JPS6260407B2 - - Google Patents

Info

Publication number
JPS6260407B2
JPS6260407B2 JP61284951A JP28495186A JPS6260407B2 JP S6260407 B2 JPS6260407 B2 JP S6260407B2 JP 61284951 A JP61284951 A JP 61284951A JP 28495186 A JP28495186 A JP 28495186A JP S6260407 B2 JPS6260407 B2 JP S6260407B2
Authority
JP
Japan
Prior art keywords
formula
resin
phenol
photosensitive
photosensitive resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP61284951A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62149717A (ja
Inventor
Keiji Kubo
Tetsuo Ishihara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daicel Corp
Original Assignee
Daicel Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP3157979A external-priority patent/JPS55123614A/ja
Application filed by Daicel Chemical Industries Ltd filed Critical Daicel Chemical Industries Ltd
Priority to JP28495186A priority Critical patent/JPS62149717A/ja
Publication of JPS62149717A publication Critical patent/JPS62149717A/ja
Publication of JPS6260407B2 publication Critical patent/JPS6260407B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
JP28495186A 1979-03-16 1986-11-29 感光性樹脂の製造方法 Granted JPS62149717A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28495186A JPS62149717A (ja) 1979-03-16 1986-11-29 感光性樹脂の製造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP3157979A JPS55123614A (en) 1979-03-16 1979-03-16 Photosensitive resin and positive type-photosensitive resin composition
JP28495186A JPS62149717A (ja) 1979-03-16 1986-11-29 感光性樹脂の製造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP3157979A Division JPS55123614A (en) 1979-03-16 1979-03-16 Photosensitive resin and positive type-photosensitive resin composition

Publications (2)

Publication Number Publication Date
JPS62149717A JPS62149717A (ja) 1987-07-03
JPS6260407B2 true JPS6260407B2 (en, 2012) 1987-12-16

Family

ID=26370068

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28495186A Granted JPS62149717A (ja) 1979-03-16 1986-11-29 感光性樹脂の製造方法

Country Status (1)

Country Link
JP (1) JPS62149717A (en, 2012)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE793490A (fr) * 1972-05-23 1973-06-29 Hunt Chem Corp Philip A Article sensible a la lumiere comprenant un phenolate de diazoquinone, un liant polymerique, et une diazoquinone-siloxane
JPS4924361A (en, 2012) * 1972-06-27 1974-03-04
JPS505083A (en, 2012) * 1973-04-27 1975-01-20
JPS54116218A (en) * 1978-03-02 1979-09-10 Oji Paper Co Photosensitive composition

Also Published As

Publication number Publication date
JPS62149717A (ja) 1987-07-03

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