JPS6319001B2 - - Google Patents

Info

Publication number
JPS6319001B2
JPS6319001B2 JP7171981A JP7171981A JPS6319001B2 JP S6319001 B2 JPS6319001 B2 JP S6319001B2 JP 7171981 A JP7171981 A JP 7171981A JP 7171981 A JP7171981 A JP 7171981A JP S6319001 B2 JPS6319001 B2 JP S6319001B2
Authority
JP
Japan
Prior art keywords
light
subject
receiving surface
lens
light receiving
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP7171981A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57186106A (en
Inventor
Koichi Kugimya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP7171981A priority Critical patent/JPS57186106A/ja
Priority to US06/348,086 priority patent/US4547073A/en
Publication of JPS57186106A publication Critical patent/JPS57186106A/ja
Publication of JPS6319001B2 publication Critical patent/JPS6319001B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501Semiconductor wafers
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8851Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8887Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges based on image processing techniques
    • G01N2021/889Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges based on image processing techniques providing a bare video image, i.e. without visual measurement aids
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8803Visual inspection

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP7171981A 1981-02-17 1981-05-13 Inspection device for surface Granted JPS57186106A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP7171981A JPS57186106A (en) 1981-05-13 1981-05-13 Inspection device for surface
US06/348,086 US4547073A (en) 1981-02-17 1982-02-11 Surface examining apparatus and method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7171981A JPS57186106A (en) 1981-05-13 1981-05-13 Inspection device for surface

Publications (2)

Publication Number Publication Date
JPS57186106A JPS57186106A (en) 1982-11-16
JPS6319001B2 true JPS6319001B2 (ru) 1988-04-21

Family

ID=13468605

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7171981A Granted JPS57186106A (en) 1981-02-17 1981-05-13 Inspection device for surface

Country Status (1)

Country Link
JP (1) JPS57186106A (ru)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006226804A (ja) * 2005-02-17 2006-08-31 Matsushita Electric Ind Co Ltd フラットディスプレイパネルの検査方法
JP2006266934A (ja) * 2005-03-24 2006-10-05 Sumitomo Electric Ind Ltd フィルムの欠陥検出方法および欠陥検出装置

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02151802A (ja) * 1988-12-05 1990-06-11 Matsushita Electric Ind Co Ltd 潜像を投影する鏡面状体、その製造方法、及びその認識方法
JP5348765B2 (ja) * 2009-07-21 2013-11-20 株式会社リューズ 平板状透明体の微小凹凸欠陥検査方法及び装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006226804A (ja) * 2005-02-17 2006-08-31 Matsushita Electric Ind Co Ltd フラットディスプレイパネルの検査方法
JP2006266934A (ja) * 2005-03-24 2006-10-05 Sumitomo Electric Ind Ltd フィルムの欠陥検出方法および欠陥検出装置

Also Published As

Publication number Publication date
JPS57186106A (en) 1982-11-16

Similar Documents

Publication Publication Date Title
US4547073A (en) Surface examining apparatus and method
US6862097B2 (en) Three-dimensional shape measuring method, and three-dimensional shape measuring apparatus
JP4130531B2 (ja) 透明な基板上の構造の測定装置及び測定方法
JP2008275612A (ja) 半導体製造用のサブストレート上の構造体を測定する高解像度を備えた装置及び測定装置におけるアパーチャの使用
JPS5999304A (ja) 顕微鏡系のレーザ光による比較測長装置
WO1993016373A1 (en) Apparatus for optical inspection of patterned substrates
Ishihara et al. High-speed surface measurement using a non-scanning multiple-beam confocal microscope
TW200931009A (en) Inspecting apparatus and inspecting method
TWI627513B (zh) 用於感測或判定一工件之對準及高度之器件及方法、對準感測器及電子束微影之裝置
CN102087483A (zh) 一种用于投影光刻中焦面检测的光学系统
CN106933055B (zh) 一种对准装置和对准方法
JPS61108904A (ja) 光学的干渉測定装置
JPS61111402A (ja) 位置検出装置
CN106483777A (zh) 一种具有调焦功能的对准系统及对准方法
JPS6319001B2 (ru)
CN104880913A (zh) 一种提高工艺适应性的调焦调平系统
JPS63241407A (ja) 微細凹部の深さ測定方法及びその装置
JPS6313446Y2 (ru)
CN109073371B (zh) 倾斜检测的设备及方法
JPH04348019A (ja) 焦点位置検出装置及び投影露光装置
JPH0612753B2 (ja) パターン検出方法及びその装置
JPS58179303A (ja) 表面微小観察装置
JPS6316964Y2 (ru)
JP3182746B2 (ja) 位置検出装置
JP3198466B2 (ja) 位置検出装置、及び露光装置