JPS6012187A - Washing method and device - Google Patents

Washing method and device

Info

Publication number
JPS6012187A
JPS6012187A JP12076083A JP12076083A JPS6012187A JP S6012187 A JPS6012187 A JP S6012187A JP 12076083 A JP12076083 A JP 12076083A JP 12076083 A JP12076083 A JP 12076083A JP S6012187 A JPS6012187 A JP S6012187A
Authority
JP
Japan
Prior art keywords
solvent
cleaning
cleaning solvent
cleaned
tank
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12076083A
Other languages
Japanese (ja)
Other versions
JPH0237232B2 (en
Inventor
敦資 坂井田
鈴木 正徳
柴田 忠彦
薫田 八郎
陸井 智
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Denso Corp
Original Assignee
NipponDenso Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NipponDenso Co Ltd filed Critical NipponDenso Co Ltd
Priority to JP12076083A priority Critical patent/JPS6012187A/en
Publication of JPS6012187A publication Critical patent/JPS6012187A/en
Publication of JPH0237232B2 publication Critical patent/JPH0237232B2/ja
Granted legal-status Critical Current

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  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 本発明は洗浄方法及び装置に関するものであり、例えば
油等で汚染された$i密機器類(IC,電子機器、液晶
パネル、ポンプ等)を洗浄する洗浄方法及び装置として
用いて有効である。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a cleaning method and apparatus, and for example, a cleaning method and apparatus for cleaning $i sensitive equipment (ICs, electronic equipment, liquid crystal panels, pumps, etc.) contaminated with oil or the like. It is effective when used as

洗浄装置は、例えば油等で汚染された精密機器類(例え
ばlC1電子機器、液晶パネル、ポンプ等)を゛フロン
、トリクレン等の洗浄用溶剤中に浸漬するなどして油等
を除去する装置であって、従来その構造は第1図に示す
ように、゛洗浄装置本体8と蒸留器9とにより成り、洗
浄装置本体1内はヒータ3aを有する温浴槽3、超音波
振動子4aを有する冷浴槽4、ヒータ5aを有するペー
パ一槽15より構成されている。その洗浄方法は、まず
被処理物(ワーク)を治具付チェンコンベア19に乗せ
、温浴Jl 3に浸漬する。この温浴槽3内でワークに
付着している油等はIll!L、一部洗浄溶剤中に溶解
する。次に、冷浴槽4内に浸漬し、超音波により油等の
異物をワークより剥離させると同時に、ワークの温度を
下げる。さらにペーパー115内に搬送しペーパー雰囲
気中に設置する。すると、ワーク表面で洗浄溶剤が凝縮
しワーク表面をすすぎ洗いする。この後、ワークを冷却
蛇管7の上部に移動させ、ワークを乾燥して取り出す。
A cleaning device is a device that removes oil, etc. by immersing precision instruments (e.g., IC1 electronic devices, liquid crystal panels, pumps, etc.) contaminated with oil, etc. in a cleaning solvent such as CFC or TriClean. As shown in Fig. 1, the conventional structure consists of a cleaning device main body 8 and a distiller 9, and the inside of the cleaning device main body 1 includes a hot bath 3 with a heater 3a and a cold bath with an ultrasonic vibrator 4a. It consists of a bathtub 4 and a paper tank 15 having a heater 5a. In the cleaning method, first, the object to be processed (work) is placed on a jig-equipped chain conveyor 19 and immersed in a hot bath Jl 3. Ill! Oil etc. adhering to the workpiece in this hot tub 3! L, partially dissolved in cleaning solvent. Next, the workpiece is immersed in a cold bath 4, and foreign substances such as oil are peeled off from the workpiece by ultrasonic waves, and at the same time, the temperature of the workpiece is lowered. Furthermore, it is conveyed into the paper 115 and placed in the paper atmosphere. Then, the cleaning solvent condenses on the workpiece surface and rinses the workpiece surface. Thereafter, the workpiece is moved to the upper part of the cooling corrugated tube 7, dried, and taken out.

