JPS6247952B2 - - Google Patents

Info

Publication number
JPS6247952B2
JPS6247952B2 JP30580A JP30580A JPS6247952B2 JP S6247952 B2 JPS6247952 B2 JP S6247952B2 JP 30580 A JP30580 A JP 30580A JP 30580 A JP30580 A JP 30580A JP S6247952 B2 JPS6247952 B2 JP S6247952B2
Authority
JP
Japan
Prior art keywords
wafer
processing
chamber
workpiece
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP30580A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5698478A (en
Inventor
Yasuhiro Horiike
Hidetaka Jo
Tetsuo Kurisaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Tokuda Seisakusho Co Ltd
Original Assignee
Toshiba Corp
Tokuda Seisakusho Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokuda Seisakusho Co Ltd filed Critical Toshiba Corp
Priority to JP30580A priority Critical patent/JPS5698478A/ja
Publication of JPS5698478A publication Critical patent/JPS5698478A/ja
Publication of JPS6247952B2 publication Critical patent/JPS6247952B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP30580A 1980-01-08 1980-01-08 Vacuum treating device Granted JPS5698478A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30580A JPS5698478A (en) 1980-01-08 1980-01-08 Vacuum treating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30580A JPS5698478A (en) 1980-01-08 1980-01-08 Vacuum treating device

Publications (2)

Publication Number Publication Date
JPS5698478A JPS5698478A (en) 1981-08-07
JPS6247952B2 true JPS6247952B2 (de) 1987-10-12

Family

ID=11470181

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30580A Granted JPS5698478A (en) 1980-01-08 1980-01-08 Vacuum treating device

Country Status (1)

Country Link
JP (1) JPS5698478A (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6440047U (de) * 1987-09-07 1989-03-09

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59177367A (ja) * 1983-03-25 1984-10-08 Matsushita Electric Ind Co Ltd 試料搬送機構を有する真空蒸着装置
JPH0666295B2 (ja) * 1983-06-29 1994-08-24 東京応化工業株式会社 多段プラズマ処理装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6440047U (de) * 1987-09-07 1989-03-09

Also Published As

Publication number Publication date
JPS5698478A (en) 1981-08-07

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