JPS63182071A - Preparation of monomolecular built-up film - Google Patents

Preparation of monomolecular built-up film

Info

Publication number
JPS63182071A
JPS63182071A JP62015536A JP1553687A JPS63182071A JP S63182071 A JPS63182071 A JP S63182071A JP 62015536 A JP62015536 A JP 62015536A JP 1553687 A JP1553687 A JP 1553687A JP S63182071 A JPS63182071 A JP S63182071A
Authority
JP
Japan
Prior art keywords
water
monomolecular
film
films
substrates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62015536A
Other languages
Japanese (ja)
Other versions
JPH0824888B2 (en
Inventor
Motoyoshi Hatada
畑田 元義
Hideji Tamura
田村 秀治
Kazufumi Ogawa
一文 小川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Japan Atomic Energy Agency
Panasonic Holdings Corp
Original Assignee
Japan Atomic Energy Research Institute
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Atomic Energy Research Institute, Matsushita Electric Industrial Co Ltd filed Critical Japan Atomic Energy Research Institute
Priority to JP62015536A priority Critical patent/JPH0824888B2/en
Priority to KR1019870011746A priority patent/KR900003755B1/en
Publication of JPS63182071A publication Critical patent/JPS63182071A/en
Publication of JPH0824888B2 publication Critical patent/JPH0824888B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Coating Apparatus (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)

Abstract

PURPOSE:To conserve manufacturing time, to lower material cost and labor to a large extent, by a method wherein the surfaces of the water having the first and second monomolecular films are formed in a separated state within a water tank and a rotary body is interposed between both surfaces of the water to successively build up the monomolecular films on a plurality of the substrates mounted on said rotary body. CONSTITUTION:A plurality of substrates 11 such as semiconductive wafers are mounted on the rotary surface of a rotary body 3. The surface of the water in a water tank 1 is divided into two surface-of water parts 14, 15 by a support rod 5 and monomolecular films of long chain fatty acids respectively different in a chemical formula are formed. In the first and second surface-of-water parts 14, 15, the rotary body 3 is rotated from the air to the water or from the water to the air in a predetermined direction to transfer the monomolecular films to the substrates 11. By this method, by changing the rotary direction of the rotary body 3, the number of rotations thereof or the kinds of the materials to be used for the monomolecular films, the kinds of the built-up films or the built-up number thereof can be easily controlled and the monomolecular built-up films are formed on a large number of the substrates within a short time.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は、表面が疎水性または親水性を有する任意の基
板上に、単分子膜又はこの累積膜を形成する方法に関す
るものである。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a method for forming a monomolecular film or a cumulative film thereof on any substrate having a hydrophobic or hydrophilic surface.

従来の技術 従来、ラングミュア・プロジェット法は、単分子累積膜
の製造方法として半導体分野やバイオテクノロジー分野
などの研究を行う上で分子レベルの薄膜形成の一手法と
して検討がなされている。
BACKGROUND OF THE INVENTION Conventionally, the Langmuir-Prodgett method has been studied as a method for forming thin films at the molecular level in research in the semiconductor field, biotechnology field, etc. as a method for producing monomolecular cumulative films.

例えば、半導体分野においては、ウェハー製造プロセス
における超高分解能のレジスト材料として不飽和脂肪膜
の単分子累積膜を利用する研究がさけれている。こうし
た分野で用いられている単分子累積膜の製造装置は、ト
ラフと呼ばれる水槽内の水の表面に、膜形成分子を含ん
だ展開液を展開後、面方向に圧縮後表面圧を加えること
によって単分子膜を形成し、水面に対して垂直方向から
基板を降下・上昇させて基板上に累積膜を製造すること
を原理としたものが殆どである。従って、前記累積膜の
構成を容易に変化させたり、短時間で効率よく複数の基
板に累積膜を積層するのに最適な単分子累積膜の製造装
置および方法はまだ実用化されていない。
For example, in the semiconductor field, research on the use of monomolecular cumulative films of unsaturated fat films as ultra-high resolution resist materials in wafer manufacturing processes has been avoided. The monomolecular cumulative film production equipment used in these fields spreads a developing solution containing film-forming molecules on the surface of water in a water tank called a trough, compresses it in the plane direction, and then applies surface pressure. Most of the methods are based on the principle of forming a monomolecular film and lowering and raising the substrate from a direction perpendicular to the water surface to produce a cumulative film on the substrate. Therefore, an apparatus and method for producing a monomolecular cumulative film that is optimal for easily changing the configuration of the cumulative film and for efficiently laminating the cumulative film on a plurality of substrates in a short period of time has not yet been put into practical use.