この様な洗浄過程において、例えば1個のワークに付着
して、いる油分量が70 mg/個のものを洗浄して、
油分量が1〜2 mB/個以下の洗浄品質を得るには温
浴槽3、冷浴槽4、ペーパ一槽5に各180秒間浸漬す
る必要があり、設備自体が大型にかつヒータ3a、5a
容量も大きくなり、設備費エネルギ費が高くなるという
問題点があった。
In such a cleaning process, for example, a workpiece with an oil content of 70 mg/piece is cleaned,
In order to obtain cleaning quality with an oil content of 1 to 2 mB/piece or less, it is necessary to immerse the items in a hot bath 3, a cold bath 4, and a paper bath 5 for 180 seconds each, and the equipment itself is large and requires heaters 3a and 5a.
There was a problem that the capacity became larger and the equipment cost and energy cost increased.

本発明は上記問題点に鑑み′、より短時間にて被洗浄物
の洗浄を行うことを目的とする。
In view of the above problems, it is an object of the present invention to clean objects to be cleaned in a shorter time.

この目的を達するため本発明では、洗浄溶剤を圧縮及び
大気圧沸点以上に加熱し、その洗浄溶剤を被洗浄物に噴
射して洗浄を行う構成とした。
In order to achieve this objective, the present invention has a configuration in which a cleaning solvent is compressed and heated to a temperature above the atmospheric pressure boiling point, and the cleaning solvent is sprayed onto the object to be cleaned.

次に本発明の実施例を図に基づいて説明する。Next, embodiments of the present invention will be described based on the drawings.

第2図は本実施例の洗浄装置8全体を示す断面図である
。洗浄装置8はその外形を外枠21によって形成され、
この外枠21によって形成される空間が内枠22によっ
て区画されている。この外枠21の上方側面には搬送開
口部21aが形成され、この搬送開口部21aより治具
付チェンコンベア19に取付けられた被洗浄物23が洗
浄装置8内に搬入される。治具付チェンコンベア19は
ターンホイール20によってその進行方向を変えられて
おり、搬送開口部21aより洗浄装N8内に進行した直
後に下方に向って進行する。この治具付チェンコンベア
19が下方に向う途中にコイル状の第1冷却蛇管17が
配され、この第1冷却蛇管17の内方を毎具材チーンコ
ンベア19が通過している。第1冷却蛇管17の内部に
は冷水が流れており、第1冷却蛇管17の近傍を冷却し
ている。下方に進行する治具付チェンコンベア19は洗
浄装置8の下部までくると2つのターンホイール20に
よって進行方向を上方に逆転している。
FIG. 2 is a sectional view showing the entire cleaning device 8 of this embodiment. The cleaning device 8 has an outer shape formed by an outer frame 21,
A space formed by this outer frame 21 is divided by an inner frame 22. A conveyance opening 21a is formed in the upper side surface of the outer frame 21, and the object to be cleaned 23 attached to the jig-equipped chain conveyor 19 is conveyed into the cleaning apparatus 8 through this conveyance opening 21a. The direction of movement of the jig-equipped chain conveyor 19 is changed by the turnwheel 20, and immediately after advancing into the cleaning device N8 through the conveyance opening 21a, it advances downward. A coil-shaped first cooling corrugated tube 17 is disposed on the way down of this jig-equipped chain conveyor 19, and the ingredient chain conveyor 19 passes through the inside of this first cooling corrugated tube 17 every time. Cold water flows inside the first cooling corrugated tube 17 to cool the vicinity of the first cooling corrugated tube 17. When the jig-equipped chain conveyor 19 moving downward reaches the lower part of the cleaning device 8, its direction of movement is reversed upward by two turn wheels 20.

そして、この方向転換箇所には溶剤タンクlOが設けら
れ、治具付チェンコンベア19に取付けられた被洗浄物
は溶剤タンク10に貯えられた溶剤中を進む。
A solvent tank lO is provided at this direction change point, and the object to be cleaned, which is attached to the jig-equipped chain conveyor 19, moves through the solvent stored in the solvent tank 10.

