JPS625335B2 - - Google Patents

Info

Publication number
JPS625335B2
JPS625335B2 JP55013729A JP1372980A JPS625335B2 JP S625335 B2 JPS625335 B2 JP S625335B2 JP 55013729 A JP55013729 A JP 55013729A JP 1372980 A JP1372980 A JP 1372980A JP S625335 B2 JPS625335 B2 JP S625335B2
Authority
JP
Japan
Prior art keywords
pattern
workpiece
size
laser
laser beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55013729A
Other languages
English (en)
Japanese (ja)
Other versions
JPS56111227A (en
Inventor
Takeoki Myauchi
Mikio Ppongo
Susumu Aiuchi
Masao Mitani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP1372980A priority Critical patent/JPS56111227A/ja
Publication of JPS56111227A publication Critical patent/JPS56111227A/ja
Publication of JPS625335B2 publication Critical patent/JPS625335B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Laser Beam Processing (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP1372980A 1980-02-08 1980-02-08 Laser working device with projection method using iris diaphragm Granted JPS56111227A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1372980A JPS56111227A (en) 1980-02-08 1980-02-08 Laser working device with projection method using iris diaphragm

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1372980A JPS56111227A (en) 1980-02-08 1980-02-08 Laser working device with projection method using iris diaphragm

Publications (2)

Publication Number Publication Date
JPS56111227A JPS56111227A (en) 1981-09-02
JPS625335B2 true JPS625335B2 (enrdf_load_stackoverflow) 1987-02-04

Family

ID=11841321

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1372980A Granted JPS56111227A (en) 1980-02-08 1980-02-08 Laser working device with projection method using iris diaphragm

Country Status (1)

Country Link
JP (1) JPS56111227A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04251687A (ja) * 1991-01-23 1992-09-08 Fanuc Ltd レーザビーム制御装置
JP3399590B2 (ja) * 1993-08-04 2003-04-21 富士通株式会社 配線の切断装置
JP3479833B2 (ja) 2000-08-22 2003-12-15 日本電気株式会社 レーザ修正方法および装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5456370A (en) * 1977-10-14 1979-05-07 Hitachi Ltd Mask pattern correcting method and mask pattern correcting device used for said method
JPS54105968A (en) * 1978-02-08 1979-08-20 Toshiba Corp Defect corrector for pattern

Also Published As

Publication number Publication date
JPS56111227A (en) 1981-09-02

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