発明が解決しようとする問題点 ところが、実際に必要とされる前記単分子累積膜の種類
としては、膜間において親水基同士や疎水基同士が向か
い合っている形のY膜や、親水基と、疎水基が向かい合
っている形のX、Z膜などがあり、更に、2種以上の材
料で単分子膜を構成する複合膜や、前記累積膜を構成す
る各単分子膜が各々材料の異なる形のへテロ膜などもあ
る。また膜数については、その利用分野の用途に応じて
数層から数百層まで様々なものが必要とされる。
Problems to be Solved by the Invention However, the types of the monomolecular cumulative film that are actually required include a Y film in which hydrophilic groups and hydrophobic groups face each other between the films; There are X and Z films in which the hydrophobic groups face each other, and there are also composite films in which a monomolecular film is made of two or more types of materials, and films in which each monomolecular film forming the cumulative film is made of different materials. There are also hetero membranes. Furthermore, the number of layers required varies from a few layers to several hundreds depending on the field of use.

ところが、現在一般に用いられている前記単分子累積膜
製造装置では、単分子膜を形成する水面部分が一種類し
かないので、ヘテロ膜の製造の際には、水面部分にて膜
材料を頻繁に入れ替えることになり、多大の労力と材料
が必要であった。
However, in the currently commonly used monomolecular cumulative film manufacturing equipment, there is only one type of water surface area where the monomolecular film is formed, so when manufacturing a hetero membrane, the membrane material is frequently added to the water surface area. It had to be replaced, which required a great deal of labor and materials.

また、製造に使用できる基板の数も、−回の操作に対し
て一枚の割合なので、製造能率が非常に低かった。
In addition, the number of substrates that can be used for manufacturing is one for every - number of operations, resulting in extremely low manufacturing efficiency.

問題点を解決するための手段 本発明は上述のような、従来の問題点に鑑みなされたも
のである。すなわち、本発明は、第1の単分子膜が形成
された。水面と第2の単分子膜が形成された水面とを、
水槽内に分離形成し、前記第1の水面および第2の水面
において空中から水中へ又は水中から空中へ移動する回
転面を有する回転体を水槽に設け、回転面に複数枚の基
板を装着し、回転体を回転させて単分子膜を移し取る方
法である。
Means for Solving the Problems The present invention has been made in view of the conventional problems as described above. That is, in the present invention, the first monolayer was formed. The water surface and the water surface on which the second monomolecular film was formed,
A rotating body formed separately in the aquarium and having a rotating surface that moves from the air to the water or from the water to the air on the first water surface and the second water surface is provided in the aquarium, and a plurality of substrates are attached to the rotating surface. This is a method in which the monomolecular film is transferred by rotating a rotating body.

作用 上述のような製造方法を用いることより、回転体の回転
にて必要な種類と累積数の単分子累積膜を、単短間かつ
必要最低限の材料で複数の基板表面に容易に製造するこ
とができるもので、累積膜製造に要する時間や材料費あ
るいは労働力が大幅に節減される。
Effect: By using the manufacturing method described above, monomolecular cumulative films of the required type and cumulative number can be easily manufactured on multiple substrate surfaces in a short period of time and with the minimum necessary materials by rotating a rotating body. This significantly reduces the time, material costs, and labor required for cumulative membrane manufacturing.