方向転換して上方に進む治具付チェンコンベア19の周
囲には内枠22によってスプレーブース14が区画形成
され、その両脇には洗浄溶剤を被洗浄物に噴射する噴射
手段として直進性のノズル13が配設されている。この
スプレーブース14は溶剤タンク10内に浸漬し液シー
ルしている。
A spray booth 14 is defined by an inner frame 22 around the jig-equipped chain conveyor 19 that changes direction and moves upward, and on both sides of the booth 14 there are linear nozzles as spray means for spraying cleaning solvent onto the object to be cleaned. 13 are arranged. This spray booth 14 is immersed in the solvent tank 10 and sealed with liquid.

そしてスプレーブース14の上方には、スプレーブース
14の開口部14aより溶剤噴霧が洗浄装置8内を飛散
するのを防止するために、バッファーブース16が区画
形成されてい玩。
A buffer booth 16 is formed above the spray booth 14 in order to prevent the solvent spray from scattering inside the cleaning device 8 from the opening 14a of the spray booth 14.

このバッファーブース16内でth 具材チェンコンベ
ア19は2つのターンホイール20によって180@方
向転換され、バッファーブース16を抜は出た直後にま
た180°方向転1篇されて上方に向って進行する。そ
して上方に進む途中には第2冷却蛇管24が配され、第
2冷却″蛇管24の内方を通過後は洗浄装置:8の外形
に沿って進行し、前記搬送開口部21aに達する。
Inside this buffer booth 16, the ingredient chain conveyor 19 is turned 180 degrees by two turn wheels 20, and immediately after leaving the buffer booth 16, it is turned again 180 degrees and moves upward. . A second cooling flexible pipe 24 is disposed on the way upward, and after passing through the second cooling flexible pipe 24, it proceeds along the outer shape of the cleaning device 8 and reaches the conveyance opening 21a.

また、第2冷却蛇管2jの下方には内枠22によってポ
ンプ室25か区画形成されており、このポンプ室25内
部には洗浄溶剤を圧縮吐出する圧縮手段としてスプレー
ポンプ11が配設され、さらにスプレーポンプ゛11よ
り圧縮吐iされた洗浄溶剤を大気・圧沸点以上に加熱す
るための加熱手段として熱交換器12が配されている。
Further, a pump chamber 25 is defined by an inner frame 22 below the second cooling corrugated pipe 2j, and a spray pump 11 is disposed inside the pump chamber 25 as a compression means for compressing and discharging the cleaning solvent. A heat exchanger 12 is disposed as a heating means for heating the cleaning solvent compressed and discharged from the spray pump 11 to a temperature above the atmospheric pressure boiling point.

尚ミこの熱交換器12は温水等によ□り間接加熱するも
のであ前記溶剤タンク10と前記ポンプ室25との間に
は清浄溶剤タンクtOaが形成されており、この清浄溶
剤タンクtOaには蒸留装置9で蒸留されたきれいな洗
浄溶剤が流入している。そして前記スプレーポンプ11
の吸入管がこの清浄溶剤クンj’ 10 a内に開口し
ており、清浄溶剤タンク10゛h゛丙中のlK曽された
溶剤は前記スプレーポンプ11によって吸い上げられ、
圧縮された後前記熱交換暮12に送られる。キして熱交
換器12で大気圧沸点以上に加熱された後配管15を通
って前記ノズノ113まで圧送され、ノズル13より噴
射される。□ 洗浄溶剤はノズル13より大気圧沸点以上の高温液とな
って噴射されるため、被洗浄物に掛ったへ温液、及びi
らなかった高温液溶剤は蒸発し、漏気に吐っt洗浄装置
8内を浮遊するが、第1.2冷却蛇管17.24によっ
て冷却液化される。
Furthermore, this heat exchanger 12 is for indirect heating with hot water or the like, and a clean solvent tank tOa is formed between the solvent tank 10 and the pump chamber 25. The clean cleaning solvent distilled in the distillation device 9 is flowing into the tank. and the spray pump 11
A suction pipe opens into this cleaning solvent tank 10a, and the solvent in the cleaning solvent tank 10゛h゛ is sucked up by the spray pump 11,
After being compressed, it is sent to the heat exchange chamber 12. After being heated in the heat exchanger 12 to a temperature higher than the atmospheric pressure boiling point, it is fed under pressure through the piping 15 to the nozzle nozzle 113, and is injected from the nozzle 13. □ Since the cleaning solvent is injected from the nozzle 13 as a high-temperature liquid with a boiling point above atmospheric pressure, the hot liquid splashes on the object to be cleaned and
The remaining high temperature liquid solvent evaporates and is discharged into the leakage air and floats in the cleaning device 8, but is cooled and liquefied by the No. 1.2 cooling spiral pipe 17.24.

m1冷却蛇管17及び第2冷却蛇管24にて冷却液化き
れた洗浄溶剤は、洗浄装M8の外面に設置された水分分
離器18に流入する。この水分分離器18は溶剤と水と
を比重によって分離する装置で、分離された溶剤は前記
蒸留器9によって蒸留された溶剤と合流し、前記清浄溶
剤タンク10a内に流入する。また、前記溶剤タンク1
oより溢れ出た溶剤は回収れ、蒸留器9に送られて蒸留
精製される。尚、洗浄装置8内の蒸気溶剤は第1.2冷
却蛇管17.24のみによって冷却液化されるのではな
く、洗浄装置8内を浮遊している間に自然冷却され、液
化して溶剤タンクloあるいは清浄溶剤タンク10aに
流れ込むものもある。また本実施例では洗浄溶剤として
フロン溶剤を用いている。
The cleaning solvent cooled and liquefied in the m1 cooling spiral pipe 17 and the second cooling spiral pipe 24 flows into the moisture separator 18 installed on the outer surface of the cleaning device M8. The water separator 18 is a device that separates solvent and water based on specific gravity, and the separated solvent joins the solvent distilled by the distiller 9 and flows into the clean solvent tank 10a. In addition, the solvent tank 1
The solvent overflowing from o is collected and sent to distiller 9 for distillation and purification. Note that the vaporized solvent in the cleaning device 8 is not cooled and liquefied only by the 1.2 cooling coil pipe 17.24, but is naturally cooled while floating in the cleaning device 8, liquefied, and transferred to the solvent tank lo. Alternatively, some may flow into the cleaning solvent tank 10a. Further, in this embodiment, a fluorocarbon solvent is used as the cleaning solvent.

次に本実施例の作動について説明する。Next, the operation of this embodiment will be explained.

まず、外枠21の搬送開口部21aより外方に出ている
治具付チェンコンベア19に、油等で汚れた被洗浄物2
3を取り付ける。治具付チェンコンベア19は図示しな
い駆動源により第2図中矢印Rで示す方向に駆動されて
おり、最初に被洗浄物23は第1冷却蛇管17の内方を
通過する。その後治具付チェンコンベア19の進行に伴
い溶剤タンク10内に入り、洗浄溶剤に浸漬する。この
とき被洗浄物23に付着している油等は膨張し、一部洗
浄溶剤中に溶解する。そして、次にスプレーブース14
内に入り、ノズル13から溶剤を噴射される。前記清浄
溶剤タンク10aよりスプレーポンプ11によって吸い
上げられた洗浄溶剤は約2kg/cIiI(ゲージ圧)
まで圧縮され、その後熱交換器12によって約80℃ま
で加熱される。そしてこの圧縮加熱された洗浄溶剤がノ
ズル13より噴射されるものである。
First, the object to be cleaned 2 dirty with oil etc.
Attach 3. The jig-equipped chain conveyor 19 is driven by a drive source (not shown) in the direction indicated by arrow R in FIG. 2, and the object to be cleaned 23 first passes inside the first cooling corrugated pipe 17. Thereafter, as the jig-equipped chain conveyor 19 advances, it enters the solvent tank 10 and is immersed in the cleaning solvent. At this time, oil and the like adhering to the object to be cleaned 23 expands and partially dissolves in the cleaning solvent. Then, spray booth 14
The solvent is sprayed from the nozzle 13. The amount of cleaning solvent sucked up by the spray pump 11 from the cleaning solvent tank 10a is approximately 2 kg/cIiI (gauge pressure).
and then heated to about 80° C. by heat exchanger 12. The compressed and heated cleaning solvent is then injected from the nozzle 13.

