JPS6292439A - パタ−ン形成方法 - Google Patents

パタ−ン形成方法

Info

Publication number
JPS6292439A
JPS6292439A JP60232984A JP23298485A JPS6292439A JP S6292439 A JPS6292439 A JP S6292439A JP 60232984 A JP60232984 A JP 60232984A JP 23298485 A JP23298485 A JP 23298485A JP S6292439 A JPS6292439 A JP S6292439A
Authority
JP
Japan
Prior art keywords
pattern
original mask
alignment mark
transferred
transfer plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60232984A
Other languages
English (en)
Japanese (ja)
Other versions
JPH033373B2 (en:Method
Inventor
Kunihiko Ueno
邦彦 上野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Priority to JP60232984A priority Critical patent/JPS6292439A/ja
Publication of JPS6292439A publication Critical patent/JPS6292439A/ja
Publication of JPH033373B2 publication Critical patent/JPH033373B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60232984A 1985-10-18 1985-10-18 パタ−ン形成方法 Granted JPS6292439A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60232984A JPS6292439A (ja) 1985-10-18 1985-10-18 パタ−ン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60232984A JPS6292439A (ja) 1985-10-18 1985-10-18 パタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS6292439A true JPS6292439A (ja) 1987-04-27
JPH033373B2 JPH033373B2 (en:Method) 1991-01-18

Family

ID=16947969

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60232984A Granted JPS6292439A (ja) 1985-10-18 1985-10-18 パタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS6292439A (en:Method)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5539224A (en) * 1991-03-18 1996-07-23 Fujitsu Limited Semiconductor device having unit circuit-blocks in a common chip as a first layer with electrical interconnections therebetween provided exclusively in a second, upper, interconnection layer formed on the first layer
JP2009003074A (ja) * 2007-06-20 2009-01-08 Mitsubishi Electric Corp 露光方法およびイメージセンサの製造方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5539224A (en) * 1991-03-18 1996-07-23 Fujitsu Limited Semiconductor device having unit circuit-blocks in a common chip as a first layer with electrical interconnections therebetween provided exclusively in a second, upper, interconnection layer formed on the first layer
US5696013A (en) * 1991-03-18 1997-12-09 Fujitsu Limited Method of manufacturing semiconductor device having unit circuit-blocks
JP2009003074A (ja) * 2007-06-20 2009-01-08 Mitsubishi Electric Corp 露光方法およびイメージセンサの製造方法

Also Published As

Publication number Publication date
JPH033373B2 (en:Method) 1991-01-18

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