JPS6247952B2 - - Google Patents
Info
- Publication number
- JPS6247952B2 JPS6247952B2 JP30580A JP30580A JPS6247952B2 JP S6247952 B2 JPS6247952 B2 JP S6247952B2 JP 30580 A JP30580 A JP 30580A JP 30580 A JP30580 A JP 30580A JP S6247952 B2 JPS6247952 B2 JP S6247952B2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- processing
- chamber
- workpiece
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000012545 processing Methods 0.000 claims description 41
- 239000000463 material Substances 0.000 claims description 21
- 238000005530 etching Methods 0.000 claims description 18
- 230000007723 transport mechanism Effects 0.000 claims description 13
- 238000004891 communication Methods 0.000 claims description 10
- 230000008021 deposition Effects 0.000 claims description 5
- 230000003028 elevating effect Effects 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 description 67
- 239000000758 substrate Substances 0.000 description 10
- 238000000034 method Methods 0.000 description 7
- 230000007246 mechanism Effects 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- 238000000151 deposition Methods 0.000 description 4
- 238000005192 partition Methods 0.000 description 4
- 238000000992 sputter etching Methods 0.000 description 3
- 239000012212 insulator Substances 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000000615 nonconductor Substances 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 238000007781 pre-processing Methods 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 230000008685 targeting Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30580A JPS5698478A (en) | 1980-01-08 | 1980-01-08 | Vacuum treating device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30580A JPS5698478A (en) | 1980-01-08 | 1980-01-08 | Vacuum treating device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5698478A JPS5698478A (en) | 1981-08-07 |
JPS6247952B2 true JPS6247952B2 (de) | 1987-10-12 |
Family
ID=11470181
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP30580A Granted JPS5698478A (en) | 1980-01-08 | 1980-01-08 | Vacuum treating device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5698478A (de) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6440047U (de) * | 1987-09-07 | 1989-03-09 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59177367A (ja) * | 1983-03-25 | 1984-10-08 | Matsushita Electric Ind Co Ltd | 試料搬送機構を有する真空蒸着装置 |
JPH0666295B2 (ja) * | 1983-06-29 | 1994-08-24 | 東京応化工業株式会社 | 多段プラズマ処理装置 |
-
1980
- 1980-01-08 JP JP30580A patent/JPS5698478A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6440047U (de) * | 1987-09-07 | 1989-03-09 |
Also Published As
Publication number | Publication date |
---|---|
JPS5698478A (en) | 1981-08-07 |
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