JPS63192865A - 多層／多元薄膜形成スパッタリング装置およびその運転方法 - Google Patents
多層／多元薄膜形成スパッタリング装置およびその運転方法Info
- Publication number
- JPS63192865A JPS63192865A JP2506587A JP2506587A JPS63192865A JP S63192865 A JPS63192865 A JP S63192865A JP 2506587 A JP2506587 A JP 2506587A JP 2506587 A JP2506587 A JP 2506587A JP S63192865 A JPS63192865 A JP S63192865A
- Authority
- JP
- Japan
- Prior art keywords
- sputtering
- substrate
- target
- chamber
- central vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004544 sputter deposition Methods 0.000 title claims abstract description 106
- 239000000758 substrate Substances 0.000 claims abstract description 80
- 230000002093 peripheral effect Effects 0.000 claims description 6
- 239000010409 thin film Substances 0.000 abstract description 33
- 238000011109 contamination Methods 0.000 abstract description 7
- 238000000151 deposition Methods 0.000 abstract description 4
- 230000008021 deposition Effects 0.000 abstract description 4
- 238000010030 laminating Methods 0.000 abstract 1
- 239000010408 film Substances 0.000 description 21
- 238000000034 method Methods 0.000 description 18
- 239000000203 mixture Substances 0.000 description 14
- 150000001875 compounds Chemical class 0.000 description 11
- 238000004891 communication Methods 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 229910052802 copper Inorganic materials 0.000 description 5
- 239000012535 impurity Substances 0.000 description 5
- 229910052738 indium Inorganic materials 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 239000000498 cooling water Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000003780 insertion Methods 0.000 description 2
- 230000037431 insertion Effects 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 229910052711 selenium Inorganic materials 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000013077 target material Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 229940126062 Compound A Drugs 0.000 description 1
- NLDMNSXOCDLTTB-UHFFFAOYSA-N Heterophylliin A Natural products O1C2COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC2C(OC(=O)C=2C=C(O)C(O)=C(O)C=2)C(O)C1OC(=O)C1=CC(O)=C(O)C(O)=C1 NLDMNSXOCDLTTB-UHFFFAOYSA-N 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- DVRDHUBQLOKMHZ-UHFFFAOYSA-N chalcopyrite Chemical group [S-2].[S-2].[Fe+2].[Cu+2] DVRDHUBQLOKMHZ-UHFFFAOYSA-N 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2506587A JPS63192865A (ja) | 1987-02-05 | 1987-02-05 | 多層／多元薄膜形成スパッタリング装置およびその運転方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2506587A JPS63192865A (ja) | 1987-02-05 | 1987-02-05 | 多層／多元薄膜形成スパッタリング装置およびその運転方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63192865A true JPS63192865A (ja) | 1988-08-10 |
| JPH0317906B2 JPH0317906B2 (enrdf_load_stackoverflow) | 1991-03-11 |
Family
ID=12155520
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2506587A Granted JPS63192865A (ja) | 1987-02-05 | 1987-02-05 | 多層／多元薄膜形成スパッタリング装置およびその運転方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63192865A (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5753092A (en) * | 1996-08-26 | 1998-05-19 | Velocidata, Inc. | Cylindrical carriage sputtering system |
| WO2001055477A1 (fr) * | 2000-01-27 | 2001-08-02 | Nikon Corporation | Procede de fabrication d'un film de materiau composite renfermant un element generateur de gaz |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5739172A (en) * | 1980-08-19 | 1982-03-04 | Matsushita Electric Ind Co Ltd | Apparatus for preparing thin film |
| JPS6052574A (ja) * | 1983-09-02 | 1985-03-25 | Hitachi Ltd | 連続スパツタ装置 |
-
1987
- 1987-02-05 JP JP2506587A patent/JPS63192865A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5739172A (en) * | 1980-08-19 | 1982-03-04 | Matsushita Electric Ind Co Ltd | Apparatus for preparing thin film |
| JPS6052574A (ja) * | 1983-09-02 | 1985-03-25 | Hitachi Ltd | 連続スパツタ装置 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5753092A (en) * | 1996-08-26 | 1998-05-19 | Velocidata, Inc. | Cylindrical carriage sputtering system |
| WO2001055477A1 (fr) * | 2000-01-27 | 2001-08-02 | Nikon Corporation | Procede de fabrication d'un film de materiau composite renfermant un element generateur de gaz |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0317906B2 (enrdf_load_stackoverflow) | 1991-03-11 |
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