JPS6252965A - 半導体装置の製造方法 - Google Patents

半導体装置の製造方法

Info

Publication number
JPS6252965A
JPS6252965A JP60192042A JP19204285A JPS6252965A JP S6252965 A JPS6252965 A JP S6252965A JP 60192042 A JP60192042 A JP 60192042A JP 19204285 A JP19204285 A JP 19204285A JP S6252965 A JPS6252965 A JP S6252965A
Authority
JP
Japan
Prior art keywords
layer
apertures
ions
region
regions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60192042A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0482052B2 (enExample
Inventor
Hiroyuki Miyagawa
裕之 宮川
Hideki Takada
秀希 高田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP60192042A priority Critical patent/JPS6252965A/ja
Publication of JPS6252965A publication Critical patent/JPS6252965A/ja
Publication of JPH0482052B2 publication Critical patent/JPH0482052B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Bipolar Transistors (AREA)
  • Bipolar Integrated Circuits (AREA)
JP60192042A 1985-09-02 1985-09-02 半導体装置の製造方法 Granted JPS6252965A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60192042A JPS6252965A (ja) 1985-09-02 1985-09-02 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60192042A JPS6252965A (ja) 1985-09-02 1985-09-02 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS6252965A true JPS6252965A (ja) 1987-03-07
JPH0482052B2 JPH0482052B2 (enExample) 1992-12-25

Family

ID=16284639

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60192042A Granted JPS6252965A (ja) 1985-09-02 1985-09-02 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS6252965A (enExample)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5563821A (en) * 1978-11-06 1980-05-14 Nec Corp Semiconductor device
JPS58108765A (ja) * 1981-12-23 1983-06-28 Clarion Co Ltd 半導体装置の製法
JPS5933860A (ja) * 1982-08-19 1984-02-23 Toshiba Corp 半導体装置およびその製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5563821A (en) * 1978-11-06 1980-05-14 Nec Corp Semiconductor device
JPS58108765A (ja) * 1981-12-23 1983-06-28 Clarion Co Ltd 半導体装置の製法
JPS5933860A (ja) * 1982-08-19 1984-02-23 Toshiba Corp 半導体装置およびその製造方法

Also Published As

Publication number Publication date
JPH0482052B2 (enExample) 1992-12-25

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