JPS6259946A - 感光性樹脂組成物 - Google Patents

感光性樹脂組成物

Info

Publication number
JPS6259946A
JPS6259946A JP20037085A JP20037085A JPS6259946A JP S6259946 A JPS6259946 A JP S6259946A JP 20037085 A JP20037085 A JP 20037085A JP 20037085 A JP20037085 A JP 20037085A JP S6259946 A JPS6259946 A JP S6259946A
Authority
JP
Japan
Prior art keywords
formula
photosensitive resin
resin composition
formulas
represented
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP20037085A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0435744B2 (enExample
Inventor
Hideo Nakasaki
中崎 日出夫
Kazutaka Masaoka
正岡 和隆
Yoshitaka Minami
好隆 南
Hajime Kakumaru
肇 角丸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP20037085A priority Critical patent/JPS6259946A/ja
Publication of JPS6259946A publication Critical patent/JPS6259946A/ja
Publication of JPH0435744B2 publication Critical patent/JPH0435744B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
JP20037085A 1985-09-10 1985-09-10 感光性樹脂組成物 Granted JPS6259946A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20037085A JPS6259946A (ja) 1985-09-10 1985-09-10 感光性樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20037085A JPS6259946A (ja) 1985-09-10 1985-09-10 感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JPS6259946A true JPS6259946A (ja) 1987-03-16
JPH0435744B2 JPH0435744B2 (enExample) 1992-06-12

Family

ID=16423177

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20037085A Granted JPS6259946A (ja) 1985-09-10 1985-09-10 感光性樹脂組成物

Country Status (1)

Country Link
JP (1) JPS6259946A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6455551A (en) * 1987-08-26 1989-03-02 Hitachi Chemical Co Ltd Photosensitive resin composition

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60225149A (ja) * 1984-04-23 1985-11-09 Hitachi Chem Co Ltd 感光性樹脂組成物
JPS60225841A (ja) * 1984-04-25 1985-11-11 Hitachi Chem Co Ltd 感光性樹脂組成物

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60225149A (ja) * 1984-04-23 1985-11-09 Hitachi Chem Co Ltd 感光性樹脂組成物
JPS60225841A (ja) * 1984-04-25 1985-11-11 Hitachi Chem Co Ltd 感光性樹脂組成物

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6455551A (en) * 1987-08-26 1989-03-02 Hitachi Chemical Co Ltd Photosensitive resin composition

Also Published As

Publication number Publication date
JPH0435744B2 (enExample) 1992-06-12

Similar Documents

Publication Publication Date Title
JP5707420B2 (ja) 感光性樹脂組成物
US6060216A (en) Photosensitive resin composition and photosensitive element using the same
JP4931533B2 (ja) 感光性樹脂組成物およびその積層体
EP0283990A2 (en) A heat-resistant photosensitive resin composition
US4980266A (en) Photosensitive resin composition
JPS61114851A (ja) プラスチツクの多層化物を製造する方法
JPS6259946A (ja) 感光性樹脂組成物
JP4614858B2 (ja) 感光性樹脂組成物およびその積層体
JP2677916B2 (ja) 感光性樹脂組成物及びこれを用いた感光性エレメント
JPH0820735B2 (ja) 感光性樹脂組成物
JPS58102230A (ja) 感光性樹脂組成物
JPS6275633A (ja) 感光性樹脂組成物
JPS6156341A (ja) 感光性樹脂組成物
JPH02191955A (ja) 感光性樹脂組成物及びこれを用いた感光性エレメント
JPS60225841A (ja) 感光性樹脂組成物
JPS62295046A (ja) 感光性樹脂組成物
JP3730318B2 (ja) 感光性樹脂組成物及びこれを用いた積層体
JPS61223836A (ja) 感光性樹脂組成物および感光性樹脂組成物積層体
JPS6263933A (ja) 感光性樹脂組成物
JPS6156342A (ja) 感光性樹脂組成物
JPH0282248A (ja) 感光性樹脂組成物およびこれを用いた感光性エレメント
JPH0328850A (ja) 感光性樹脂組成物及び感光性エレメント
JPH0411856B2 (enExample)
JPS60225149A (ja) 感光性樹脂組成物
JPH0235454A (ja) 感光性樹脂組成物