JPH0435744B2 - - Google Patents

Info

Publication number
JPH0435744B2
JPH0435744B2 JP60200370A JP20037085A JPH0435744B2 JP H0435744 B2 JPH0435744 B2 JP H0435744B2 JP 60200370 A JP60200370 A JP 60200370A JP 20037085 A JP20037085 A JP 20037085A JP H0435744 B2 JPH0435744 B2 JP H0435744B2
Authority
JP
Japan
Prior art keywords
formula
weight
parts
represented
photosensitive resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60200370A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6259946A (ja
Inventor
Hideo Nakasaki
Kazutaka Masaoka
Yoshitaka Minami
Hajime Kakumaru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP20037085A priority Critical patent/JPS6259946A/ja
Publication of JPS6259946A publication Critical patent/JPS6259946A/ja
Publication of JPH0435744B2 publication Critical patent/JPH0435744B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
JP20037085A 1985-09-10 1985-09-10 感光性樹脂組成物 Granted JPS6259946A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20037085A JPS6259946A (ja) 1985-09-10 1985-09-10 感光性樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20037085A JPS6259946A (ja) 1985-09-10 1985-09-10 感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JPS6259946A JPS6259946A (ja) 1987-03-16
JPH0435744B2 true JPH0435744B2 (enExample) 1992-06-12

Family

ID=16423177

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20037085A Granted JPS6259946A (ja) 1985-09-10 1985-09-10 感光性樹脂組成物

Country Status (1)

Country Link
JP (1) JPS6259946A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0820735B2 (ja) * 1987-08-26 1996-03-04 日立化成工業株式会社 感光性樹脂組成物

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60225149A (ja) * 1984-04-23 1985-11-09 Hitachi Chem Co Ltd 感光性樹脂組成物
JPS60225841A (ja) * 1984-04-25 1985-11-11 Hitachi Chem Co Ltd 感光性樹脂組成物

Also Published As

Publication number Publication date
JPS6259946A (ja) 1987-03-16

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