JPH0553055B2 - - Google Patents
Info
- Publication number
- JPH0553055B2 JPH0553055B2 JP60202546A JP20254685A JPH0553055B2 JP H0553055 B2 JPH0553055 B2 JP H0553055B2 JP 60202546 A JP60202546 A JP 60202546A JP 20254685 A JP20254685 A JP 20254685A JP H0553055 B2 JPH0553055 B2 JP H0553055B2
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- electrode
- substrate
- reaction vessel
- plasma processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20254685A JPS6263420A (ja) | 1985-09-14 | 1985-09-14 | 化学的気相法による反応装置及びプラズマ処理方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20254685A JPS6263420A (ja) | 1985-09-14 | 1985-09-14 | 化学的気相法による反応装置及びプラズマ処理方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6263420A JPS6263420A (ja) | 1987-03-20 |
| JPH0553055B2 true JPH0553055B2 (enExample) | 1993-08-09 |
Family
ID=16459291
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20254685A Granted JPS6263420A (ja) | 1985-09-14 | 1985-09-14 | 化学的気相法による反応装置及びプラズマ処理方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6263420A (enExample) |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58176923A (ja) * | 1982-04-09 | 1983-10-17 | Jeol Ltd | プラズマcvd装置 |
-
1985
- 1985-09-14 JP JP20254685A patent/JPS6263420A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6263420A (ja) | 1987-03-20 |
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