実施例 第1図は本発明の一実施例に用いる単分子累積膜製造装
置を示し、第2図は第1図の装置の平面および断面を示
す。1は水槽(トラフ)、2はバリア3は回転体、4は
回転軸、5は支持棒、6は固定板、7は回転モーター、
8はバリアモーター、9はバリアレール、10は冷却月
給・排水パイプ、11は単分子膜が表面に形成される基
板、12は給水バイブ、13は排水パイプ、14は第1
の水面部分、15は第2の水面部分である。なお第2図
(b)、(C)はそれぞれ第2図(a)のx−x ’線
、Y−Y ’線の断面図である。基板11はたとえば半
導体基板ウェハーであり、基板11は回転体3の回転面
に設けられたたとえばバネ等にて基板11の端部を押さ
える等により装着される。
Embodiment FIG. 1 shows a monomolecular cumulative film manufacturing apparatus used in an embodiment of the present invention, and FIG. 2 shows a plane and a cross section of the apparatus shown in FIG. 1 is a water tank (trough), 2 is a barrier 3 is a rotating body, 4 is a rotating shaft, 5 is a support rod, 6 is a fixed plate, 7 is a rotating motor,
8 is a barrier motor, 9 is a barrier rail, 10 is a cooling monthly supply/drainage pipe, 11 is a substrate on which a monomolecular film is formed, 12 is a water supply vibrator, 13 is a drainage pipe, 14 is a first
The water surface portion 15 is the second water surface portion. Note that FIGS. 2(b) and 2(C) are cross-sectional views taken along line XX' and Y-Y' in FIG. 2(a), respectively. The substrate 11 is, for example, a semiconductor substrate wafer, and the substrate 11 is mounted by pressing the end of the substrate 11 with, for example, a spring provided on the rotating surface of the rotating body 3 .

水槽(トラフ)1の側面には給水バイブ12および排水
パイプ13が、また、中の底部には冷却月給・排水パイ
プ10が取り付けられている。また冷却月給・排水パイ
プ10の上方には、単分子膜が移し取られる任意の基板
11をその両面に複数枚装着しである回転体3が、側面
にバリア2を有する4本の支持棒5で支えられている。
A water supply vibrator 12 and a drainage pipe 13 are attached to the side of the water tank (trough) 1, and a cooling monthly supply/drainage pipe 10 is attached to the bottom of the tank. Further, above the cooling monthly supply/drainage pipe 10, there is a rotary body 3 having a plurality of arbitrary substrates 11 on both sides of which the monomolecular film is transferred, and four support rods 5 having barriers 2 on the sides. is supported by

なお、この回転体3は、回転軸4と連結しており、その
動作は外部の回転体モーター7により制御されている。
Note that this rotating body 3 is connected to a rotating shaft 4, and its operation is controlled by an external rotating body motor 7.

また、支持棒5には、より安定性を増すために2枚の固
定板6が取り付けられている。
Furthermore, two fixing plates 6 are attached to the support rod 5 to further increase stability.

一方、給水バイブ12から供給された水槽1内の水の表
面は、支持棒5によって、第1の水面部分14と第2の
水面部分15とに区分されており、2本のバリヤ2は、
この2つの水面上の単分子膜を面方向に第2図の矢印に
示すように加圧(圧縮)するためのもので、その両端に
は第2図(a)の位置から、それぞれ回転体3に向かっ
て移動できるよう、バリアモータ8の連結したバリアレ
ール9が取り付けである。
On the other hand, the surface of the water in the aquarium 1 supplied from the water supply vibrator 12 is divided into a first water surface portion 14 and a second water surface portion 15 by the support rod 5, and the two barriers 2 are
This is to pressurize (compress) these two monomolecular films on the water surface in the direction of the surface as shown by the arrows in Figure 2, and at each end there are rotating bodies from the position shown in Figure 2 (a). 3, a barrier rail 9 connected to a barrier motor 8 is attached.

