JPS63176366A - 窒化珪素焼結体の製造方法 - Google Patents
窒化珪素焼結体の製造方法Info
- Publication number
- JPS63176366A JPS63176366A JP62005121A JP512187A JPS63176366A JP S63176366 A JPS63176366 A JP S63176366A JP 62005121 A JP62005121 A JP 62005121A JP 512187 A JP512187 A JP 512187A JP S63176366 A JPS63176366 A JP S63176366A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- coating layer
- silicon nitride
- impermeable
- sintered body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910052581 Si3N4 Inorganic materials 0.000 title claims description 20
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 title claims description 20
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- 239000011247 coating layer Substances 0.000 claims description 49
- 239000011521 glass Substances 0.000 claims description 36
- 238000000034 method Methods 0.000 claims description 25
- 238000002844 melting Methods 0.000 claims description 20
- 230000008018 melting Effects 0.000 claims description 16
- 239000010410 layer Substances 0.000 claims description 12
- 239000000843 powder Substances 0.000 claims description 11
- 238000010438 heat treatment Methods 0.000 claims description 8
- 238000007872 degassing Methods 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 7
- 238000005245 sintering Methods 0.000 claims description 5
- 239000011148 porous material Substances 0.000 claims description 3
- 239000007789 gas Substances 0.000 description 31
- 230000005855 radiation Effects 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- 229910001873 dinitrogen Inorganic materials 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 239000011261 inert gas Substances 0.000 description 4
- 238000013001 point bending Methods 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005538 encapsulation Methods 0.000 description 3
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 239000002775 capsule Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 238000000462 isostatic pressing Methods 0.000 description 2
- 230000035699 permeability Effects 0.000 description 2
- 239000005373 porous glass Substances 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 239000005297 pyrex Substances 0.000 description 2
- 238000005488 sandblasting Methods 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- YKTSYUJCYHOUJP-UHFFFAOYSA-N [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] Chemical compound [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] YKTSYUJCYHOUJP-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 238000000889 atomisation Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 238000005056 compaction Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 210000003038 endothelium Anatomy 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
Landscapes
- Ceramic Products (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62005121A JPS63176366A (ja) | 1987-01-14 | 1987-01-14 | 窒化珪素焼結体の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62005121A JPS63176366A (ja) | 1987-01-14 | 1987-01-14 | 窒化珪素焼結体の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63176366A true JPS63176366A (ja) | 1988-07-20 |
| JPH0361627B2 JPH0361627B2 (enrdf_load_stackoverflow) | 1991-09-20 |
Family
ID=11602483
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62005121A Granted JPS63176366A (ja) | 1987-01-14 | 1987-01-14 | 窒化珪素焼結体の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63176366A (enrdf_load_stackoverflow) |
-
1987
- 1987-01-14 JP JP62005121A patent/JPS63176366A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0361627B2 (enrdf_load_stackoverflow) | 1991-09-20 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |