JPS62495B2 - - Google Patents
Info
- Publication number
- JPS62495B2 JPS62495B2 JP53105485A JP10548578A JPS62495B2 JP S62495 B2 JPS62495 B2 JP S62495B2 JP 53105485 A JP53105485 A JP 53105485A JP 10548578 A JP10548578 A JP 10548578A JP S62495 B2 JPS62495 B2 JP S62495B2
- Authority
- JP
- Japan
- Prior art keywords
- carrier material
- toner
- weight
- coating film
- developer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000012876 carrier material Substances 0.000 claims description 25
- 239000006249 magnetic particle Substances 0.000 claims description 10
- 239000000203 mixture Substances 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 2
- 239000011248 coating agent Substances 0.000 description 16
- 238000000576 coating method Methods 0.000 description 16
- 238000002156 mixing Methods 0.000 description 6
- 239000002245 particle Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 229920001296 polysiloxane Polymers 0.000 description 4
- 229910000831 Steel Inorganic materials 0.000 description 3
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000011324 bead Substances 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000001632 sodium acetate Substances 0.000 description 2
- 235000017281 sodium acetate Nutrition 0.000 description 2
- LPXPTNMVRIOKMN-UHFFFAOYSA-M sodium nitrite Chemical compound [Na+].[O-]N=O LPXPTNMVRIOKMN-UHFFFAOYSA-M 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 238000009736 wetting Methods 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 229960000583 acetic acid Drugs 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000005243 fluidization Methods 0.000 description 1
- 239000012362 glacial acetic acid Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- GEMHFKXPOCTAIP-UHFFFAOYSA-N n,n-dimethyl-n'-phenylcarbamimidoyl chloride Chemical compound CN(C)C(Cl)=NC1=CC=CC=C1 GEMHFKXPOCTAIP-UHFFFAOYSA-N 0.000 description 1
- 108091008695 photoreceptors Proteins 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 235000010288 sodium nitrite Nutrition 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- UQMOLLPKNHFRAC-UHFFFAOYSA-N tetrabutyl silicate Chemical compound CCCCO[Si](OCCCC)(OCCCC)OCCCC UQMOLLPKNHFRAC-UHFFFAOYSA-N 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- ZQZCOBSUOFHDEE-UHFFFAOYSA-N tetrapropyl silicate Chemical compound CCCO[Si](OCCC)(OCCC)OCCC ZQZCOBSUOFHDEE-UHFFFAOYSA-N 0.000 description 1
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Developing Agents For Electrophotography (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10548578A JPS5533109A (en) | 1978-08-31 | 1978-08-31 | Carrier material for two component dry system developer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10548578A JPS5533109A (en) | 1978-08-31 | 1978-08-31 | Carrier material for two component dry system developer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5533109A JPS5533109A (en) | 1980-03-08 |
| JPS62495B2 true JPS62495B2 (de) | 1987-01-08 |
Family
ID=14408884
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10548578A Granted JPS5533109A (en) | 1978-08-31 | 1978-08-31 | Carrier material for two component dry system developer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5533109A (de) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4600677A (en) * | 1982-03-15 | 1986-07-15 | Xerox Corporation | Organoalkoxysilane carrier coatings |
| JPS59201064A (ja) * | 1983-04-28 | 1984-11-14 | Tdk Corp | 電子写真現像用磁性キヤリア粒子 |
| JPS606953A (ja) * | 1983-06-27 | 1985-01-14 | Ricoh Co Ltd | 静電潜像現像剤用キヤリア |
| JP4121252B2 (ja) * | 2001-03-27 | 2008-07-23 | 株式会社リコー | 静電潜像現像用キャリア、現像剤およびそれを用いた現像方法、現像装置 |
-
1978
- 1978-08-31 JP JP10548578A patent/JPS5533109A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5533109A (en) | 1980-03-08 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR100273088B1 (ko) | 가열정착롤 | |
| US4927728A (en) | Carrier particles for use in a two-component dry-type developer | |
| JP2002502447A (ja) | 被覆粒子 | |
| US5068301A (en) | Coating composition for electrophotographic carrier | |
| JP2862724B2 (ja) | 電子写真用キャリア | |
| JP2801507B2 (ja) | 電子写真キャリア用コーティング剤及びそれを用いた電子写真用キャリア | |
| JPS58168056A (ja) | オルガノアルコキシシランキヤリヤ−被覆剤 | |
| EP0535598B1 (de) | Siliconharzzusammensetzung für die elektrophotographische Trägerteilchenbeschichtung | |
| JP2801492B2 (ja) | 電子写真キャリア用コーティング剤及びそれを用いたキャリア | |
| JPS62495B2 (de) | ||
| JPS6019156A (ja) | 静電潜像現像剤用表面被覆キヤリア | |
| JP2602933B2 (ja) | 電子写真用感光体 | |
| JPH04198946A (ja) | 静電潜像現像用キャリア | |
| JPH02694B2 (de) | ||
| JPH09143429A (ja) | 静電潜像現像用キャリアのためのコーティング剤および静電潜像現像用キャリア | |
| JPH09165556A (ja) | 低粘度シリコーン組成物 | |
| KR100273180B1 (ko) | 전자사진 광수용체 | |
| JP3403805B2 (ja) | 電子写真キャリア用コーティング剤及び電子写真用キャリア粒子 | |
| JP3615854B2 (ja) | 電子写真キャリア用コーティング剤及びそれを用いた電子写真用被覆キャリア | |
| JPS59228261A (ja) | 電子写真用２成分系現像剤 | |
| JP3868664B2 (ja) | 正帯電性キャリア及びその製造方法 | |
| JPS583223B2 (ja) | 電子写真感光体 | |
| JPS606953A (ja) | 静電潜像現像剤用キヤリア | |
| JPH0114581B2 (de) | ||
| JPS645290B2 (de) |