次に、この第1の実施例の装置を用いた方法を説明する
。基板11(llsl〜1134)の1つの基板11s
1の表面への膜形成を説明する。第3図(a)に示すよ
うに、水槽内の水の表面は支持棒5により、第1の水面
部分14と第2の水面部分15とに区別されるため、い
わゆるラングミュア法によって、2つの水面部分14.
15にそれぞれ各々化学式の異なる長鎖脂肪酸(たとえ
ば、CHs(CH2)、−COOH,nは整数)の単分
子膜17と18が形成される。そこで回転体3のA矢印
方向の回転により、その回転面の両主面に、表面が水面
と垂直に取り付けられた半導体基板(ウェハー)等の親
水性の基板111は、第2の表面部分15に7水中から
空中へ出る方向に移動することになり、その表面には単
分子膜18が移し取られる。さらに第3図(b)に示す
ように、回転体3の(B矢印方向の)回転により、基板
111は第1の水面部分14にて、空中から水中へ入る
方向に移動することにより、その表面には単分子膜17
が移し取られる。次に第3図(C)に示すように、回転
体3のC矢印方向の回転により基板111は第1の水面
部分14にて水中から空中へ出る方向に移動することに
より、その表面には単分子膜17が移し取られる。そし
て第3図(d)に示すように、回転体3のD矢印方向の
回転により、基板11−1は第2の水面部分15にて、
空中から水中へ入る方向に移動することにより、その表
面には単分子18が移し取られ、結果として基板11.
1上にはY型でかつヘテロ型の単分子累積膜20が形成
される。
Next, a method using the apparatus of this first embodiment will be explained. One substrate 11s of the substrates 11 (llsl to 1134)
The formation of a film on the surface of No. 1 will be explained. As shown in FIG. 3(a), the surface of the water in the aquarium is divided into a first water surface portion 14 and a second water surface portion 15 by the support rod 5. Water surface part 14.
Monomolecular films 17 and 18 of long-chain fatty acids having different chemical formulas (for example, CHs (CH2), -COOH, n is an integer) are formed on 15, respectively. Therefore, by rotation of the rotating body 3 in the direction of arrow A, a hydrophilic substrate 111 such as a semiconductor substrate (wafer) whose surface is attached perpendicularly to the water surface is attached to both main surfaces of the rotating surface, and the second surface portion 15 7, it moves in the direction of exiting from the water into the air, and the monomolecular film 18 is transferred to its surface. Furthermore, as shown in FIG. 3(b), due to the rotation of the rotating body 3 (in the direction of arrow B), the substrate 111 moves in the direction from the air into the water at the first water surface portion 14. Monomolecular film 17 on the surface
is transferred. Next, as shown in FIG. 3(C), as the rotating body 3 rotates in the direction of the arrow C, the substrate 111 moves from the water to the air at the first water surface portion 14, so that the surface of the substrate 111 is Monolayer 17 is transferred. Then, as shown in FIG. 3(d), due to the rotation of the rotating body 3 in the direction of arrow D, the substrate 11-1 is moved to the second water surface portion 15.
By moving from the air into the water, single molecules 18 are transferred to the surface, resulting in substrate 11.
1, a Y-shaped and hetero-type monomolecular cumulative film 20 is formed.

なお、上記の実施例において、回転板の回転方向・回転
数あるいは使用する単分子層材料の種類を変えることに
より、累積膜の種類(すなわちX、Y、Z型)や累積数
を容易に制御することができる。さらに、回転体の回転
面の両主面に設置する基板の数の多い程、短時間で多数
の基板に単分子累積膜を形成することができる。また、
2つの水面14.15には同一の単分子膜を形成してお
(場合にも本発明の方法は適用可能である。
In the above embodiment, the type of cumulative film (i.e., X, Y, Z type) and number of cumulative films can be easily controlled by changing the direction and speed of rotation of the rotating plate or the type of monomolecular layer material used. can do. Furthermore, the larger the number of substrates installed on both main surfaces of the rotating surface of the rotating body, the more monomolecular cumulative films can be formed on a larger number of substrates in a shorter time. Also,
The method of the present invention is also applicable to the case where the same monomolecular film is formed on the two water surfaces 14 and 15.

