JPS6318687A - 回路基板 - Google Patents

回路基板

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Publication number
JPS6318687A
JPS6318687A JP61161783A JP16178386A JPS6318687A JP S6318687 A JPS6318687 A JP S6318687A JP 61161783 A JP61161783 A JP 61161783A JP 16178386 A JP16178386 A JP 16178386A JP S6318687 A JPS6318687 A JP S6318687A
Authority
JP
Japan
Prior art keywords
circuit board
board
plate
joint
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61161783A
Other languages
English (en)
Other versions
JPH0680873B2 (ja
Inventor
英樹 佐藤
水野谷 信幸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
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Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP61161783A priority Critical patent/JPH0680873B2/ja
Priority to US07/071,134 priority patent/US4835065A/en
Priority to DE8787109996T priority patent/DE3784192T2/de
Priority to EP87109996A priority patent/EP0252518B1/en
Priority to KR1019870007472A priority patent/KR900003850B1/ko
Publication of JPS6318687A publication Critical patent/JPS6318687A/ja
Publication of JPH0680873B2 publication Critical patent/JPH0680873B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
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    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal
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    • C04B37/00Joining burned ceramic articles with other burned ceramic articles or other articles by heating
    • C04B37/003Joining burned ceramic articles with other burned ceramic articles or other articles by heating by means of an interlayer consisting of a combination of materials selected from glass, or ceramic material with metals, metal oxides or metal salts
    • C04B37/006Joining burned ceramic articles with other burned ceramic articles or other articles by heating by means of an interlayer consisting of a combination of materials selected from glass, or ceramic material with metals, metal oxides or metal salts consisting of metals or metal salts
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    • H01L23/12Mountings, e.g. non-detachable insulating substrates
    • H01L23/13Mountings, e.g. non-detachable insulating substrates characterised by the shape
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    • H01L23/14Mountings, e.g. non-detachable insulating substrates characterised by the material or its electrical properties
    • H01L23/15Ceramic or glass substrates
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
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    • Y10S428/901Printed circuit
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    • Y10T428/12493Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12535Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
    • Y10T428/12542More than one such component
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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    • Y10T428/12819Group VB metal-base component
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Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。

