JPS6292637U - - Google Patents

Info

Publication number
JPS6292637U
JPS6292637U JP18589085U JP18589085U JPS6292637U JP S6292637 U JPS6292637 U JP S6292637U JP 18589085 U JP18589085 U JP 18589085U JP 18589085 U JP18589085 U JP 18589085U JP S6292637 U JPS6292637 U JP S6292637U
Authority
JP
Japan
Prior art keywords
thin film
light
amorphous semiconductor
film forming
semiconductor thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18589085U
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP18589085U priority Critical patent/JPS6292637U/ja
Publication of JPS6292637U publication Critical patent/JPS6292637U/ja
Pending legal-status Critical Current

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy

Description

【図面の簡単な説明】
第1図は本考案の一実施例の断面図、第2図は
従来装置の一例の断面図、第3図、第4図はそれ
ぞれ本考案の異なる実施例の断面図である。 1:反応槽、2:上部電極、3:下部電極、5
:ガス供給口、6:ガス排気口、8:ガラス基板
、9:透明導電膜、11:ハロゲンランプ、12
:窓、13:冷却水管、14:紫外光源。

Claims (1)

  1. 【実用新案登録請求の範囲】 (1) グロー放電もしくは、光の照射により原料
    ガスを分解して基板上に非晶質半導体薄膜を形成
    するものにおいて、薄膜形成部分に可視光から赤
    外光の範囲の光を照射する光源を備えたことを特
    徴とする非晶質半導体薄膜形成装置。 (2) 実用新案登録請求の範囲第1項記載の装置
    において、基板の薄膜形成面と反対側に冷却手段
    を備えたことを特徴とする非晶質半導体薄膜形成
    装置。
JP18589085U 1985-12-02 1985-12-02 Pending JPS6292637U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18589085U JPS6292637U (ja) 1985-12-02 1985-12-02

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18589085U JPS6292637U (ja) 1985-12-02 1985-12-02

Publications (1)

Publication Number Publication Date
JPS6292637U true JPS6292637U (ja) 1987-06-13

Family

ID=31134939

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18589085U Pending JPS6292637U (ja) 1985-12-02 1985-12-02

Country Status (1)

Country Link
JP (1) JPS6292637U (ja)

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