ところで、基板を保持する回転体3は、必ずしも第1の
実施例のような円板状である必要はなく、水車のような
構造でも良い。この場合の作用を第2の実施例として次
に説明する。
By the way, the rotating body 3 that holds the substrate does not necessarily have to be disc-shaped as in the first embodiment, and may have a water wheel-like structure. The operation in this case will be described below as a second embodiment.

第4図(a)に示すように、水槽内の水の表面は支柱捧
5により、第1の実施例における第3図(a)の場合と
同様、第1の水面部分14と第2の水面部分15とに区
分され、それぞれ単分子膜17と18が形成される。そ
こで水車型の回転体3のA矢印方向の回転により、回転
体3に垂直にかつ水面と表面が平行に取り付けられた疎
水性の基板11は、第2の水面部分15にて空中から水
中へ入る方向に移動することになり、その表面には単分
子膜18が移し取られて付着するなお、基板11はたと
えば回転体3に溝等を形成しここに端部を挿入して装着
される。さらに第4図(b)に示すように、回転体3の
B矢印方向への回転により、基板11は第1の水面部分
14にて、水中から空中へ出る方向に移動することによ
り、その表面には単分子膜17が移し取られる。次に第
4図(e)に示すように、回転体3のC矢印方向への回
転により、基板11には第2の水面部分15にて空中か
ら水中へ入る方向に移動することにより、基板11には
単分子膜18が移し取られる。そして第4図(d)に示
すように、回転体3のD矢印方向の回転により、基板1
1には第1の水面部分14にて水中から空中へ出る方向
に移動することにより5基板11には単分子膜17が移
し取られ、結果として基板上にはY型でかつヘテロ型の
単分子累積膜21が形成される。なお、従来の単分子累
積膜製造装置を用いた方法と本発明に基づ(同装置を用
いた方法との膜製造能率を比較すると、膜積層方法が第
3図のごとき垂直浸漬法の場合表1の様になり、第4図
のごとき水平付着法の場合は表2の様になる。(但し、
積層時間については、表1.2とも積層数を3層の場合
とし、その内分けを第1及び第3層をサンプルA、第2
層をサンプルBとしたヘテロ型累積膜として換算する。
As shown in FIG. 4(a), the surface of the water in the aquarium is separated by a support 5 between the first water surface portion 14 and the second water surface, as in the case of FIG. 3(a) in the first embodiment. It is divided into a water surface portion 15, and monomolecular films 17 and 18 are formed thereon, respectively. Therefore, by rotating the waterwheel-shaped rotating body 3 in the direction of arrow A, the hydrophobic substrate 11, which is attached perpendicularly to the rotating body 3 and whose surface is parallel to the water surface, moves from the air to the water at the second water surface portion 15. The monomolecular film 18 is transferred and attached to the surface of the substrate 11.The substrate 11 is attached by forming a groove or the like in the rotating body 3 and inserting the end thereof into the groove. . Further, as shown in FIG. 4(b), as the rotating body 3 rotates in the direction of arrow B, the substrate 11 moves from the water to the air at the first water surface portion 14, and the surface The monomolecular film 17 is transferred to. Next, as shown in FIG. 4(e), as the rotating body 3 rotates in the direction of arrow C, the substrate 11 is moved from the air to the water at the second water surface portion 15, and the substrate 11 is moved from the air to the water. A monomolecular film 18 is transferred to 11. Then, as shown in FIG. 4(d), the substrate 1 is rotated by the rotation of the rotating body 3 in the direction of arrow D.
1, the monomolecular film 17 is transferred to the 5 substrate 11 by moving from the water to the air at the first water surface portion 14, and as a result, a Y-shaped and hetero-type monolayer is deposited on the substrate. A molecular accumulation film 21 is formed. In addition, when comparing the film production efficiency between the method using the conventional monomolecular cumulative film production equipment and the method using the same equipment (based on the present invention), when the film lamination method is the vertical immersion method as shown in Figure 3, The result will be as shown in Table 1, and in the case of the horizontal attachment method as shown in Figure 4, it will be as shown in Table 2. (However,
Regarding the lamination time, both Table 1.2 assumes that the number of laminated layers is 3, and the division is into sample A for the first and third layers, and sample A for the second layer.
It is converted into a hetero-type cumulative film with sample B as the layer.