ここで洗浄溶剤に加える圧力と洗浄溶剤(フロン溶剤)
の沸点との関係を第3図に示す。この第3図よりわかる
様に、洗浄溶剤は大気圧下で47゜6℃で蒸発するが、
2kg/c+a加圧時では84℃で蒸発する。従ってノ
ズル13内までは2 kg / cta 。
The pressure applied to the cleaning solvent and the cleaning solvent (fluorocarbon solvent)
Figure 3 shows the relationship between the boiling point and the boiling point. As can be seen from Figure 3, the cleaning solvent evaporates at 47°6°C under atmospheric pressure.
When pressurized at 2 kg/c+a, it evaporates at 84°C. Therefore, up to the inside of the nozzle 13 is 2 kg/cta.

80℃の洗浄溶剤は高温液状のままであり、この洗浄溶
剤液を被洗浄物に向けて噴射させるのである。また、被
洗浄物に掛らなかった液は液自体の保有している熱容量
で蒸発する。常温と80℃とのフロン溶剤の保有する熱
エネルギは約10倍異なる。この熱エネルギを利用して
80℃の洗浄溶剤液を被洗浄物に照射させることにより
、被洗浄物表面に付着している油等は従来540秒かか
っ□ていたものが約30秒で約70 mg/個から1〜
2mg/個の残留油分になる。さらに、100μ程の微
細な空隙にある油でも、80℃の洗浄溶剤液が浸透し、
空隙内で高温洗浄溶剤液が蒸発し、この洗浄溶剤蒸気の
動きにより洗浄溶剤液が複雑に挙動し微細空隙内の油等
も洗浄する。なお、被洗浄物の汚染程度によっては圧力
、温度とも下げても良い洗浄品質が得られる。ただし、
大気圧沸点以上にする必要がある。
The cleaning solvent at 80° C. remains in a high-temperature liquid state, and this cleaning solvent liquid is sprayed toward the object to be cleaned. Further, the liquid that does not touch the object to be cleaned evaporates due to the heat capacity of the liquid itself. The thermal energy possessed by a fluorocarbon solvent at room temperature and at 80° C. differs by about 10 times. By using this thermal energy to irradiate the object with a cleaning solvent solution at 80°C, oil and other substances adhering to the surface of the object to be cleaned can be removed in about 30 seconds, compared to the previous 540 seconds. mg/piece to 1~
Residual oil content will be 2mg/piece. Furthermore, the cleaning solvent solution at 80°C can penetrate even the oil in minute gaps of about 100μ.
The high-temperature cleaning solvent liquid evaporates within the voids, and the movement of the cleaning solvent vapor causes the cleaning solvent fluid to behave in a complex manner, thereby cleaning oil, etc. within the microscopic voids. Note that, depending on the degree of contamination of the object to be cleaned, good cleaning quality can be obtained by lowering both the pressure and temperature. however,
The temperature must be above the atmospheric pressure boiling point.

