JPS6262809A - 耐熱性感光材料組成物 - Google Patents

耐熱性感光材料組成物

Info

Publication number
JPS6262809A
JPS6262809A JP20312385A JP20312385A JPS6262809A JP S6262809 A JPS6262809 A JP S6262809A JP 20312385 A JP20312385 A JP 20312385A JP 20312385 A JP20312385 A JP 20312385A JP S6262809 A JPS6262809 A JP S6262809A
Authority
JP
Japan
Prior art keywords
aromatic diamine
component
mol
photosensitive
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP20312385A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0365807B2 (enrdf_load_stackoverflow
Inventor
Kohei Nakajima
中島　紘平
Hiroshi Yasuno
安野　弘
Hiroaki Yamaguchi
裕章 山口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ube Corp
Original Assignee
Ube Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ube Industries Ltd filed Critical Ube Industries Ltd
Priority to JP20312385A priority Critical patent/JPS6262809A/ja
Publication of JPS6262809A publication Critical patent/JPS6262809A/ja
Publication of JPH0365807B2 publication Critical patent/JPH0365807B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)
JP20312385A 1985-09-13 1985-09-13 耐熱性感光材料組成物 Granted JPS6262809A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20312385A JPS6262809A (ja) 1985-09-13 1985-09-13 耐熱性感光材料組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20312385A JPS6262809A (ja) 1985-09-13 1985-09-13 耐熱性感光材料組成物

Publications (2)

Publication Number Publication Date
JPS6262809A true JPS6262809A (ja) 1987-03-19
JPH0365807B2 JPH0365807B2 (enrdf_load_stackoverflow) 1991-10-15

Family

ID=16468783

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20312385A Granted JPS6262809A (ja) 1985-09-13 1985-09-13 耐熱性感光材料組成物

Country Status (1)

Country Link
JP (1) JPS6262809A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5536775A (en) * 1994-02-28 1996-07-16 Sandoz Ltd. Amine curable compositions
JP2008304719A (ja) * 2007-06-08 2008-12-18 Kansai Paint Co Ltd リフトオフ用ネガ型レジスト組成物及びパターン形成方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5536775A (en) * 1994-02-28 1996-07-16 Sandoz Ltd. Amine curable compositions
JP2008304719A (ja) * 2007-06-08 2008-12-18 Kansai Paint Co Ltd リフトオフ用ネガ型レジスト組成物及びパターン形成方法

Also Published As

Publication number Publication date
JPH0365807B2 (enrdf_load_stackoverflow) 1991-10-15

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