(以下余白) 表  1 表  2 発明の効果 本発明によると、半導体プロセスに用いるレジスト材料
等として単分子累積膜を半導体基板上に形成する場合、
必要な型と累積数のへテロ累積膜を、短時間で多量に形
成することができる。またへテロ膜を製造する場合、単
分子膜の入れ替え作業が不要となるので、労力も削減さ
れる。従って、従来の方法に比べ能率の良い単分子累積
膜製造が行える。更にまた、回転体への基板の装着方法
を変えることにより、垂直付着法と水平付着法の両方に
使用可能な単分子累積膜製造を行うことができ、単分子
累積膜の製造に大きく寄与するものである。
(Margin below) Table 1 Table 2 Effects of the Invention According to the present invention, when a monomolecular cumulative film is formed on a semiconductor substrate as a resist material used in a semiconductor process,
A large amount of hetero-cumulative films of the required type and cumulative number can be formed in a short time. Furthermore, when manufacturing a hetero membrane, there is no need to replace the monomolecular membrane, so labor is also reduced. Therefore, monomolecular cumulative film production can be performed more efficiently than conventional methods. Furthermore, by changing the method of attaching the substrate to the rotating body, it is possible to produce monomolecular cumulative films that can be used in both vertical and horizontal deposition methods, which greatly contributes to the production of monomolecular cumulative films. It is something.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の第1実施例に用いる単分子累積膜製造
装置の要部の斜視図、第2図(a)は第1図の装置の平
面図、第2図(b)、(C)は(a)におけるX−X’
、Y−Y’断面図、第3図(a) 〜(d)は本発明の
第1の実施例の垂直付着単分子累積膜形成方法の工程を
示す回転部の概念図、第4図(a)〜(d)は本発明の
第2の実施例の水平付着単分子累積膜形成方法の工程を
示す回転部の概念図である。 1・・・水槽(トラフ)、2・・・バリヤ、3・・・回
転体、4・・・回転軸、5・・・支柱棒、6・・・固定
板、7・・・回転体モーター、8・・・バリヤモーター
、9・・・バリヤレール、10・・・冷却用給・排水パ
イプ、11.1181〜s4・・・基板、12・・・給
水パイプ、13・・・排水パイプ、14・・・第1の水
面部分、15・・・第2の水面部分、17.18・・・
単分子膜、20.21・・・単分子累積膜。 代理人の氏名 弁理士 中尾敏男 ほか1名第2図 /Z       17 第2図 第3図 11sチ ハ4図
FIG. 1 is a perspective view of the main parts of the monomolecular cumulative film manufacturing apparatus used in the first embodiment of the present invention, FIG. 2(a) is a plan view of the apparatus of FIG. 1, and FIG. 2(b), C) is XX' in (a)
, YY' sectional view, FIGS. 3(a) to 3(d) are conceptual diagrams of the rotating part showing the steps of the vertically attached monomolecular cumulative film forming method of the first embodiment of the present invention, and FIG. a) to (d) are conceptual diagrams of a rotating part showing steps of a method for forming a horizontally deposited monomolecular cumulative film according to a second embodiment of the present invention. 1... Water tank (trough), 2... Barrier, 3... Rotating body, 4... Rotating shaft, 5... Support rod, 6... Fixed plate, 7... Rotating body motor , 8... Barrier motor, 9... Barrier rail, 10... Cooling supply/drainage pipe, 11.1181-s4... Board, 12... Water supply pipe, 13... Drainage pipe, 14 ...First water surface portion, 15...Second water surface portion, 17.18...
Monomolecular film, 20.21... Monomolecular cumulative film. Name of agent: Patent attorney Toshio Nakao and one other person Figure 2/Z 17 Figure 2 Figure 3 11s Chiha Figure 4

