JPS6319309B2 - - Google Patents
Info
- Publication number
- JPS6319309B2 JPS6319309B2 JP58058754A JP5875483A JPS6319309B2 JP S6319309 B2 JPS6319309 B2 JP S6319309B2 JP 58058754 A JP58058754 A JP 58058754A JP 5875483 A JP5875483 A JP 5875483A JP S6319309 B2 JPS6319309 B2 JP S6319309B2
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- mounting plate
- insulator
- wax
- plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Element Separation (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58058754A JPS59187455A (ja) | 1983-04-05 | 1983-04-05 | 絶縁物分離基板の研磨方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58058754A JPS59187455A (ja) | 1983-04-05 | 1983-04-05 | 絶縁物分離基板の研磨方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59187455A JPS59187455A (ja) | 1984-10-24 |
JPS6319309B2 true JPS6319309B2 (enrdf_load_stackoverflow) | 1988-04-22 |
Family
ID=13093321
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58058754A Granted JPS59187455A (ja) | 1983-04-05 | 1983-04-05 | 絶縁物分離基板の研磨方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59187455A (enrdf_load_stackoverflow) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5036630A (en) * | 1990-04-13 | 1991-08-06 | International Business Machines Corporation | Radial uniformity control of semiconductor wafer polishing |
JP3124085B2 (ja) * | 1991-12-02 | 2001-01-15 | 沖電気工業株式会社 | 半導体装置 |
CN102343546A (zh) * | 2011-10-10 | 2012-02-08 | 沈阳理工大学 | 烧结聚晶金刚石冷板冷却高速研磨方法 |
JP2015196224A (ja) * | 2014-04-01 | 2015-11-09 | 株式会社フジミインコーポレーテッド | 研磨方法、及び保持具 |
-
1983
- 1983-04-05 JP JP58058754A patent/JPS59187455A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS59187455A (ja) | 1984-10-24 |
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