JPH032228B2 - - Google Patents
Info
- Publication number
- JPH032228B2 JPH032228B2 JP11658585A JP11658585A JPH032228B2 JP H032228 B2 JPH032228 B2 JP H032228B2 JP 11658585 A JP11658585 A JP 11658585A JP 11658585 A JP11658585 A JP 11658585A JP H032228 B2 JPH032228 B2 JP H032228B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- substrate
- vacuum chamber
- sputtering
- rotating frame
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 38
- 238000001704 evaporation Methods 0.000 claims description 19
- 230000008020 evaporation Effects 0.000 claims description 18
- 238000010438 heat treatment Methods 0.000 claims description 8
- 238000007740 vapor deposition Methods 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 6
- 238000005477 sputtering target Methods 0.000 claims description 5
- 239000010408 film Substances 0.000 description 35
- 238000004544 sputter deposition Methods 0.000 description 21
- 238000000034 method Methods 0.000 description 11
- 230000015572 biosynthetic process Effects 0.000 description 8
- 239000010409 thin film Substances 0.000 description 5
- 230000008569 process Effects 0.000 description 4
- 238000011109 contamination Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000137 annealing Methods 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 239000003779 heat-resistant material Substances 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910001120 nichrome Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11658585A JPS61276964A (ja) | 1985-05-31 | 1985-05-31 | 回転式成膜装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11658585A JPS61276964A (ja) | 1985-05-31 | 1985-05-31 | 回転式成膜装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61276964A JPS61276964A (ja) | 1986-12-06 |
| JPH032228B2 true JPH032228B2 (enrdf_load_stackoverflow) | 1991-01-14 |
Family
ID=14690774
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11658585A Granted JPS61276964A (ja) | 1985-05-31 | 1985-05-31 | 回転式成膜装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61276964A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US12087726B2 (en) * | 2019-11-08 | 2024-09-10 | Ev Group E. Thallner Gmbh | Device and method for joining substrates |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05132766A (ja) * | 1991-07-30 | 1993-05-28 | Showa Shinku:Kk | 生産用高周波イオンプレーテイング装置 |
| JP4167833B2 (ja) | 2002-01-24 | 2008-10-22 | 株式会社ユーテック | 成膜装置、酸化物薄膜成膜用基板及びその製造方法 |
| JP5384002B2 (ja) * | 2007-10-31 | 2014-01-08 | 株式会社ライク | 成膜装置及び成膜方法 |
| JP5142111B2 (ja) * | 2008-12-26 | 2013-02-13 | 学校法人金沢工業大学 | スパッタリング装置 |
| JP2012052149A (ja) * | 2008-12-26 | 2012-03-15 | Kanazawa Inst Of Technology | スパッタリング装置 |
-
1985
- 1985-05-31 JP JP11658585A patent/JPS61276964A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US12087726B2 (en) * | 2019-11-08 | 2024-09-10 | Ev Group E. Thallner Gmbh | Device and method for joining substrates |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61276964A (ja) | 1986-12-06 |
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