Claims (5)

【特許請求の範囲】[Claims] (1)第1の単分子膜が形成された第1の水面と、第2
の単分子膜が形成された第2の水面とを水槽内に分離形
成し、前記第1および第2の水面において空中から水中
へ又は水中から空中へ移動する回転面を有する回転体を
前記水槽に設け、前記回転面に複数枚の基板を装着し、
前記回転体を回転させることにより前記複数枚の基板上
に前記単分子膜を移し取ることを特徴とする単分子累積
膜の製造方法。
(1) A first water surface on which a first monomolecular film is formed, and a second water surface on which a first monomolecular film is formed.
A second water surface on which a monomolecular film is formed is formed separately in the aquarium, and a rotating body having a rotating surface that moves from the air to the water or from the water to the air on the first and second water surfaces is provided in the aquarium. and a plurality of substrates are mounted on the rotating surface,
A method for producing a monomolecular cumulative film, characterized in that the monomolecular film is transferred onto the plurality of substrates by rotating the rotating body.
(2)第1の水面と第2の水面が同一の水槽内に形成さ
れていることを特徴とする特許請求の範囲第1項記載の
単分子累積膜の製造方法。
(2) The method for producing a monomolecular cumulative film according to claim 1, wherein the first water surface and the second water surface are formed in the same water tank.
(3)回転体の両主面の回転面に基板が装着されること
を特徴とする特許請求の範囲第1項記載の単分子累積膜
の製造方法。
(3) A method for producing a monomolecular cumulative film according to claim 1, characterized in that a substrate is mounted on both rotating surfaces of the rotating body.
(4)第1および第2の単分子膜が水面において面方向
に圧縮されていることを特徴とする特許請求の範囲第1
項記載の単分子累積膜の製造方法。
(4) Claim 1, characterized in that the first and second monomolecular films are compressed in the surface direction at the water surface.
A method for producing a monomolecular cumulative film as described in Section 1.
(5)基板表面が、水面においてほぼ垂直または水平に
なるように回転体に装着されることを特徴とする特許請
求の範囲第1項記載の単分子累積膜の製造方法。
(5) The method for producing a monomolecular cumulative film according to claim 1, wherein the substrate surface is mounted on a rotating body so as to be substantially perpendicular or horizontal to the water surface.
JP62015536A 1986-02-06 1987-01-26 Method for producing monomolecular cumulative film Expired - Fee Related JPH0824888B2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP62015536A JPH0824888B2 (en) 1987-01-26 1987-01-26 Method for producing monomolecular cumulative film
KR1019870011746A KR900003755B1 (en) 1986-02-06 1987-10-22 Automatic vending machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62015536A JPH0824888B2 (en) 1987-01-26 1987-01-26 Method for producing monomolecular cumulative film

Publications (2)

Publication Number Publication Date
JPS63182071A true JPS63182071A (en) 1988-07-27
JPH0824888B2 JPH0824888B2 (en) 1996-03-13

Family

ID=11891527

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62015536A Expired - Fee Related JPH0824888B2 (en) 1986-02-06 1987-01-26 Method for producing monomolecular cumulative film

Country Status (1)

Country Link
JP (1) JPH0824888B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006082038A (en) * 2004-09-17 2006-03-30 Hokkaido Univ Manufacturing method for thin-film laminated structure, thin-film laminated structure, function element, manufacturing method for function element, and manufacturing device of thin-film laminated structure and heterostructure

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006082038A (en) * 2004-09-17 2006-03-30 Hokkaido Univ Manufacturing method for thin-film laminated structure, thin-film laminated structure, function element, manufacturing method for function element, and manufacturing device of thin-film laminated structure and heterostructure

Also Published As

Publication number Publication date
JPH0824888B2 (en) 1996-03-13

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