JPH0318331B2 - - Google Patents

Info

Publication number
JPH0318331B2
JPH0318331B2 JP55142729A JP14272980A JPH0318331B2 JP H0318331 B2 JPH0318331 B2 JP H0318331B2 JP 55142729 A JP55142729 A JP 55142729A JP 14272980 A JP14272980 A JP 14272980A JP H0318331 B2 JPH0318331 B2 JP H0318331B2
Authority
JP
Japan
Prior art keywords
electron
emission rate
deviation
laser mirror
electron beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP55142729A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5766634A (en
Inventor
Mamoru Nakasuji
Sadao Sasaki
Mineo Goto
Ryoichi Yoshikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP55142729A priority Critical patent/JPS5766634A/ja
Publication of JPS5766634A publication Critical patent/JPS5766634A/ja
Publication of JPH0318331B2 publication Critical patent/JPH0318331B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP55142729A 1980-10-13 1980-10-13 Electron beam exposure device Granted JPS5766634A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55142729A JPS5766634A (en) 1980-10-13 1980-10-13 Electron beam exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55142729A JPS5766634A (en) 1980-10-13 1980-10-13 Electron beam exposure device

Publications (2)

Publication Number Publication Date
JPS5766634A JPS5766634A (en) 1982-04-22
JPH0318331B2 true JPH0318331B2 (enExample) 1991-03-12

Family

ID=15322220

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55142729A Granted JPS5766634A (en) 1980-10-13 1980-10-13 Electron beam exposure device

Country Status (1)

Country Link
JP (1) JPS5766634A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59161818A (ja) * 1983-03-07 1984-09-12 Nippon Telegr & Teleph Corp <Ntt> 矩形荷電ビ−ムの回転検出方法及び矩形荷電ビ−ム露光装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5360178A (en) * 1976-11-10 1978-05-30 Toshiba Corp Target for focusing of electron beam
JPS5583806A (en) * 1978-12-20 1980-06-24 Chiyou Lsi Gijutsu Kenkyu Kumiai Square beam direction detection system

Also Published As

Publication number Publication date
JPS5766634A (en) 1982-04-22

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