11'' Since the water is exposed to atmospheric pressure through the processing tank 15A, 15B, it boils and overflows from the openings 15'A, 15'B.
It flows down into the storage tanks 17A, 17B. Lifting carrier 1
4 is lowered, the magazine 6 is immersed in the boiling Freon cleaning liquid, and the lower surface of the elevating carrier 14 is pressed against the gaskets 16A, 16B to process WJ15A,
15B is sealed, the Freon cleaning liquid can no longer overflow from the openings 15'A and 15'B, and the internal pressure of the processing tanks 15A and 15B is reduced to the pressure control valves 21A and 15B.
21B, e.g. 2 kg/cI1
It rises to 12.

フロン洗浄液は2 kg/ atn2の圧力のもとでは
、その沸点は第2図に示すように84℃であるため、6
0℃に加熱されたフロン洗浄液は沸騰しなくなる。
Under a pressure of 2 kg/atn2, the boiling point of the Freon cleaning solution is 84°C as shown in Figure 2, so the
Freon cleaning liquid heated to 0°C no longer boils.

そこで、処理[15A、15Bの密閉状態を、例えば5
秒間保持すると、被洗浄物9の温度がフロン洗浄液の液
温近くにまで上昇する。タイマ回路等(図示せず)によ
って開閉弁23A、23Bの作動を制御し、所要の密閉
時間が経過したら、開閉弁23A、23Bを全開させ、
瞬時に処理槽15A、15Bと貯蔵槽17A、17Bを
連通させ、処理槽15A、15B内のフロン洗浄液をそ
れぞれ貯蔵槽17A、17Bに排出させる。すると、貯
蔵層17A、17Bは大気圧に開放されているため、処
理槽15A、15Bの内圧も大気圧となる。一方、フロ
ン洗浄液は大気圧沸点以上に加熱されているため、処理
[1,5A、15Bを大気圧に開放することにより一気
に沸騰し、その結果、被洗浄物9の表面に付着している
汚染物を核として蒸気泡が発生し、汚染物は被洗浄物9
の表面から分離される。そして、再び開閉弁23A、2
3Bを閉じると、処理槽15A、15Bの内圧が再び」
二昇し、沸騰状態が収まる。このように処理槽15A、
15Bを密閉した状態で、開閉弁23A123Bを開閉
することにより、フロン洗浄液の沸騰を例えば10回程
繰り返す。その後、昇降キャリア14を図中、1点鎖線
で示す位置まで上昇させ、ここでAステーションで荒洗
浄したマガジン6をBステーションに移し、Bステーシ
ョンで仕上げ洗浄したマガジン6を洗浄装置10外部に
搬出する。
Therefore, the sealed state of processing [15A and 15B is
When the temperature is maintained for seconds, the temperature of the object 9 to be cleaned rises to nearly the temperature of the Freon cleaning liquid. The operation of the on-off valves 23A, 23B is controlled by a timer circuit or the like (not shown), and when the required sealing time has elapsed, the on-off valves 23A, 23B are fully opened.
The processing tanks 15A, 15B and the storage tanks 17A, 17B are instantly brought into communication, and the fluorocarbon cleaning liquid in the processing tanks 15A, 15B is discharged into the storage tanks 17A, 17B, respectively. Then, since the storage layers 17A and 17B are open to atmospheric pressure, the internal pressure of the processing tanks 15A and 15B also becomes atmospheric pressure. On the other hand, since the Freon cleaning liquid is heated above the atmospheric pressure boiling point, it boils all at once by opening the processing [1, 5A, 15B to atmospheric pressure, and as a result, contamination attached to the surface of the object 9 to be cleaned is removed. Steam bubbles are generated with the object as the core, and the contaminated material is the object to be cleaned 9
separated from the surface. Then, the on-off valves 23A, 2
When 3B is closed, the internal pressure of processing tanks 15A and 15B is restored.
The temperature rises and the boiling state subsides. In this way, the processing tank 15A,
By opening and closing the on-off valve 23A123B with the 15B sealed, boiling of the Freon cleaning liquid is repeated, for example, about 10 times. Thereafter, the elevating carrier 14 is raised to the position indicated by the dashed-dotted line in the figure, and here the magazine 6 that has been roughly cleaned at the A station is transferred to the B station, and the magazine 6 that has been finished and cleaned at the B station is carried out to the outside of the cleaning device 10. do.

上記した本実施例装置によれば、従来70 m g 7
個の汚染状態にある被洗浄物を1 vag/個までに洗
浄するには540秒以上の時間を要していたが、120
秒にて同等以上の洗浄効果を達成することができた。
According to the device of this embodiment described above, conventionally 70 m g 7
It used to take more than 540 seconds to clean 1 vag of contaminated items to 1 vag/piece, but it took 120 seconds.
We were able to achieve the same or better cleaning effect in seconds.

なお、上記実施例ではA、B、二つのステーションを設
け、荒洗浄と仕上げ洗浄の2段階の洗浄操作を行ってい
るが、これは被洗浄物に応じて、1ステーシヨンでもよ
く、あるいはより高い洗浄効果を達成するために多数の
ステーションを設けてもよい。
In the above embodiment, two stations A and B are provided to perform two-stage cleaning operations: rough cleaning and final cleaning. Multiple stations may be provided to achieve a cleaning effect.

