JPS63129340A - 放射線感応樹脂組成物 - Google Patents

放射線感応樹脂組成物

Info

Publication number
JPS63129340A
JPS63129340A JP27536086A JP27536086A JPS63129340A JP S63129340 A JPS63129340 A JP S63129340A JP 27536086 A JP27536086 A JP 27536086A JP 27536086 A JP27536086 A JP 27536086A JP S63129340 A JPS63129340 A JP S63129340A
Authority
JP
Japan
Prior art keywords
copolymer
compd
acetylene
sulfonyl
50mol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP27536086A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0584895B2 (https=
Inventor
Minoru Matsuda
松田　實
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Denka Co Ltd
Original Assignee
Denki Kagaku Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Denki Kagaku Kogyo KK filed Critical Denki Kagaku Kogyo KK
Priority to JP27536086A priority Critical patent/JPS63129340A/ja
Publication of JPS63129340A publication Critical patent/JPS63129340A/ja
Publication of JPH0584895B2 publication Critical patent/JPH0584895B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP27536086A 1986-11-20 1986-11-20 放射線感応樹脂組成物 Granted JPS63129340A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27536086A JPS63129340A (ja) 1986-11-20 1986-11-20 放射線感応樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27536086A JPS63129340A (ja) 1986-11-20 1986-11-20 放射線感応樹脂組成物

Publications (2)

Publication Number Publication Date
JPS63129340A true JPS63129340A (ja) 1988-06-01
JPH0584895B2 JPH0584895B2 (https=) 1993-12-03

Family

ID=17554387

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27536086A Granted JPS63129340A (ja) 1986-11-20 1986-11-20 放射線感応樹脂組成物

Country Status (1)

Country Link
JP (1) JPS63129340A (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0683056A (ja) * 1991-12-12 1994-03-25 American Teleph & Telegr Co <Att> デバイスの製造方法
US6537736B1 (en) 1999-03-12 2003-03-25 Matsushita Electric Industrial Co., Ltd. Patten formation method

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6310634A (ja) * 1986-06-20 1988-01-18 Chisso Corp 二酸化硫黄、アセチレン化合物およびビニル化合物の共重合体

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6310634A (ja) * 1986-06-20 1988-01-18 Chisso Corp 二酸化硫黄、アセチレン化合物およびビニル化合物の共重合体

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0683056A (ja) * 1991-12-12 1994-03-25 American Teleph & Telegr Co <Att> デバイスの製造方法
US6537736B1 (en) 1999-03-12 2003-03-25 Matsushita Electric Industrial Co., Ltd. Patten formation method

Also Published As

Publication number Publication date
JPH0584895B2 (https=) 1993-12-03

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