JPS6255690B2 - - Google Patents
Info
- Publication number
- JPS6255690B2 JPS6255690B2 JP55016360A JP1636080A JPS6255690B2 JP S6255690 B2 JPS6255690 B2 JP S6255690B2 JP 55016360 A JP55016360 A JP 55016360A JP 1636080 A JP1636080 A JP 1636080A JP S6255690 B2 JPS6255690 B2 JP S6255690B2
- Authority
- JP
- Japan
- Prior art keywords
- alignment
- die
- chip
- pattern
- step size
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 claims description 18
- 239000000758 substrate Substances 0.000 claims description 6
- 238000003491 array Methods 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 230000007246 mechanism Effects 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 238000007796 conventional method Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 230000008859 change Effects 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000013507 mapping Methods 0.000 description 2
- 230000008901 benefit Effects 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
Landscapes
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Projection-Type Copiers In General (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1636080A JPS56114320A (en) | 1980-02-13 | 1980-02-13 | Aligning method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1636080A JPS56114320A (en) | 1980-02-13 | 1980-02-13 | Aligning method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS56114320A JPS56114320A (en) | 1981-09-08 |
| JPS6255690B2 true JPS6255690B2 (enExample) | 1987-11-20 |
Family
ID=11914165
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1636080A Granted JPS56114320A (en) | 1980-02-13 | 1980-02-13 | Aligning method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS56114320A (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2610815B2 (ja) * | 1985-09-19 | 1997-05-14 | 株式会社ニコン | 露光方法 |
-
1980
- 1980-02-13 JP JP1636080A patent/JPS56114320A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS56114320A (en) | 1981-09-08 |
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