(発明の効果) 本発明によれば、大気圧以上の圧力のもとで該圧力にお
ける沸点よりも低くかつ大気圧における沸点より高い温
度に加熱した洗浄溶液に被洗浄物を浸漬し、ついでこの
洗浄溶液を瞬時に大気圧に開放することにより洗浄溶液
を一気に沸騰させて、被洗浄初物表面に付着した汚染物
を除去するものであり、格別噴射手段を設けることなく
被洗浄物の全面から異物を除去でき、また洗浄に要する
時間及びエネルギも少なくて済む。
(Effects of the Invention) According to the present invention, an object to be cleaned is immersed in a cleaning solution heated to a temperature lower than the boiling point at the pressure and higher than the boiling point at the atmospheric pressure under a pressure equal to or higher than atmospheric pressure; By instantly releasing the cleaning solution to atmospheric pressure, the cleaning solution is boiled all at once and removes contaminants that have adhered to the surface of the object to be cleaned, without the need for special spraying means. can be removed, and the time and energy required for cleaning can also be reduced.

また被洗浄物が脆弱で超音波洗浄により破損するおそれ
があるものでも、なんら損傷を加えることなく洗浄する
ことができる。
Furthermore, even if the object to be cleaned is fragile and may be damaged by ultrasonic cleaning, it can be cleaned without causing any damage.

更に、被洗浄物が洗浄溶液によって洗浄溶液の大気圧沸
点以上に加熱されるため、洗浄後の乾燥状態が良好とな
り、従来のようにベーパ洗浄時に付着する水分によるし
み等の発生を防止できる。
Furthermore, since the object to be cleaned is heated by the cleaning solution to a temperature higher than the atmospheric pressure boiling point of the cleaning solution, the drying condition after cleaning is improved, and it is possible to prevent the occurrence of stains and the like due to moisture that adheres during vapor cleaning as in the past.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明方法を実施するための洗浄装置を示す断
面図、第2図は本発明方法に用いる洗浄溶液の沸騰曲線
図、第3図は従来装置を示す断面図、第4図は被洗浄物
を収納するマガジンを示す斜視図である。
FIG. 1 is a sectional view showing a cleaning device for carrying out the method of the present invention, FIG. 2 is a boiling curve diagram of the cleaning solution used in the method of the present invention, FIG. 3 is a sectional view of a conventional device, and FIG. FIG. 3 is a perspective view showing a magazine that stores objects to be cleaned.

Claims (2)

【特許請求の範囲】[Claims] (1)大気圧以上の圧力に加圧すると共に該圧力におけ
る沸点よりも低くかつ大気圧における沸点より高い温度
に加熱した洗浄溶剤に被洗浄物を浸漬し、ついでこの洗
浄溶剤を瞬時に大気圧に開放することを特徴とする洗浄
方法。
(1) The object to be cleaned is immersed in a cleaning solvent that is pressurized to a pressure higher than atmospheric pressure and heated to a temperature lower than the boiling point at that pressure and higher than the boiling point at atmospheric pressure, and then the cleaning solvent is instantly brought to atmospheric pressure. A cleaning method characterized by opening.
(2)被洗浄物を投入するための開口を有すると共に内
部を大気圧に開放するための開閉手段を設けた密閉可能
な処理槽と、洗浄溶剤を加圧して処理槽へ供給するため
のポンプと、該ポンプにより処理槽へ供給される洗浄溶
剤を加熱する加熱手段とを、備えたことを特徴とする洗
浄装置。
(2) A sealable processing tank that has an opening for putting the objects to be cleaned and a means for opening and closing the inside to open to atmospheric pressure, and a pump that pressurizes the cleaning solvent and supplies it to the processing tank. and a heating means for heating the cleaning solvent supplied to the processing tank by the pump.
JP2412587A 1987-02-04 1987-02-04 Washing method and device Pending JPS63194786A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2412587A JPS63194786A (en) 1987-02-04 1987-02-04 Washing method and device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2412587A JPS63194786A (en) 1987-02-04 1987-02-04 Washing method and device

Publications (1)

Publication Number Publication Date
JPS63194786A true JPS63194786A (en) 1988-08-11

Family

ID=12129589

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2412587A Pending JPS63194786A (en) 1987-02-04 1987-02-04 Washing method and device

Country Status (1)

Country Link
JP (1) JPS63194786A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017170424A (en) * 2016-03-18 2017-09-28 株式会社クリンビー Work washing device and work washing method

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS619600A (en) * 1984-06-25 1986-01-17 Funasoo Kk Manufacture of electrodeposited tool
JPS62219622A (en) * 1986-03-20 1987-09-26 Matsushita Electric Ind Co Ltd Method for cleaning semiconductor device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS619600A (en) * 1984-06-25 1986-01-17 Funasoo Kk Manufacture of electrodeposited tool
JPS62219622A (en) * 1986-03-20 1987-09-26 Matsushita Electric Ind Co Ltd Method for cleaning semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017170424A (en) * 2016-03-18 2017-09-28 株式会社クリンビー Work washing device and work washing method

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