Description

【発明の詳細な説明】 [発明の目的] (産業上の利用分野) 本発明は回路基板に関し、さらに詳しくは、一部に放熱
性に優れた窒化アルミニウム板が接合されたアルミナ板
よりなる複合型回路基板であって、両者の熱膨張率の差
に起因するクラックなどが両者間の接合部で生ずること
がない回路基板に関する。
(従来の技術) 従来、半導体用回路基板としては、安価なアルミナ(A
文、03)の基板上に回路を形成し、ここに半導体装置
をはじめとする各種素子を搭載した形式のものが一般的
であった。
ところが、近年、半導体装置の大出力化に伴って、素子
の発熱量が増大しており、上記のAM。03ス(板では
放熱性の点で必ずしも満足し得ないという問題が生じて
いる。
かかる問題を解消するためには、A交203に代えて放
熱性の侵れた窒化アルミニウム(A I N)で回路基
板を構成すればよいが、しかし、AuNはAI、o3に
比べてはるかに高価であるため、あまり実用的であると
は言い難い。
そこで、最近、An2o3板とAIN板とを組合せて回
路基板を構成し、発熱量かとくに大きい素子の下部のみ
にAuN板を配置せしめることにより放熱性の改善およ
びコストの低廉化を図ることか試みられている。
このような複合型の回路基板の構成としては、第3χに
示したようにAl203板1の所望の箇所に、AlN板
の形状に対応する開口部1aを設け、ここに、A I 
N板2を嵌め込み、AlN板2の側面を、開口部1a内
壁面に接合した構成、あるいは第4図に示したように、
A I 203板1の裏面の開口1a周縁部に、AlN
板2の一方の面の周縁部を接合した構成などをあげるこ
とができる。この接合に際して、画板の接合領域にそれ
ぞれ公知のメタライズを施したのち、ろう材を介して接
合を行なうことが一般的である。
しかしなから、AuNとAM。03とではその熱膨張係
数に大きな差があるため、使用時にこの熱膨張係数の差
に起因して応力が発生し、これにより接合部にクラック
が生じて・、極端な場合にはAlN板が脱落したり、こ
の回に基板に封着シールを施してパンケージとした場合
は、その飢寒性が低下してしまうなどの不都合がある。
(発明が解決しようとする問題点) このように、従来のA旦203/AIN複合型回路基板
にあっては1両者の熱膨張係数の差に起因して、使用時
にクラックが生じるという問題があった。
本発明は、従来のかかる問題を解消し、一部にAlN板
が接合されてなるAl2O3/A旦N複合型回路基板に
おいて、使用時に両者の接合部にクラックなどが生ずる
ことのない回路基板の提供を目的とする。
[発明の構成] (問題点を解決するだめの手段) 本発明者は、上記目的を達成すべく、主として、Al2
03板とAlN板の接合部の構造に焦点を絞って鋭意研
究を重ねた結果、各々の接合面間に、両者の熱膨張の差
を吸収する緩衝材として機能する金属層を介在せしめれ
ばよいとの着想を得、かかる金属材料が満足すべき条件
を見出して本発明を完成するに至った。
すなわち、本発明の回路基板は、アルミナ板と窒化アル
ミニウム板とが接合されてなる回路基板であって、該ア
ルミナ板および窒化アルミニウム板の接合面にはそれぞ
れメタライズ層が形成されており、 これら2つのメタ
ライズ層の間に、(a)500’C以下で再結晶して塑
性変形し、(b)500’Cにおける引張強度が35 
kgf/ mm2以下であり、かつ、 (c)500℃における伸びが10%以上である 金属材料よりなる緩衝材層が介在せしめられてなること
を特徴とする。
本発明の回路基板は、前述したように、Al203板と
AlN板との接合構造に特徴を有するものであり、その
形状などは全く限定されるも○ではない。具体的には、
第3図、第4図に示した如き構造かあげられるが、Al
N板は1箇所に限らず複数箇所に嵌め込まれていてもよ
く、また、A父203板の中央に限らず端部に位mして
いてもよい。
第1図は、第3図に示した回路基板の接合部の縦断面図
を示し、Al。03板1の開口1a(第3図)内にAl
N板2が嵌め込まれて両者が接合されている。AlN板
は放熱性の向上を目的として使用するのであるから、熱
伝導率が50 W / =n・k以上のものであること
が好ましい。この接合部の構造を詳細に説明すると、ま
ず、Al203板1の開口1aの内壁面1 ’cにはメ
タライズ層3およびメッキ層4がこの順に形成されてい
る。メタラ・イズ層3の材料としてはモリブデン(Mo
)、タングステン(W)なとを使用することができ、公
知のメタライズ法を適用することにより形成される。メ
ンキ層4の材料としてはとくに限定されるものではなく
、通常の二、ケル(Ni)  メンキなとを使用するこ
とかできる。
一方、AINW2の側面2aにも、上記と同様の、メタ
ライズ層5およびメンキ層6が形成されている。これら
の接合面ib5よび2aは互いに対向し、それぞれのメ
タライズ面4および6の間に例えば銀ろうなどのろう材
層7および8、並びに緩衝材層9を介して接合されてい
る。この緩衝材層9は本発明の骨子をなすものであり、
上記の(a)〜(C)の条件をすべて満足する金属材料
によって構成されている。この条件が1つでも満足され
ないと、緩衝機能が充分に発揮されず、クラック発生の
原因となる。これらの具体例としては、例えば、ニッケ
ル(Ni)系合金;クロム(Cr)系合金;りん青銅、
ベリリウム銅、タフピンチ銅、黄銅などの銅(Cu)系
合金;その他KOV=Cuクラッド材、M o −Cu
クラッド材、W−Cuクランド材などをあげることがで
きる。
これらの金属材料は上記(a)〜(C)の条件に加えて
、さらに、(d)熱伝導率が50 W / m・k以上
であること、および、(e)熱膨張率がAfN−Afz
○3の熱膨張率の中間値をとることの2点を満足すると
緩衝機能を向上させる上で有効である。
一方、第2図は第4図に示した回路基板の接合部の縦断
面図を示したもので、An203板1の接合面を裏面の
開口1a周縁部IC1およびAlN板2の接合面を表面
周縁部2bとした以外は上記第1図と同様の接合部の構
造となっている。
(作用) このような本発明の回路基板にあっては、AlN板上に
とくに発熱量の大きい半導体素子を搭載しても、充分な
放熱効果を得ることができる。また、AINとA交20
3との接合部には、緩衝材層が介在せしめられているた
め、素子の発熱により接合部の温度が上昇しても、A 
I NとA文203の熱膨張係数の差に起因して発生す
る応力を緩衝材層が吸収するため、クランクなどの発生
が防止される。
(実施例) 第1図、第3図に示した如き回路基板を製造した。すな
わち、50 X 50 mm、厚さ0.5!QmのAn
、03板1の中央に20 X 20 mmの開口1aを
穿設し、この開口la内にこれと略同形状のAlN板2
を接合した。各々の接合面1bおよび2bにはモリブデ
ンよりなるメタライズ層3.5、ニッケルメッキ層4.
6がそれぞれ形成され、これらの接合面は銀ろう層7.
8および無酸素銅よりなる緩衝材層9を介して接合され
ている。
このようにして得られた回路基板において、AIN板2
板面表面タライズ層を介してSiチップを搭載し、A文
203板1表面に公知の方法によって回路を形成して全
体)封着することによりパッケージを製造した。このパ
ッケージ100個について、その動作状態を観察したと
ころ、A文203とAIHの接合部にクラックが発生し
たものは皆無であった。
なお、比較のために、緩衝材層を介在せしめなかったこ
とを除いては上記実施例と同様にして回路基板およびパ
ッケージを製造し、同様の評価を行なったところ、10
0個中9o個にクランクが発生したことが確認された。
[発明の効果] 以上の説明から明らかなように、本発明の回路基板は、
A文、03板とAlN板を組合せてなるものであるため
、放熱効果が満足すべきものであるとともに価格は低床
となり、しかも、A文203とA父Nとの接合部には緩
衝材層が介在せしめられているため、作動詩に接合部の
温度が上昇してもクラックなどが発生することがなく、
極めて信頼性の高いものである。したがって、その工業
的価値は犬である。
【図面の簡単な説明】
第1図および第2図は本発明の回路基板の接合部の構造
を示し、それぞれ第3図のA−A線および第4図のB−
B線に添う縦断面図、第3図および第4図は複合型回路
基板の斜視図である。 1・・・・・・A文203板。 2・・・・・・AlN板、 1a・・・・・・開口、 lb、1c、2a、2 b、、、 ・、、 接合面、3
.5・・・・・・メタライズ層、 9・・・・・・緩衝材層。 第1図 第2図 第3図 第4図

