JPS6311642B2 - - Google Patents
Info
- Publication number
- JPS6311642B2 JPS6311642B2 JP8408484A JP8408484A JPS6311642B2 JP S6311642 B2 JPS6311642 B2 JP S6311642B2 JP 8408484 A JP8408484 A JP 8408484A JP 8408484 A JP8408484 A JP 8408484A JP S6311642 B2 JPS6311642 B2 JP S6311642B2
- Authority
- JP
- Japan
- Prior art keywords
- exposure
- stripes
- substrate
- diffraction grating
- integrated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 21
- 238000000034 method Methods 0.000 claims description 16
- 238000004519 manufacturing process Methods 0.000 claims description 15
- 229920002120 photoresistant polymer Polymers 0.000 claims description 13
- 238000005530 etching Methods 0.000 claims description 2
- 230000000737 periodic effect Effects 0.000 claims description 2
- 238000011161 development Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- WTQZSMDDRMKJRI-UHFFFAOYSA-N 4-diazoniophenolate Chemical compound [O-]C1=CC=C([N+]#N)C=C1 WTQZSMDDRMKJRI-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
Landscapes
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Semiconductor Lasers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8408484A JPS60229001A (ja) | 1984-04-27 | 1984-04-27 | 集積化回折格子の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8408484A JPS60229001A (ja) | 1984-04-27 | 1984-04-27 | 集積化回折格子の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60229001A JPS60229001A (ja) | 1985-11-14 |
| JPS6311642B2 true JPS6311642B2 (de) | 1988-03-15 |
Family
ID=13820624
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8408484A Granted JPS60229001A (ja) | 1984-04-27 | 1984-04-27 | 集積化回折格子の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60229001A (de) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2725913B2 (ja) * | 1991-08-29 | 1998-03-11 | 富士通株式会社 | ホログラム描画装置 |
| JP2774398B2 (ja) * | 1991-09-17 | 1998-07-09 | 富士通株式会社 | ホログラム作成装置 |
| FR2725527B1 (fr) * | 1994-10-10 | 1996-12-20 | Talneau Anne | Filtre optique pour plusieurs longueurs d'ondes guidees |
| US7228034B2 (en) | 2003-11-03 | 2007-06-05 | Intel Corporation | Interference patterning |
| JP5326806B2 (ja) * | 2009-05-21 | 2013-10-30 | 住友電気工業株式会社 | 半導体光素子を作製する方法 |
-
1984
- 1984-04-27 JP JP8408484A patent/JPS60229001A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60229001A (ja) | 1985-11-14 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |