JPS6263420A - 化学的気相法による反応装置及びプラズマ処理方法 - Google Patents
化学的気相法による反応装置及びプラズマ処理方法Info
- Publication number
- JPS6263420A JPS6263420A JP20254685A JP20254685A JPS6263420A JP S6263420 A JPS6263420 A JP S6263420A JP 20254685 A JP20254685 A JP 20254685A JP 20254685 A JP20254685 A JP 20254685A JP S6263420 A JPS6263420 A JP S6263420A
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- gas
- reaction
- electrode
- reaction vessel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000006243 chemical reaction Methods 0.000 title claims abstract description 41
- 239000000126 substance Substances 0.000 title claims description 13
- 239000012808 vapor phase Substances 0.000 title claims description 12
- 238000000034 method Methods 0.000 title description 7
- 239000012495 reaction gas Substances 0.000 claims abstract description 13
- 230000005284 excitation Effects 0.000 claims description 14
- 239000007789 gas Substances 0.000 abstract description 25
- 230000005684 electric field Effects 0.000 abstract description 2
- 238000007599 discharging Methods 0.000 abstract 1
- 239000010408 film Substances 0.000 description 13
- 239000000758 substrate Substances 0.000 description 10
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 9
- 238000005229 chemical vapour deposition Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 239000013078 crystal Substances 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 229910000069 nitrogen hydride Inorganic materials 0.000 description 4
- 230000002265 prevention Effects 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 238000004380 ashing Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000005121 nitriding Methods 0.000 description 2
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 2
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000002230 thermal chemical vapour deposition Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20254685A JPS6263420A (ja) | 1985-09-14 | 1985-09-14 | 化学的気相法による反応装置及びプラズマ処理方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20254685A JPS6263420A (ja) | 1985-09-14 | 1985-09-14 | 化学的気相法による反応装置及びプラズマ処理方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6263420A true JPS6263420A (ja) | 1987-03-20 |
| JPH0553055B2 JPH0553055B2 (enExample) | 1993-08-09 |
Family
ID=16459291
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20254685A Granted JPS6263420A (ja) | 1985-09-14 | 1985-09-14 | 化学的気相法による反応装置及びプラズマ処理方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6263420A (enExample) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58176923A (ja) * | 1982-04-09 | 1983-10-17 | Jeol Ltd | プラズマｃｖｄ装置 |
-
1985
- 1985-09-14 JP JP20254685A patent/JPS6263420A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58176923A (ja) * | 1982-04-09 | 1983-10-17 | Jeol Ltd | プラズマｃｖｄ装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0553055B2 (enExample) | 1993-08-09 |
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