Claims (1)

  1. 【特許請求の範囲】  アルミナ板と窒化アルミニウム板とが接合されてなる
    回路基板であって、 該アルミナ板および窒化アルミニウム板の接合面にはそ
    れぞれメタライズ層が形成されており、これら2つのメ
    タライズ層の間に、 (a)500℃以下で再結晶して塑性変形し、(b)5
    00℃における引張強度が35kgf/mm^2以下で
    あり、かつ、 (c)500℃における伸びが10%以上である 金属材料よりなる緩衝材層が介在せしめられてなること
    を特徴とする回路基板。
JP61161783A 1986-07-11 1986-07-11 回路基板 Expired - Fee Related JPH0680873B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP61161783A JPH0680873B2 (ja) 1986-07-11 1986-07-11 回路基板
US07/071,134 US4835065A (en) 1986-07-11 1987-07-08 Composite alumina-aluminum nitride circuit substrate
DE8787109996T DE3784192T2 (de) 1986-07-11 1987-07-10 Schaltungssubstrat.
EP87109996A EP0252518B1 (en) 1986-07-11 1987-07-10 Circuit substrate
KR1019870007472A KR900003850B1 (ko) 1986-07-11 1987-07-11 회로기판

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61161783A JPH0680873B2 (ja) 1986-07-11 1986-07-11 回路基板

Publications (2)

