JPS6256652B2 - - Google Patents
Info
- Publication number
- JPS6256652B2 JPS6256652B2 JP17636181A JP17636181A JPS6256652B2 JP S6256652 B2 JPS6256652 B2 JP S6256652B2 JP 17636181 A JP17636181 A JP 17636181A JP 17636181 A JP17636181 A JP 17636181A JP S6256652 B2 JPS6256652 B2 JP S6256652B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- substrate support
- thin film
- spring
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02631—Physical deposition at reduced pressure, e.g. MBE, sputtering, evaporation
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17636181A JPS5878417A (ja) | 1981-11-05 | 1981-11-05 | 薄膜形成真空装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17636181A JPS5878417A (ja) | 1981-11-05 | 1981-11-05 | 薄膜形成真空装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5878417A JPS5878417A (ja) | 1983-05-12 |
JPS6256652B2 true JPS6256652B2 (en, 2012) | 1987-11-26 |
Family
ID=16012263
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17636181A Granted JPS5878417A (ja) | 1981-11-05 | 1981-11-05 | 薄膜形成真空装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5878417A (en, 2012) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03105540U (en, 2012) * | 1990-02-09 | 1991-10-31 | ||
JPH0592310U (ja) * | 1992-05-19 | 1993-12-17 | 丸井産業株式会社 | 構築用スペーサー |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6165421A (ja) * | 1984-09-07 | 1986-04-04 | Matsushita Electric Ind Co Ltd | プラズマ化学気相堆積装置 |
JPH036366A (ja) * | 1989-06-02 | 1991-01-11 | Nippon Steel Corp | 反応蒸着装置用基板ホルダー固定台 |
JP6484035B2 (ja) * | 2015-01-06 | 2019-03-13 | 株式会社カネカ | 薄膜形成装置及びそれを用いた薄膜の製造方法、並びに有機el装置の製造方法 |
-
1981
- 1981-11-05 JP JP17636181A patent/JPS5878417A/ja active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03105540U (en, 2012) * | 1990-02-09 | 1991-10-31 | ||
JPH0592310U (ja) * | 1992-05-19 | 1993-12-17 | 丸井産業株式会社 | 構築用スペーサー |
Also Published As
Publication number | Publication date |
---|---|
JPS5878417A (ja) | 1983-05-12 |
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