JPS6257710B2 - - Google Patents
Info
- Publication number
- JPS6257710B2 JPS6257710B2 JP54082091A JP8209179A JPS6257710B2 JP S6257710 B2 JPS6257710 B2 JP S6257710B2 JP 54082091 A JP54082091 A JP 54082091A JP 8209179 A JP8209179 A JP 8209179A JP S6257710 B2 JPS6257710 B2 JP S6257710B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- support
- gas
- electrode
- film forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000015572 biosynthetic process Effects 0.000 claims description 36
- 230000008021 deposition Effects 0.000 claims description 20
- 238000000034 method Methods 0.000 claims description 16
- 239000012495 reaction gas Substances 0.000 claims description 9
- 239000007789 gas Substances 0.000 description 60
- 238000000151 deposition Methods 0.000 description 17
- 238000009826 distribution Methods 0.000 description 11
- 238000004804 winding Methods 0.000 description 6
- 238000007796 conventional method Methods 0.000 description 5
- 229910021417 amorphous silicon Inorganic materials 0.000 description 4
- 230000005684 electric field Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000000704 physical effect Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- 239000012159 carrier gas Substances 0.000 description 2
- 230000001788 irregular Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000009828 non-uniform distribution Methods 0.000 description 1
- 108091008695 photoreceptors Proteins 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Plasma & Fusion (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Photoreceptors In Electrophotography (AREA)
- Chemical Vapour Deposition (AREA)
- Light Receiving Elements (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8209179A JPS565972A (en) | 1979-06-27 | 1979-06-27 | Film forming method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8209179A JPS565972A (en) | 1979-06-27 | 1979-06-27 | Film forming method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS565972A JPS565972A (en) | 1981-01-22 |
| JPS6257710B2 true JPS6257710B2 (US07922777-20110412-C00004.png) | 1987-12-02 |
Family
ID=13764759
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8209179A Granted JPS565972A (en) | 1979-06-27 | 1979-06-27 | Film forming method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS565972A (US07922777-20110412-C00004.png) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5935674A (ja) * | 1982-08-24 | 1984-02-27 | Sumitomo Electric Ind Ltd | 蒸着装置 |
| JP2667665B2 (ja) * | 1987-07-23 | 1997-10-27 | 三井東圧化学株式会社 | 成膜装置 |
| JPH04107826U (ja) * | 1991-02-28 | 1992-09-17 | 三洋電機株式会社 | 光起電力素子の製造装置 |
-
1979
- 1979-06-27 JP JP8209179A patent/JPS565972A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS565972A (en) | 1981-01-22 |
