JPS61158947U - - Google Patents
Info
- Publication number
- JPS61158947U JPS61158947U JP4337485U JP4337485U JPS61158947U JP S61158947 U JPS61158947 U JP S61158947U JP 4337485 U JP4337485 U JP 4337485U JP 4337485 U JP4337485 U JP 4337485U JP S61158947 U JPS61158947 U JP S61158947U
- Authority
- JP
- Japan
- Prior art keywords
- reaction
- susceptor
- gas
- phase growth
- vapor phase
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000001947 vapour-phase growth Methods 0.000 claims description 4
- 239000012495 reaction gas Substances 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 claims description 2
- 239000007789 gas Substances 0.000 claims 3
- 238000006243 chemical reaction Methods 0.000 claims 2
- 239000012071 phase Substances 0.000 claims 1
- 238000006552 photochemical reaction Methods 0.000 claims 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Description
第1図は本考案の気相成長装置の縦断面図、第
2図は第1図のA―A線断面図、第3図aは従来
の気相成長装置の縦断面図、第3図bは第3図a
のB―B線断面図である。 1…ステンレス鋼製ベルジヤ、2…加熱台、3
…サセプタ、4…半導体ウエハ、5…反応ガス供
給管、6…UV光源ランプ、7…照射窓、8…排
気管。
2図は第1図のA―A線断面図、第3図aは従来
の気相成長装置の縦断面図、第3図bは第3図a
のB―B線断面図である。 1…ステンレス鋼製ベルジヤ、2…加熱台、3
…サセプタ、4…半導体ウエハ、5…反応ガス供
給管、6…UV光源ランプ、7…照射窓、8…排
気管。
Claims (1)
- ベルジヤ内に設けられた加熱台上のサセプタに
載置されて加熱された半導体ウエハに、特定の波
長の光を照射した反応ガスを接触させ光化学反応
させて気相成長せしめ、反応後のガスを排気管よ
り排気させるようにした気相成長装置において、
着脱自在で、かつ回転可能な円板形サセプタと、
サセプタ中心部・両端部の各領域ごとに独立して
反応ガスを供給する反応ガス供給管と、反応後の
ガスを各領域ごとに独立して排気する排気管とを
有することを特徴とする気相成長装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1985043374U JPH0530351Y2 (ja) | 1985-03-26 | 1985-03-26 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1985043374U JPH0530351Y2 (ja) | 1985-03-26 | 1985-03-26 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61158947U true JPS61158947U (ja) | 1986-10-02 |
JPH0530351Y2 JPH0530351Y2 (ja) | 1993-08-03 |
Family
ID=30554984
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1985043374U Expired - Lifetime JPH0530351Y2 (ja) | 1985-03-26 | 1985-03-26 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0530351Y2 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02291114A (ja) * | 1989-04-29 | 1990-11-30 | Toyoda Gosei Co Ltd | 化合物半導体膜の気相成長装置 |
WO1993006619A1 (en) * | 1991-09-27 | 1993-04-01 | Komatsu Electronic Metals Co., Ltd. | Apparatus for introducing gas, and apparatus and method for epitaxial growth |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55121650A (en) * | 1979-03-14 | 1980-09-18 | Pioneer Electronic Corp | Cvd device |
JPS5678497A (en) * | 1979-11-27 | 1981-06-27 | Fujitsu Ltd | Vapor growth apparatus |
JPS56137639A (en) * | 1980-03-31 | 1981-10-27 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Decompression vapor growth device |
-
1985
- 1985-03-26 JP JP1985043374U patent/JPH0530351Y2/ja not_active Expired - Lifetime
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55121650A (en) * | 1979-03-14 | 1980-09-18 | Pioneer Electronic Corp | Cvd device |
JPS5678497A (en) * | 1979-11-27 | 1981-06-27 | Fujitsu Ltd | Vapor growth apparatus |
JPS56137639A (en) * | 1980-03-31 | 1981-10-27 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Decompression vapor growth device |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02291114A (ja) * | 1989-04-29 | 1990-11-30 | Toyoda Gosei Co Ltd | 化合物半導体膜の気相成長装置 |
WO1993006619A1 (en) * | 1991-09-27 | 1993-04-01 | Komatsu Electronic Metals Co., Ltd. | Apparatus for introducing gas, and apparatus and method for epitaxial growth |
Also Published As
Publication number | Publication date |
---|---|
JPH0530351Y2 (ja) | 1993-08-03 |
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