溶剤液噴射によって洗浄された被洗浄物は、治具付チェ
ンコンベア19に□伴って、第2冷却蛇管24の内方を
通過して乾燥され、搬送開口部21°::譜≧141h
ri&41sLti?A−iJ[溶剤タンクlO内に流
れ込み、蒸気のままの洗浄溶剤は第1.2冷却蛇管17
.24によって冷却液化され、溶剤タンクlOあるいは
清浄溶剤タンク10a内に流入する。そして、溶剤タン
ク10内に流入する汚れた洗浄溶剤は蒸留器9に送られ
、蒸留器9によって蒸留された後、清浄溶剤タンク10
a内に送られる。この様な洗浄溶剤の流れが繰り返され
る。
The objects to be cleaned that have been cleaned by spraying the solvent liquid are passed through the inside of the second cooling serpentine pipe 24 along with the jig-equipped chain conveyor 19 and dried, and are dried through the conveyance opening 21°:: music≧141h.
ri&41sLti? A-iJ [The cleaning solvent that flows into the solvent tank IO and remains as a vapor flows into the 1.2 cooling spiral pipe 17.
.. The solvent is cooled and liquefied by 24, and flows into the solvent tank IO or the cleaning solvent tank 10a. Then, the dirty cleaning solvent flowing into the solvent tank 10 is sent to the distiller 9, and after being distilled by the distiller 9, the clean solvent tank 10
sent within a. This flow of cleaning solvent is repeated.

本実施例の様な洗浄装置を用いれば、ノズル13より溶
剤を噴射する空間が内枠22によってスプレーブース1
4として区画されているため、噴射溶剤が洗浄装置8外
に飛散することはほとんどない。従って作業環境を良好
に保ちつづけることができる。
If a cleaning device like this embodiment is used, the space in which the solvent is injected from the nozzle 13 is defined by the inner frame 22 in the spray booth 1.
4, the sprayed solvent is hardly scattered outside the cleaning device 8. Therefore, it is possible to continue to maintain a good working environment.

尚、上記実施例では洗浄溶剤としてフロン溶剤を用いた
が、トリクレン、トリクロールエタン等、の洗浄溶剤で
も同様の効果を得ることができる。
In the above embodiments, a chlorofluorocarbon solvent was used as the cleaning solvent, but similar effects can be obtained with cleaning solvents such as trichlene and trichloroethane.

さらに)熱交換812を用いて洗浄溶剤を温水で間接加
熱したが、電気ヒータで直接加熱してもよい。
Furthermore, although the cleaning solvent was indirectly heated with hot water using a heat exchanger 812, it may also be heated directly with an electric heater.

さらに、上記実施例では一槽式の設備で説明したが、多
槽式の溶剤洗浄装置の一工程である一槽内に、この機構
を導入ずればさらに良好な洗浄品質が得られることはも
ちろんである。
Furthermore, although the above embodiment was explained using a single-tank type equipment, it goes without saying that even better cleaning quality can be obtained by introducing this mechanism into a single tank, which is one process in a multi-tank solvent cleaning system. It is.

また、ノズル13として直進性のあるものを利用したが
、被洗浄物の大きさ等によりV型、フルコーン型等のノ
ズルを用いても良い。
Moreover, although a straight-advancing nozzle is used as the nozzle 13, a V-shaped, full-cone, etc. nozzle may be used depending on the size of the object to be cleaned.

以上説明した様に、本発明の洗浄方法を用いれば従来よ
り極めて短時間に高洗浄品質の洗浄を行うことができる
。また、本発明の洗浄装置を用いれば本発明の洗浄方法
を容易に達成することができる。
As explained above, by using the cleaning method of the present invention, high-quality cleaning can be performed in a much shorter time than in the past. Further, by using the cleaning device of the present invention, the cleaning method of the present invention can be easily achieved.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来の洗浄装置を示す断面図、第2図は本発明
の実施例を示す断面図、第3図はフロン溶剤の圧力と沸
点との関係を示ず図である。 11・・・スプレーポンプ(圧縮手段)、12・・・熱
交換器(加熱手段)、13・・・ノズル(噴射手段)。 代理人弁理士 岡 部 隆
FIG. 1 is a sectional view showing a conventional cleaning device, FIG. 2 is a sectional view showing an embodiment of the present invention, and FIG. 3 is a diagram not showing the relationship between the pressure and boiling point of a fluorocarbon solvent. 11... Spray pump (compression means), 12... Heat exchanger (heating means), 13... Nozzle (injection means). Representative Patent Attorney Takashi Okabe

