JPS6313337B2 - - Google Patents
Info
- Publication number
- JPS6313337B2 JPS6313337B2 JP55136595A JP13659580A JPS6313337B2 JP S6313337 B2 JPS6313337 B2 JP S6313337B2 JP 55136595 A JP55136595 A JP 55136595A JP 13659580 A JP13659580 A JP 13659580A JP S6313337 B2 JPS6313337 B2 JP S6313337B2
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- electron
- deflection
- exposure apparatus
- deviation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55136595A JPS5760842A (en) | 1980-09-30 | 1980-09-30 | Electron beam exposure device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55136595A JPS5760842A (en) | 1980-09-30 | 1980-09-30 | Electron beam exposure device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5760842A JPS5760842A (en) | 1982-04-13 |
| JPS6313337B2 true JPS6313337B2 (enExample) | 1988-03-25 |
Family
ID=15178965
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP55136595A Granted JPS5760842A (en) | 1980-09-30 | 1980-09-30 | Electron beam exposure device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5760842A (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6182428A (ja) * | 1984-09-29 | 1986-04-26 | Toshiba Corp | 電荷ビ−ム光学鏡筒のレンズ調整方法 |
| JPH0789684B2 (ja) * | 1985-07-18 | 1995-09-27 | 日本航空株式会社 | 吸引式磁気浮上車輌の軌道構造 |
-
1980
- 1980-09-30 JP JP55136595A patent/JPS5760842A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5760842A (en) | 1982-04-13 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4677301A (en) | Alignment apparatus | |
| US5345085A (en) | Method and structure for electronically measuring beam parameters | |
| JPS6335094B2 (enExample) | ||
| JPH0324771B2 (enExample) | ||
| JP2004214435A (ja) | 電子ビーム描画装置及び電子ビーム描画方法 | |
| US5466549A (en) | Method of detecting and adjusting exposure conditions of charged particle exposure system | |
| US6822248B2 (en) | Spatial phase locking with shaped electron beam lithography | |
| JPS6313337B2 (enExample) | ||
| JP2786662B2 (ja) | 荷電ビーム描画方法 | |
| JPH06163381A (ja) | 電子線露光装置 | |
| JP2786660B2 (ja) | 荷電ビーム描画方法 | |
| JP2004311809A (ja) | 可変面積型電子ビーム描画装置における電子ビームの照射時間校正方法 | |
| JPH04303918A (ja) | 荷電ビーム描画装置 | |
| JPH08227840A (ja) | 荷電粒子線描画装置における調整方法および描画方法 | |
| JP3175112B2 (ja) | 荷電粒子線露光方法 | |
| JPH0282514A (ja) | 荷電粒子ビーム描画方法 | |
| JPS6320376B2 (enExample) | ||
| JPH0318331B2 (enExample) | ||
| JP3002246B2 (ja) | 荷電ビーム補正方法 | |
| JP2988883B2 (ja) | 荷電ビーム描画装置におけるビーム調整方法 | |
| JP2786661B2 (ja) | 荷電ビーム描画方法 | |
| JP2621179B2 (ja) | アライメント方法 | |
| JP3083428B2 (ja) | 荷電粒子ビーム描画方法 | |
| JPS6312146A (ja) | パタ−ン寸法計測方法 | |
| JPS62295419A (ja) | 電子ビ−ム露光装置 |