Publication Number Publication Date
JPS6318687A true JPS6318687A (ja) 1988-01-26
JPH0680873B2 JPH0680873B2 (ja) 1994-10-12

Family

ID=15741822

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61161783A Expired - Fee Related JPH0680873B2 (ja) 1986-07-11 1986-07-11 回路基板

Country Status (5)

Country Link
US (1) US4835065A (ja)
EP (1) EP0252518B1 (ja)
JP (1) JPH0680873B2 (ja)
KR (1) KR900003850B1 (ja)
DE (1) DE3784192T2 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0261529A (ja) * 1988-08-29 1990-03-01 Anritsu Corp ダブルグレーティング型分光装置
US5057376A (en) * 1988-11-15 1991-10-15 Asahi Glass Company Ltd. Hybrid package, glass ceramic substrate for the hybrid package, and composition for the glass ceramic substrate

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Publication number Priority date Publication date Assignee Title
SG48868A1 (en) * 1987-07-03 1998-05-18 Sumitomo Electric Industries Connection structure between components for semiconductor apparatus
US5264388A (en) * 1988-05-16 1993-11-23 Sumitomo Electric Industries, Inc. Sintered body of aluminum nitride
US4951014A (en) * 1989-05-26 1990-08-21 Raytheon Company High power microwave circuit packages
DE69013124T2 (de) * 1989-09-25 1995-05-04 Gen Electric Direktverbundene Metallsubstratstrukturen.
US5100740A (en) * 1989-09-25 1992-03-31 General Electric Company Direct bonded symmetric-metallic-laminate/substrate structures
JP4483366B2 (ja) * 2004-03-25 2010-06-16 ヤマハ株式会社 半導体パッケージおよびその製造方法
WO2009095486A2 (en) * 2008-02-01 2009-08-06 Interuniversitair Microelektronica Centrum Vzw Semiconductor package
US9141157B2 (en) * 2011-10-13 2015-09-22 Texas Instruments Incorporated Molded power supply system having a thermally insulated component

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Publication number Priority date Publication date Assignee Title
US3457052A (en) * 1965-09-14 1969-07-22 Westinghouse Electric Corp High temperature,electrically conductive hermetic seals
GB1387478A (en) * 1972-07-28 1975-03-19 British Leyland Truck & Bus Method of brazing ceramic articles to one another
JPS5815241A (ja) * 1981-07-20 1983-01-28 Sumitomo Electric Ind Ltd 半導体装置用基板
DE3247985C2 (de) * 1982-12-24 1992-04-16 W.C. Heraeus Gmbh, 6450 Hanau Keramischer Träger
DE3316807A1 (de) * 1983-05-07 1984-11-08 Robert Bosch Gmbh, 7000 Stuttgart Hartlot-legierung zum verbinden von oxidkeramiken unter sich oder mit metallen
JPS6077178A (ja) * 1983-09-30 1985-05-01 株式会社東芝 窒化物セラミックス接合体およびその製造方法
DE3587481T2 (de) * 1984-02-27 1993-12-16 Toshiba Kawasaki Kk Schaltungssubstrat mit hoher Wärmeleitfähigkeit.
JPS617647A (ja) * 1984-06-21 1986-01-14 Toshiba Corp 回路基板
JPS62197379A (ja) * 1986-02-20 1987-09-01 株式会社東芝 窒化アルミニウム基板
US4770953A (en) * 1986-02-20 1988-09-13 Kabushiki Kaisha Toshiba Aluminum nitride sintered body having conductive metallized layer

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0261529A (ja) * 1988-08-29 1990-03-01 Anritsu Corp ダブルグレーティング型分光装置
US5057376A (en) * 1988-11-15 1991-10-15 Asahi Glass Company Ltd. Hybrid package, glass ceramic substrate for the hybrid package, and composition for the glass ceramic substrate

Also Published As

Publication number Publication date
DE3784192T2 (de) 1993-08-05
DE3784192D1 (de) 1993-03-25
KR900003850B1 (ko) 1990-06-02
US4835065A (en) 1989-05-30
EP0252518A1 (en) 1988-01-13
KR880002423A (ko) 1988-04-30
JPH0680873B2 (ja) 1994-10-12
EP0252518B1 (en) 1993-02-17

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