JPS6249728B2 - - Google Patents

Info

Publication number
JPS6249728B2
JPS6249728B2 JP56209843A JP20984381A JPS6249728B2 JP S6249728 B2 JPS6249728 B2 JP S6249728B2 JP 56209843 A JP56209843 A JP 56209843A JP 20984381 A JP20984381 A JP 20984381A JP S6249728 B2 JPS6249728 B2 JP S6249728B2
Authority
JP
Japan
Prior art keywords
resist
container
wall
resist coating
peripheral wall
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56209843A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58114426A (ja
Inventor
Ichiro Yazawa
Hideo Tadokoro
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP56209843A priority Critical patent/JPS58114426A/ja
Publication of JPS58114426A publication Critical patent/JPS58114426A/ja
Publication of JPS6249728B2 publication Critical patent/JPS6249728B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)
JP56209843A 1981-12-28 1981-12-28 レジスト塗布装置 Granted JPS58114426A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56209843A JPS58114426A (ja) 1981-12-28 1981-12-28 レジスト塗布装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56209843A JPS58114426A (ja) 1981-12-28 1981-12-28 レジスト塗布装置

Publications (2)

Publication Number Publication Date
JPS58114426A JPS58114426A (ja) 1983-07-07
JPS6249728B2 true JPS6249728B2 (Sortimente) 1987-10-21

Family

ID=16579533

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56209843A Granted JPS58114426A (ja) 1981-12-28 1981-12-28 レジスト塗布装置

Country Status (1)

Country Link
JP (1) JPS58114426A (Sortimente)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6042730U (ja) * 1983-08-31 1985-03-26 関西日本電気株式会社 半導体製造装置
JPS6151732U (Sortimente) * 1984-09-10 1986-04-07
JPS61219136A (ja) * 1985-03-25 1986-09-29 Iwatsu Electric Co Ltd レジスト回転塗布機
JPH0444216Y2 (Sortimente) * 1985-10-07 1992-10-19

Also Published As

Publication number Publication date
JPS58114426A (ja) 1983-07-07

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