JPS6246970B2 - - Google Patents
Info
- Publication number
- JPS6246970B2 JPS6246970B2 JP14666279A JP14666279A JPS6246970B2 JP S6246970 B2 JPS6246970 B2 JP S6246970B2 JP 14666279 A JP14666279 A JP 14666279A JP 14666279 A JP14666279 A JP 14666279A JP S6246970 B2 JPS6246970 B2 JP S6246970B2
- Authority
- JP
- Japan
- Prior art keywords
- sputtering
- film
- target
- torr
- atmosphere
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004544 sputter deposition Methods 0.000 claims description 66
- 238000000034 method Methods 0.000 claims description 33
- 230000005291 magnetic effect Effects 0.000 claims description 20
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 14
- 239000001301 oxygen Substances 0.000 claims description 14
- 229910052760 oxygen Inorganic materials 0.000 claims description 14
- 239000000758 substrate Substances 0.000 claims description 14
- 239000010409 thin film Substances 0.000 claims description 14
- 239000000654 additive Substances 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 230000005294 ferromagnetic effect Effects 0.000 claims description 3
- 230000003472 neutralizing effect Effects 0.000 claims description 3
- 230000001590 oxidative effect Effects 0.000 claims description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 38
- 239000010408 film Substances 0.000 description 34
- 230000008569 process Effects 0.000 description 13
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 8
- 229910000859 α-Fe Inorganic materials 0.000 description 8
- 239000007789 gas Substances 0.000 description 7
- 230000004907 flux Effects 0.000 description 6
- 230000008859 change Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 238000005546 reactive sputtering Methods 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 230000006837 decompression Effects 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
- H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Thin Magnetic Films (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14666279A JPS5669815A (en) | 1979-11-13 | 1979-11-13 | Manufacture of oxide magnetic thin film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14666279A JPS5669815A (en) | 1979-11-13 | 1979-11-13 | Manufacture of oxide magnetic thin film |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5669815A JPS5669815A (en) | 1981-06-11 |
JPS6246970B2 true JPS6246970B2 (enrdf_load_stackoverflow) | 1987-10-06 |
Family
ID=15412778
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14666279A Granted JPS5669815A (en) | 1979-11-13 | 1979-11-13 | Manufacture of oxide magnetic thin film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5669815A (enrdf_load_stackoverflow) |
-
1979
- 1979-11-13 JP JP14666279A patent/JPS5669815A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5669815A (en) | 1981-06-11 |
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