JPS627685B2 - - Google Patents
Info
- Publication number
- JPS627685B2 JPS627685B2 JP55126696A JP12669680A JPS627685B2 JP S627685 B2 JPS627685 B2 JP S627685B2 JP 55126696 A JP55126696 A JP 55126696A JP 12669680 A JP12669680 A JP 12669680A JP S627685 B2 JPS627685 B2 JP S627685B2
- Authority
- JP
- Japan
- Prior art keywords
- bell gear
- gear
- bell
- heating
- reaction gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010438 heat treatment Methods 0.000 claims description 37
- 239000012495 reaction gas Substances 0.000 claims description 17
- 238000001947 vapour-phase growth Methods 0.000 claims description 12
- 238000001816 cooling Methods 0.000 claims description 8
- 239000002184 metal Substances 0.000 claims description 8
- 229910052751 metal Inorganic materials 0.000 claims description 8
- 239000000112 cooling gas Substances 0.000 claims description 7
- 239000007789 gas Substances 0.000 claims description 5
- 238000000034 method Methods 0.000 claims description 4
- 239000000758 substrate Substances 0.000 claims description 2
- 238000007599 discharging Methods 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 description 26
- 239000004065 semiconductor Substances 0.000 description 14
- 239000010453 quartz Substances 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 238000007789 sealing Methods 0.000 description 4
- 239000012808 vapor phase Substances 0.000 description 4
- 238000009826 distribution Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 238000009529 body temperature measurement Methods 0.000 description 2
- 210000000078 claw Anatomy 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
- C23C16/481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation by radiant heating of the substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12669680A JPS5750423A (en) | 1980-09-12 | 1980-09-12 | Vapor phase growth device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12669680A JPS5750423A (en) | 1980-09-12 | 1980-09-12 | Vapor phase growth device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5750423A JPS5750423A (en) | 1982-03-24 |
| JPS627685B2 true JPS627685B2 (fi) | 1987-02-18 |
Family
ID=14941577
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12669680A Granted JPS5750423A (en) | 1980-09-12 | 1980-09-12 | Vapor phase growth device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5750423A (fi) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59200424A (ja) * | 1983-04-28 | 1984-11-13 | Hitachi Electronics Eng Co Ltd | Ｃｖｄ装置 |
| JPH0674504B2 (ja) * | 1983-07-21 | 1994-09-21 | キヤノン株式会社 | 堆積膜の製造方法 |
| JPS61246370A (ja) * | 1985-04-23 | 1986-11-01 | Sakaguchi Dennetsu Kk | 気相化学反応炉 |
| JPS61250170A (ja) * | 1985-04-30 | 1986-11-07 | Sakaguchi Dennetsu Kk | 気相化学反応炉 |
| JPS62296413A (ja) * | 1986-06-16 | 1987-12-23 | Toshiba Ceramics Co Ltd | エピタキシヤル装置用保護ベルジヤ− |
| JPH0772351B2 (ja) * | 1986-12-01 | 1995-08-02 | 株式会社日立製作所 | 金属薄膜選択成長方法 |
| WO2011128729A1 (en) * | 2010-04-12 | 2011-10-20 | Memc Electronic Materials, S.P.A. | Bell jar for siemens reactor including thermal radiation shield |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5275176A (en) * | 1975-12-18 | 1977-06-23 | Matsushita Electric Ind Co Ltd | Method for vapor phase epitaxial growth |
-
1980
- 1980-09-12 JP JP12669680A patent/JPS5750423A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5275176A (en) * | 1975-12-18 | 1977-06-23 | Matsushita Electric Ind Co Ltd | Method for vapor phase epitaxial growth |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5750423A (en) | 1982-03-24 |
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