JPS6289134U - - Google Patents
Info
- Publication number
- JPS6289134U JPS6289134U JP17910885U JP17910885U JPS6289134U JP S6289134 U JPS6289134 U JP S6289134U JP 17910885 U JP17910885 U JP 17910885U JP 17910885 U JP17910885 U JP 17910885U JP S6289134 U JPS6289134 U JP S6289134U
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- piece
- point
- around
- tangent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims 5
- 239000011248 coating agent Substances 0.000 claims 2
- 238000000576 coating method Methods 0.000 claims 2
- 239000007788 liquid Substances 0.000 claims 1
- 238000007599 discharging Methods 0.000 description 2
- 239000012530 fluid Substances 0.000 description 1
Landscapes
- Coating Apparatus (AREA)
Description
第１図は、本考案の一実施例を略示する斜視図
、第２図は、本考案の別の実施例を略示する斜視
図、第３図は、レジスト溶解液吐出用ノズルを、
ウエハに対して傾斜させるようにしたレジスト溶
解液吐出装置の従来例を略示する斜視図である。
１……回転軸、２……レバー、３……流体圧シ
リンダー、４……水平アーム、５……第１片、６
……突出部、７……支持部材、８……弧状長孔、
９……ボルト、１０……蝶ナツト、１１……弧状
長孔、１２……第２片ブロツク、１３……ボルト
、１４……蝶ナツト、１５……ノズル、１６……
止めねじ、１７……ウエハ、１８……レジスト、
２５……第２片、３０……第１片。
FIG. 1 is a perspective view schematically showing one embodiment of the present invention, FIG. 2 is a perspective view schematically showing another embodiment of the present invention, and FIG. 3 shows a resist solution discharging nozzle.
FIG. 2 is a perspective view schematically showing a conventional example of a resist solution discharging device tilted with respect to a wafer. DESCRIPTION OF SYMBOLS 1... Rotating shaft, 2... Lever, 3... Fluid pressure cylinder, 4... Horizontal arm, 5... First piece, 6
... protrusion, 7 ... support member, 8 ... arcuate long hole,
9... Bolt, 10... Wing nut, 11... Arc-shaped long hole, 12... Second piece block, 13... Bolt, 14... Wing nut, 15... Nozzle, 16...
Set screw, 17...wafer, 18...resist,
25...second piece, 30...first piece.
Claims (1)
径方向に所要距離の個所へ、基板上方に配置した
ノズルから被膜溶解液を供給して、基板上の被膜
を部分的に除去する回転処理装置において、基板
回転方向に対して、溶解液落下点を通る接線上の
１点を中心として、接線回りに回転する第１片と
、前記溶解液落下点を通る法線上の１点を中心と
して法線回りに回動する第２片とからなる支持部
材にて、処理液供給ノズルを支持したことを特徴
とする被膜除去用の回転処理装置。 In a rotary processing device that partially removes a coating on a substrate by supplying a coating solution from a nozzle placed above the substrate to a location a required distance in the radial direction from the rotation center of the substrate while rotating the substrate, A first piece that rotates around a tangent to the direction of rotation of the substrate around a point on a tangent that passes through the solution drop point, and a first piece that rotates around a normal line that revolves around a point on a normal line that passes through the solution drop point. 1. A rotary processing device for film removal, characterized in that a processing liquid supply nozzle is supported by a support member consisting of a second piece that rotates at the same time.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17910885U JPS6289134U (en) | 1985-11-22 | 1985-11-22 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17910885U JPS6289134U (en) | 1985-11-22 | 1985-11-22 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6289134U true JPS6289134U (en) | 1987-06-08 |
Family
ID=31121870
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17910885U Pending JPS6289134U (en) | 1985-11-22 | 1985-11-22 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6289134U (en) |
-
1985
- 1985-11-22 JP JP17910885U patent/JPS6289134U/ja active Pending
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