Claims (2)

【特許請求の範囲】[Claims] (1)洗浄溶剤を圧縮する圧縮工程と、前記圧縮工程に
より圧縮された洗浄溶剤を大気圧沸点以上に加熱する加
熱工程と、前記IE縮工程及び加熱工程を圧縮加熱され
た洗浄溶剤を被体浄物に噴射し”C洗浄する洗浄方法。
(1) A compression step of compressing the cleaning solvent; a heating step of heating the cleaning solvent compressed in the compression step to a temperature above the atmospheric pressure boiling point; A cleaning method that sprays onto the clean object and cleans it with "C".
(2)洗浄溶剤を圧縮する圧縮手段と、洗浄溶剤を大気
圧沸点以上に加熱する加熱手段と、前記圧縮手段及び加
熱手段によって圧呻加熱された洗浄溶剤を被洗浄物に噴
射する噴射手段とを備える洗浄装置。
(2) a compression means for compressing the cleaning solvent; a heating means for heating the cleaning solvent to a boiling point above atmospheric pressure; and an injection means for spraying the cleaning solvent compressed and heated by the compression means and the heating means onto the object to be cleaned. A cleaning device equipped with
JP12076083A 1983-07-02 1983-07-02 Washing method and device Granted JPS6012187A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12076083A JPS6012187A (en) 1983-07-02 1983-07-02 Washing method and device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12076083A JPS6012187A (en) 1983-07-02 1983-07-02 Washing method and device

Publications (2)

Publication Number Publication Date
JPS6012187A true JPS6012187A (en) 1985-01-22
JPH0237232B2 JPH0237232B2 (en) 1990-08-23

Family

ID=14794311

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12076083A Granted JPS6012187A (en) 1983-07-02 1983-07-02 Washing method and device

Country Status (1)

Country Link
JP (1) JPS6012187A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03263831A (en) * 1990-03-14 1991-11-25 Dan Clean Prod:Kk Spray cleaning apparatus
JPH0551229A (en) * 1991-08-23 1993-03-02 Bandou Kiko Kk Working machine of glass plate
US5807166A (en) * 1994-07-21 1998-09-15 Bando Kiko Co., Ltd. Glass-plate working machine
JP2011228385A (en) * 2010-04-16 2011-11-10 Denso Corp Cleaning/drying method and cleaning/drying device
JP2013251548A (en) * 2012-05-31 2013-12-12 Semes Co Ltd Substrate cleaning device and substrate cleaning method

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5218594U (en) * 1975-07-28 1977-02-09
JPS5546936A (en) * 1978-09-06 1980-04-02 Ekstroem H A B & Co Mandrel that can be expanded
JPS588378U (en) * 1981-07-07 1983-01-19 内田 千年 A removable cold-weather collar that can also be used as a storage bag for two small items, and a cover for a warmer.

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5218594U (en) * 1975-07-28 1977-02-09
JPS5546936A (en) * 1978-09-06 1980-04-02 Ekstroem H A B & Co Mandrel that can be expanded
JPS588378U (en) * 1981-07-07 1983-01-19 内田 千年 A removable cold-weather collar that can also be used as a storage bag for two small items, and a cover for a warmer.

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03263831A (en) * 1990-03-14 1991-11-25 Dan Clean Prod:Kk Spray cleaning apparatus
JPH0551229A (en) * 1991-08-23 1993-03-02 Bandou Kiko Kk Working machine of glass plate
US5807166A (en) * 1994-07-21 1998-09-15 Bando Kiko Co., Ltd. Glass-plate working machine
JP2011228385A (en) * 2010-04-16 2011-11-10 Denso Corp Cleaning/drying method and cleaning/drying device
JP2013251548A (en) * 2012-05-31 2013-12-12 Semes Co Ltd Substrate cleaning device and substrate cleaning method

Also Published As

Publication number Publication date
JPH0237232B2 (en) 1990-08-23

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